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Elsevier

Academic Press

  • Malaria Control and Elimination Program in the People’s Republic of China

    • 1st Edition
    • Volume 86
    • English
    First published in 1963, Advances in Parasitology contains comprehensive and up-to-date reviews in all areas of interest in contemporary parasitology. Advances in Parasitology includes medical studies of parasites of major influence, such as Plasmodium falciparum and trypanosomes. The series also contains reviews of more traditional areas, such as zoology, taxonomy, and life history, which shape current thinking and applications. The 2012 impact factor is 3.778.

  • Materials and Process Characterization

    • 1st Edition
    • Volume 6
    • Norman G. Einspruch + 1 more
    • English
    VLSI Electronics: Microstructure Science, Volume 6: Materials and Process Characterization addresses the problem of how to apply a broad range of sophisticated materials characterization tools to materials and processes used for development and production of very large scale integration (VLSI) electronics. This book discusses the various characterization techniques, such as Auger spectroscopy, secondary ion mass spectroscopy, X-ray topography, transmission electron microscopy, and spreading resistance. The systematic approach to the technologies of VLSI electronic materials and device manufacture are also considered. This volume is beneficial to materials scientists, chemists, and engineers who are commissioned with the responsibility of developing and implementing the production of materials and devices to support the VLSI era.

  • VLSI Design

    • 1st Edition
    • Volume 14
    • Norman G. Einspruch
    • English
    VLSI Electronics Microstructure Science, Volume 14: VLSI Design presents a comprehensive exposition and assessment of the developments and trends in VLSI (Very Large Scale Integration) electronics. This volume covers topics that range from microscopic aspects of materials behavior and device performance to the comprehension of VLSI in systems applications. Each article is prepared by a recognized authority. The subjects discussed in this book include VLSI processor design methodology; the RISC (Reduced Instruction Set Computer); the VLSI testing program; silicon compilers for VLSI; and specialized silicon compiler and programmable chip for language recognition. Scientists, engineers, researchers, device designers, and systems architects will find the book very useful.

  • Advances in Space Science and Technology

    • 1st Edition
    • Volume 11
    • Frederick I. Ordway
    • English
    Advances in Space Science and Technology, Volume 11 provides information pertinent to the developments in space science and technology. This book presents the advances in both solar and cosmic X-ray astronomy, all made possible by instruments carried in high altitude balloons, in rockets, and in orbiting satellites. Organized into eight chapters, this volume begins with an overview of solar X-ray phenomena. This text then examines the aspect of manned space flight, with focus on nutrition for astronaut flight crews. Other chapters consider how oxygen may be secured as a result of electrolyzing lunar rocks. This book discusses as well the significance of the Skylab experiments in the context of their disciplines and the part they play in the continuing evolution of space operations. The final chapter deals with the educational satellite, which is one of the most challenging of all practical applications of space technology. This book is a valuable resource for readers who are interested in space science and technology.

  • Advances in Software Science and Technology

    • 1st Edition
    • Hiroyasu Kakuda + 2 more
    • English
    Advances in Software Science and Technology, Volume 3 provides information pertinent to the advancement of the science and technology of computer software. This book discusses the various applications for computer systems. Organized into two parts encompassing 11 chapters, this volume begins with an overview of the development of a system of writing tools called SUIKOU that analyzes a machine-readable Japanese document textually. This text then presents the conditioned attribute grammars (CAGs) and a system for evaluating them that can be applied to natural-language processing. Other chapters consider an object-oriented implementation of TCP/IP network protocols, which are based on a connection-oriented implementation model. This book discusses as well the grammar and semantics of RACCO and explains its formal semantics and implementation. The final chapter deals with the rules for submission of English papers that will be published, which includes papers that are reports of academic research by members of the Society. This book is a valuable resource for scientists and research workers.

  • Beam Processing Technologies

    • 1st Edition
    • Volume 21
    • Norman G. Einspruch + 2 more
    • English
    Beam Processing Technologies is a collection of papers that deals with the miniaturization of devices that will be faster, consume less power, and cost less per operation or fabrication. One paper discusses metal oxide semiconductor (MOS) integrated circuit technology including the operation of devices whose lateral and vertical dimensions are scaled down. If the devices' silicon doping profiles are increased by the same scale factor, they can operate on lower voltages and currents, with the same performance. Another paper describes laser beam processing and wafer-scale integration as techniques to increase the number of devices on a silicon chip. Electron beam technologies can be used in many fabrication processes such as in microlithography, selective oxidation, doping, metrology. Ion beam applications depend on the presence of the ion introduced into the device (e.g. implantation doping), on pseudoelastic collisions (e.g. physical sputtering or crystal damage), and on inelastic scattering (e.g. polymer resist exposure). Silicon molecular beam epitaxy (SiMBE) can also grow high-quality layers at low temperature, particularly concerning germanium, especially as reagrds the growth system design and utilization of n- and p-type doping. Chemical beam epitaxy (CBE) is another epitaxial growth technique that can surpass MBE and metal organic chemical vapor deposition (MO-CVD). The collection is suitable chemical engineers, industrial physicists, and researchers whose work involve micro-fabrication and development of integrated circuits.

