Journals in Surfaces and interfaces

Applied Catalysis A: General

ISSN: 0926-860X

An International Journal Devoted to Catalytic Science and its ApplicationsApplied Catalysis A: General publishes original papers and reviews on all aspects of catalysis of basic and practical interest to chemical scientists in both industrial and academic fields. Papers that focus on advances in catalysis science, especially those that have potential practical implications, by exploring new concepts or new approaches to catalytic processes and materials resulting in new understanding of catalytic phenomena are most welcome.Papers that do not focus on catalytic phenomena and those that report results of a thorough study or optimization of systems or processes that are well understood, widely studied, or minor variations of known ones are strongly discouraged. In their submission, authors are required to include a "Justification for Publication" section comprising a statement detailing the fit of the manuscript to the scope of the journal. Submissions made without the inclusion of such a justification will be rejected without review.When preparing an article for submission, it is important that the authors describe their work succinctly in the context of any related published work emphasizing the novel contributions made. Simply reporting new catalyst compositions without delivering associated new insights in catalytic science will be insufficient for publication.

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Applied Catalysis B: Environment and Energy

ISSN: 0926-3373

Applied Catalysis B: Environment and Energy warmly welcomes original, innovative, and high-impact contributions within the realm encompassing thermo-, electro-, and photocatalysis to advance clean energy and provide sustainable environmental solutions. We encourage submissions that explore:Fundamental and applied catalysis research, advancing clean energy and sustainable environmental solutions.Catalysis-... insights fostering the development of sustainable industrial processes, elevating our collective knowledge base.Every facet of catalyst synthesis, characterization, catalytic mechanisms, and strategies for catalyst activation and regeneration, all tailored for environmental and energy applications.Catalyt... strategies aimed at abating environmental pollutants, addressing a wide array including nitrogen oxides, carbon monoxide, sulfur compounds, chlorinated organics, and soot, emitted from both stationary and mobile sources.Pioneering catalytic routes and processes facilitating the efficient production and conversion of clean energy, marking a paradigm shift in the landscape energy sourcing.Catalytic reactions adeptly transforming waste materials into valuable and useful products, amplifying the concept of sustainability through resource recycling.The journal welcomes submissions of original Research Papers, Reviews, Perspectives, and Letters to the Editor. Reviews and Perspectives are by invitation only.

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Applied Surface Science

ISSN: 0169-4332

A Journal Devoted to Applied Physics and Chemistry of Surfaces and InterfacesApplied Surface Science covers topics contributing to a better understanding of surfaces, interfaces, nanostructures and their applications. The journal is concerned with scientific research on the atomic and molecular level of material properties determined with specific surface analytical techniques and/or computational methods, as well as the processing of such structures.This journal accommodates the following topics:Surface science of catalysis, electrocatalysis and photocatalysis;Depos... and growth;2D assembly;Surface and interface modification by directed energy deposition (lasers, ion or electron beams) or other techniques such as plasmas;Surface engineering and functionalization;Fu... surfaces and coatings;Electrochem... at surfaces and corrosion protection strategies;Surface science applied to energy conversion and storage;Surface nanotechnology and devices;Semiconducto... - surface and interface;Biointerfa... to authors In order to be considered for publication, your paper must be a research study on the atomic and molecular level of material properties determined with specific surface approaches, either by experimental techniques or computational methods. If not, your submission will not be considered for publication and will not be sent out for peer-review. Content related to research presented at scientific events?can be submitted to the journal?s companion title, Applied Surface Science Advances.Benefits to authors We also provide many author benefits, such as free PDFs, a liberal copyright policy, special discounts on Elsevier publications and much more. Please click here for more information on our author services.Please see our Guide for Authors for information on article submission. If you require any further information or help, please visit our Support Center

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Colloids and Surfaces A: Physicochemical and Engineering Aspects

