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Books in Structure and properties of surfaces interfaces and thin films

  • Metal Oxide Supported Metal Nanoparticles

    Synthesis, Characterization, and Applications
    • 1st Edition
    • Fabiano Bernardi
    • English
    Metal Oxide Supported Metal Nanoparticles: Synthesis, Characterization, and Applications combines a theoretical description of the metal–oxide interface and its fabrication with the current state-of-the-art in characterization and applications. The book takes a holistic approach that allows readers to view this complex field of research from many different angles, reach new conclusions, and develop new methods and materials. It presents approaches to these materials from a diverse range of perspectives, providing a comprehensive resource for researchers in materials science, engineering, physics, and chemistry to learn about the latest developments in the field.It addition, the book elaborates on how different synthesis techniques from different fields can be applied to metal oxide supported metal nanoparticles. Recent uses of metal oxide supported metal nanoparticles are also presented, including applications in the catalysis, photocatalysis, energy, and sensor fields.

  • Nanostructured Thin Film Deposition by Sputtering

    From Fundamentals to Applications
    • 1st Edition
    • Kanak Kalita + 3 more
    • English
    Nanostructured Thin Film Deposition by Sputtering: From Fundamentals to Applications provides an exhaustive overview of the significant influence of sputtering in the production of nanostructured thin films. It begins with a review of the historical evolution and fundamental principles inherent to sputtering before delving into a thorough examination of thin films, covering their distinctive properties, the impact of sputtering, and the role of target materials. Building upon this base, the book unveils advanced sputtering methodologies, augmented with applicable case studies. The book provides an in-depth study of nanostructured thin films, addressing their diverse forms, and the elaborate procedures for nanostructure characterization. Finally, it embarks on an extensive analysis of the broad range of applications of sputtered nanostructured thin films, with a focus on sectors such as electronics, optics, biomedicine, and environmental science, as well as promising domains like automotive, oil and gas, food, and energy sectors. This approach offers a sweeping view of sputtering, bridging basic concepts and sophisticated aspects, thereby crafting an invaluable compendium for both researchers and learners in the field.

  • Transition Metal Oxide Thin Film-Based Chromogenics and Devices

    • 1st Edition
    • Pandurang Ashrit
    • English
    The phase transition and the reversible optical and electrical switching that occur in chromogenic materials under the influence of external forces such as heat, light, and electric field are topics of enormous scientific interest. Transition Metal Oxide Thin Film–Based Chromogenics and Devices discusses experimental and theoretical developments in the field of chromogenics based on the transition metal oxide (TMO) thin films. Understanding the relationship between the switching properties of TMO materials and their nanostructure is of paramount importance in developing efficient chromogenic devices. The tailoring of these switching behaviors is afforded detailed coverage in this book, alongside in-depth discussion of a range of chromogenic materials and devices, including photochromics, thermochromics, and electrochromics. Transition Metal Oxide Thin Film–Based Chromogenics and Devices covers both the theoretical aspects of TMO thin film–based chromogenics and their engineering applications in device construction. Academics and professionals in the fields of materials science and optics will find this book to be a key resource, whether their focus is low-dimension materials, light-materials interactions, or device development.

  • Control of Semiconductor Interfaces

    Proceedings of the First International Symposium, on Control of Semiconductor Interfaces, Karuizawa, Japan, 8-12 November, 1993
    • 1st Edition
    • I. Ohdomari + 2 more
    • English
    This book focuses exclusively on control of interfacial properties and structures for semiconductor device applications from the point of view of improving and developing novel electrical properties. The following topics are covered: metal-semiconductors... semiconductor hetero-interfaces, characterization, semiconducting new materials, insulator-semiconduc... interfaces in device, control of interface formation, control of interface properties, contact metallization.A variety of up-to-date research topics such as atomic layer epitaxy, atomic layer passivation, atomic scale characterization including STM and SR techniques, single ion implementation, self-organization crystal growth, in situ measurements for process control and extremely high-spatial resolution analysis techniques, are also included. Furthermore it bridges the macroscopic, mesoscopic, and atomic-scale regimes of semicondutor interfaces, describing the state of the art in forming, controlling and characterizating unique semiconductor interfaces, which will be of practical importance in advanced devices. Intended for both technologists who require an up-to-date assessment of methods for interface formation, processing and characterization, and solid state researchers who desire the latest developments in understanding the basic mechanisms of interface physics, chemistry and electronics, this book will be a welcome addition to the existing literature.