  • Advances in Cell Culture

    • 1st Edition
    • Volume 6
    • Karl Maramorosch + 1 more
    • English
    Advances in Cell Culture, Volume 6 is a compilation of research papers in the field of cell culture. The contributions reflect the applications of cell culture to biotechnology, to the study of basic mechanisms of cellular behavior, and to the study of pathogens and diseases. This volume contains chapters that deal with the differentiation of human epidermal cells, cell injury, and regeneration in cell culture models; the description of the testing of anticancer compounds in cultured cells; and the interactions of cells and asbestos. Other contributions cover the production in plant tissue culture of the potent antimalarial drug, artemisinin; plant cell suspensions used for studying the mode of action of plant growth retardants; and the in vitro genetic manipulation of cereals and grasses. Also included is a biographical sketch of Nobel Laureate Renato Dulbecco, whose pioneering work on mammalian cell layers has had an enormous impact on cell culture and virology. Cell biologists and researchers who use in vitro techniques will find the book highly informative and insightful.

  • Advances in Software Science and Technology

    • 1st Edition
    • Yoshio Ohno + 2 more
    • English
    Advances in Software Science and Technology, Volume 2 provides information pertinent to the advancement of the science and technology of computer software. This book discusses the various applications for computer systems. Organized into four parts encompassing 12 chapters, this volume begins with an overview of categorical frameworks that are widely used to represent data types in computer science. This text then provides an algorithm for generating vertices of a smoothed polygonal line from the vertices of a digital curve or polygonal curve whose position contains a certain amount of error. Other chapters consider a system that automatically synthesizes a program from a specification written in natural language. The final chapter deals with the rules for submission of English papers that will be published, which includes papers that are reports of academic research by members of the Society. This book is a valuable resource for scientists and research workers.

  • VLSI Electronics

    Microstructure Science
    • 1st Edition
    • Volume 5
    • Norman G. Einspruch
    • English
    VLSI Electronics: Microstructure Science, Volume 5 considers trends for the future of very large scale integration (VLSI) electronics and the scientific base that supports its development. This book discusses the automation for VLSI manufacture, silicon material properties for VLSI circuitry, and high-performance computer packaging and thin-film multichip module. The nanometer-scale fabrication techniques, high-density CCD memories, and solid-state infrared imaging are also elaborated. This text likewise covers the impact of microelectronics upon radar systems and quantum-mechanical limitations on device performance. This volume is a good source for scientists and engineers who wish to become familiar with VLSI electronics, device designers concerned with the fundamental character of and limitations to device performance, systems architects who will be charged with tying VLSI circuits together, and engineers conducting work on the utilization of VLSI circuits in specific areas of application.

  • Plasma Processing for VLSI

    • 1st Edition
    • Volume 8
    • Norman G. Einspruch + 1 more
    • English
    VLSI Electronics: Microstructure Science, Volume 8: Plasma Processing for VLSI (Very Large Scale Integration) discusses the utilization of plasmas for general semiconductor processing. It also includes expositions on advanced deposition of materials for metallization, lithographic methods that use plasmas as exposure sources and for multiple resist patterning, and device structures made possible by anisotropic etching. This volume is divided into four sections. It begins with the history of plasma processing, a discussion of some of the early developments and trends for VLSI. The second section, Deposition, discusses deposition techniques for VLSI such as sputtering metals for metallization and contacts, plasma-enhanced chemical vapor deposition of metals and suicides, and plasma enhanced chemical vapor deposition of dielectrics. The part on Lithography presents the high-resolution trilayer resist system, pulsed x-ray sources for submicrometer x-ray lithography, and high-intensity deep-UV sources. The last part, Etching, provides methods in etching, like ion-beam etching using reactive gases, low-pressure reactive ion etching, and the uses of inert-gas ion milling. The theory and mechanisms of plasma etching are described and a number of new device structures made possible by anisotropic etching are enumerated as well. Scientists, engineers, researchers, device designers, and systems architects will find the book useful.

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