ISSN: 0927-7757

An International Journal Devoted to the Principles and Applications of Colloid and Interface ScienceColloids and Surfaces A: Physicochemical and Engineering Aspects is an international journal devoted to the science underlying applications of colloids and interfacial phenomena.The journal aims at publishing high quality research papers featuring new materials or new insights into the role of colloid and interface science in (for example) food, energy, minerals processing, pharmaceuticals or the environment.Criteria for publication in Colloids and Surfaces A are novelty, quality and current interest. Manuscripts which only make routine use of or minor extensions to well established methodologies (e.g. fitting adsorption data to a Langmuir or Freundlich isotherm) are not appropriate for the journal.For online article submission please go to: https://www.editoria... to authors We also provide many author benefits, such as free PDFs, a liberal copyright policy, special discounts on Elsevier publications and much more. Please click here for more information on our author services.Please see our Guide for Authors for information on article submission. If you require any further information or help, please visit our Support Center

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Current Applied Physics

ISSN: 1567-1739

Physics, Chemistry and Materials Science An official journal of the Korean Physical SocietyCurrent Applied Physics (Curr. Appl. Phys.) is a monthly published international interdisciplinary journal covering all applied science in physics, chemistry, and materials science, with their fundamental and engineering aspects.Topics covered in the journal are diverse and reflect the most current applied research, including:• Spintronics and superconductivity • Photonics, optoelectronics, and spectroscopy • Semiconductor device physics • Physics and applications of nanoscale materials • Plasma physics and technology • Advanced materials physics and engineering • Dielectrics, functional oxides, and multiferroics • Organic electronics and photonics • Energy-related materials and devices • Advanced optics and optical engineering • Biophysics and bioengineering, including soft matters and fluids • Emerging, interdisciplinary and others related to applied physics • Regular research papers, letters and review articles with contents meeting the scope of the journal will be considered for publication after peer review.The journal is owned by the Korean Physical Society (http://www.kps.or.k... )

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Diamond and Related Materials

ISSN: 0925-9635

DRM is a leading international journal that publishes new fundamental and applied research on all forms of diamond, the integration of diamond with other advanced materials and development of technologies exploiting diamond. The synthesis, characterization and processing of single crystal diamond, polycrystalline films, nanodiamond powders and heterostructures with other advanced materials are encouraged topics for technical and review articles. In addition to diamond, the journal publishes manuscripts on the synthesis, characterization and application of other related materials including diamond-like carbons, carbon nanotubes, graphene, and boron and carbon nitrides. Articles are sought on the chemical functionalization of diamond and related materials as well as their use in electrochemistry, energy storage and conversion, chemical and biological sensing, imaging, thermal management, photonic and quantum applications, electron emission and electronic devices.The International Conference on Diamond and Carbon Materials has evolved into the largest and most well attended forum in the field of diamond, providing a forum to showcase the latest results in the science and technology of diamond and other carbon materials such as carbon nanotubes, graphene, and diamond-like carbon. Run annually in association with Diamond and Related Materials the conference provides junior and established researchers the opportunity to exchange the latest results ranging from fundamental physical and chemical concepts to applied research focusing on the next generation carbon-based devices.Benefits to authors We also provide many author benefits, such as free PDFs, a liberal copyright policy, special discounts on Elsevier publications and much more. Please click here for more information on our author services.Please see our Guide for Authors for information on article submission. If you require any further information or help, please visit our Support Center

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Journal of Crystal Growth

ISSN: 0022-0248

The Journal of Crystal Growth offers a common reference and publication source for workers engaged in research on the experimental and theoretical aspects of crystal growth and its applications, e.g. in devices. Experimental and theoretical contributions are published in the following fields: theory of nucleation and growth, molecular kinetics and transport phenomena, crystallization in viscous media such as polymers and glasses; crystal growth of metals, minerals, semiconductors, superconductors, magnetics, inorganic, organic and biological substances in bulk or as thin films; molecular beam epitaxy, chemical vapor deposition, growth of III-V and II-VI and other semiconductors; characterization of single crystals by physical and chemical methods; apparatus, instrumentation and techniques for crystal growth, and purification methods; multilayer heterostructures and their characterisation with an emphasis on crystal growth and epitaxial aspects of electronic materials. A special feature of the journal is the periodic inclusion of proceedings of symposia and conferences on relevant aspects of crystal growth.Note Please see our Guide for Authors for information on article submission. If you require any further information or help, please visit our Support Center.

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Journal of Electron Spectroscopy and Related Phenomena

ISSN: 0368-2048

The Journal of Electron Spectroscopy and Related Phenomena publishes experimental, theoretical and applied work in the field of electron spectroscopy and electronic structure, involving techniques which use high energy photons (>10 eV) or electrons as probes or detected particles in the investigation.The journal encourages contributions in the general area of atomic, molecular, ionic, liquid and solid state spectroscopy carried out using electron impact, synchrotron radiation (including free electron lasers) and short wavelength lasers. Papers using photoemission and other techniques, in which synchrotron radiation, Free Electron Lasers, laboratory lasers or other sources of ionizing radiation, combined with electron velocity analysis are especially welcome. The materials properties addressed include characterization of ground and excited state properties as well as time resolved electron dynamics.The individual techniques of electron spectroscopy include photoelectron spectroscopy of both outer and inner shells; inverse photoemission; spin-polarised photoemission; time resolved 2-photon photoemission, resonant and non-resonant Auger spectroscopy including ion neutralization studies; edge techniques (EXAFS, NEXAFS,...) , resonant and non-resonant inelastic X-ray scattering (RIXS), spectro-microscopy, high resolution electron energy loss spectroscopy; electron scattering and resonance electron capture; electron spectroscopy in conjunction with microscopy; penning ionization spectroscopy including scanning tunneling spectroscopy; theoretical treatments of the photoemission, X-ray emission, Auger, energy loss and Penning ionization processes. Contributions on instrumentation and technique development, date acquisition - analysis - quantification are also welcome.Subject areas covered include spectroscopic characterization of materials and processes concerning: - surfaces, interfaces, and thin films; - atomic and molecular physics, clusters; - semiconductor physics and chemistry; - materials for photovoltaics; - materials science including: metal surfaces, nanoparticles, ceramics, strongly correlated systems, polymers, biomaterials and other organic films; - catalysis

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Journal of Nuclear Materials

ISSN: 0022-3115

The Journal of Nuclear Materials publishes high quality papers in materials research for nuclear applications, primarily fission reactors, fusion reactors, and similar environments including radiation areas of charged particle accelerators. Both original research and critical review papers covering experimental, theoretical, and computational aspects of either fundamental or applied nature are welcome.Papers submitted to JNM should exhibit a high degree of novelty and contain a significant discussion section that analyzes and interprets the results with outcomes that advance our understanding and push the field forward. Incremental research papers are not acceptable.The breadth of the field is such that a wide range of processes and properties in the field of materials science and engineering is of interest to the readership, spanning atom-scale processes, microstructures, thermodynamics, mechanical properties, physical properties, and corrosion, for example.Topics covered by JNM Fission reactor materials, including fuels, cladding, core structures, pressure vessels, coolant interactions with materials, moderator and control components, fission product behavior.Materials aspects of the entire fuel cycle.Materials aspects of the actinides and their compounds.Performanc... of nuclear waste materials; materials aspects of the immobilization of wastes.Fusion reactor materials, including first walls, blankets, insulators and magnets.Neutron and charged particle radiation effects in materials, including defects, transmutations, microstructures, phase changes and macroscopic properties.Interacti... of plasmas, ion beams, electron beams and electromagnetic radiation with materials relevant to nuclear systems.Topics NOT covered by JNMTopics in nuclear engineering and other areas not addressing materials, such as:Particle transport, cross-sections, shielding or isotope ratios (Radiation Physics and Chemistry; Annals of Nuclear Energy, Applied Radiation and Isotopes)Process engineering (Materials Science and Engineering A; Materials and Design)Leaching or chemical kinetics studies in aqueous, salt or other media (Hydrometallurgy; Chemical Engineering Science)Thermal hydraulics or properties of fluids (Nuclear Engineering and Design)Uranium extraction, uranium ore processing, and isotope separation processes (Nuclear Engineering and Design; Progress in Nuclear Energy)Fission or fusion reactor design and technology (Nuclear Engineering and Design; Fusion Engineering & Design)Plasma physics (Physics Letters A)Materials topics not addressing nuclear applications, such as general studies in:Physical and chemical properties including modeling and simulation (Materials Science and Engineering A; Materials Letters)Metallurgy (Journal of Alloys and Compounds; Materials Science and Engineering A)Corrosion (Corrosion Science)Welding and joining (Journal of Alloys and Compounds; Materials and Design)Ceramics (Journal of the European Ceramics Society; Ceramics international)

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Microelectronic Engineering

ISSN: 0167-9317

Nanotechnology and Processing — Electronics, photonics, MEMS and Life Sciences Affiliated with iMNEsMicroelectronic Engineering is the premier journal focused on the fabrication and characterization of micro/nano-electroni... materials, devices and circuits (including novel electronic nanomaterials), as well as the understanding of their working mechanisms, performance, yield, variability, stability, and reliability. The journal also focuses on the techniques that make possible the fabrication and characterization of such devices and circuits, and on the materials involved in them. Occasionally, outstanding papers on simulation of materials properties, device figures-of-merit or compact modeling of circuits and systems may be accepted. The following topics are of special interest:DevicesPhot... and optoelectronic devices (including, sensors, actuators, phototransistors)Tra... (including ultra-scaled, thin film, organic, ferroelectric)Resist... switching devices (memristors, RRAM, PCRAM, FeRAM, MRAM)Magnetic and spintronic devicesMEMS and NEMS (including power, RF, magnetic, organic)Flexible electronic devices (including wearable, printed, paper)Devices for energy harvesting (piezoelectric, flexoelectric, photovoltaic, solar cells)Bioelectronic devices (molecular detection, biomimetic, diagnosis)Device-lev... simulations (including variability and reliability)Material... bandgap semiconductorsDielec... (low K and high K)Two-dimensional (2D) Materials and related transferring techniquesNanotubes, nanowires, and other nanomaterials and nanostrctures for device fabricationInterconn... metallization and barrier materialsNew Resist MaterialsSilicon on insulatorsPolymers and flexible substrates, including biocompatible materialsAtomistic simulations of materials propertiesFabricatio... and characterization processesThin films deposition techniques (CVD, ALD, evaporation, sputtering, MBE, plasma)Lithography (including optical, EUV, electron beam, nanoimpring, particle-assisted, mask less, X-ray optical methods, emerging methods and limits, as well as resists)Pattern transfer (including ion, plasma and wet transfer, as well as transfer of 2D materials)Integratio... processes (including inkjet printing, 3D printing, 3D integration)Top-down and bottom-up self-assembly processesAnnealing and its effect in the materials (including crystallization, wrinkling, de-wetting)Nanometro... (TEM, SEM, EDX, EELS, STM, AFM and related setups)Circuits and applicationsSensing and actuation, including bio-compatible applicationsSignal souring and transferLogic operations and data processingElectronic memories and information storageArtificial neural networks and neuromorphic computingCompact modeling of electronic circuitsQuantum computingFive different types of articles are considered:Research articles that report regular original research that produces significant advancement.Accelera... Publications (Letters) that feature exciting research breakthroughs.Review Articles that inform readers of the latest research and advances in a topic within the broad field of microelectronic engineering. This includes roadmaps and guides proposing the recommended methods in a specific field.Short / Technical notes intended for original limited investigations or short description of original industrial or industrially-related research and development workNews and Opinions that comment on topical issues or express views on the developments in related fields, or comment on previously published work

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Processing of surfaces

Structure and properties of surfaces interfaces and thin films

Surfaces and interfaces general

Vacuum technology

Life Sciences

Physical Sciences & Engineering

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Health

Journals in Surfaces and interfaces

Applied Catalysis A: General

Applied Catalysis B: Environment and Energy

Applied Surface Science

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Current Applied Physics

Diamond and Related Materials

Journal of Crystal Growth

Journal of Electron Spectroscopy and Related Phenomena

Journal of Nuclear Materials

Microelectronic Engineering

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