  • Applications of Diamond Films and Related Materials

    Proceedings of the First International Conference on the Applications of Diamond Films and Related Materials - ADC '91, Auburn, Alabama, U.S.A., August 17-22, 1991
    • 1st Edition
    • Volume 73
    • Y. Tzeng + 3 more
    • English
    An intensifying interest from the scientific, technical, and industrial community in the new diamond technology can be attested to by the wide range of contributions in this proceedings volume. The papers discuss topics such as the applications of diamond films and related wide bandgap semiconductors and superhard materials. These materials are rapidly becoming economically significant due to their combination of superior properties: great hardness, high thermal conductivity, chemical inertness, high stiffness, high carrier mobilities, etc. Initial commercial products employing the new diamond technology are already on the market. These include diamond loudspeakers, diamond X-ray windows, diamond bonders, diamond cutting tools, and heads for magnetic disks coated with diamond-like carbon. The developments reported in this volume are important not only in terms of their own markets, but, also because they are expected to enable a wide range of other new products and production methods.

  • Thin Films by Chemical Vapour Deposition

    • 1st Edition
    • Volume 7
    • C.E. Morosanu
    • G. Siddall
    • English
    The explosive growth in the semiconductor industry has caused a rapid evolution of thin film materials that lend themselves to the fabrication of state-of-the-art semiconductor devices. Early in the 1960s an old research technique named chemical vapour phase deposition (CVD), which has several unique advantages, developed into the most widely used technique for thin film preparation in electronics technology. In the last 25 years, tremendous advances have been made in the science and technology of thin films prepared by means of CVD. This book presents in a single volume, an up-to-date overview of the important field of CVD processes which has never been completely reviewed previously. Contents: Part I. 1. Evolution of CVD Films. Introductory remarks. Short history of CVD thin films. II. Fundamentals. 2. Techniques of Preparing Thin Films. Electrolytic deposition techniques. Vacuum deposition techniques. Plasma deposition techniques. Liquid-phase deposition techniques. Solid-phase deposition techniques. Chemical vapour conversion of substrate. Chemical vapour deposition. Comparison between CVD and other thin film deposition techniques. 3. Chemical Processes Used in CVD. Introduction. Description of chemical reactions used in CVD. 4. Thermodynamics of CVD. Feasibility of a CVD process. Techniques for equilibrium calculations in CVD systems. Examples of thermodynamic studies of CVD systems. 5. Kinetics of CVD. Steps and control type of a CVD heterogeneous reaction. Influence of experimental parameters on thin film deposition rate. Continuous measurement of the deposition rate. Experimental methods for studying CVD kinetics. Role of homogeneous reactions in CVD. Mechanism of CVD processes. Kinetics and mechanism of dopant incorporation. Transport phenomena in CVD. Status of kinetic and mechanism investigations in CVD systems. 6. Measurement of Thin Film Thickness. Mechanical methods. Mechanical-optical methods. Optical methods. Electrical methods. Miscellaneous methods. 7. Nucleation and Growth of CVD Films. Stages in the nucleation and growth mechanism. Regimes of nucleation and growth. Nucleation theory. Dependence of nucleation on deposition parameters. Heterogeneous nucleation and CVD film structural forms. Homogeneous nucleation. Experimental techniques. Experimental results of CVD film nucleation. 8. Thin Film Structure. Techniques for studying thin film structure. Structural defects in CVD thin films. 9. Analysis of CVD Films. Analysis techniques of thin film bulk. Analysis techniques of thin film surfaces. Film composition measurement. Depth concentration profiling. 10. Properties of CVD Films. Mechanical properties. Thermal properties. Optical properties. Photoelectric properties. Electrical properties. Magnetic properties. Chemical properties. Part III. 11. Equipment and Substrates. Equipment for CVD. Safety in CVD. Substrates. 12. Preparation and Properties of Semiconducting Thin Films. Homoepitaxial semiconducting films. Heteroepitaxial semiconducting films. 13. Preparation and Properties of Amorphous Insulating Thin Films. Oxides. Nitrides and Oxynitrides. Polymeric thin films. 14. Preparation and Properties of Conductive Thin Films. Metals and metal alloys. Resistor materials. Transparent conducting films. Miscellaneous materials. 15. Preparation and Properties of Superconducting and Magnetic Thin Films. Superconducting materials. Magnetic materials. 16. Uses of CVD Thin Films. Applications in electronics and microelectronics. Applications in the field of microwaves and optoelectronics. Miscellaneous applications. Artificial heterostructures (Quantum wells, superlattices, monolayers, two-dimensional electron gases). Part V. 17. Present and Future Importance of CVD Films. Present status and future trends in CVD films. References. Index of Acronyms and Abbreviations. Author Index. CVD Film Index. Subject Index. Supplier Index.

  • Size Effects in Thin Films

    • 1st Edition
    • Volume 2
    • C.R. Tellier + 1 more
    • G. Siddall
    • English
    A complete and comprehensive study of transport phenomena in thin continuous metal films, this book reviews work carried out on external-surface and grain-boundary electron scattering and proposes new theoretical equations for transport properties of these films. It presents a complete theoretical view of the field, and considers imperfection and impurity effects.

  • Superhydrophobic Surfaces

    • 1st Edition
    • Russell J. Crawford + 1 more
    • English
    Superhydrophobic Surfaces analyzes the fundamental concepts of superhydrophobicity and gives insight into the design of superhydrophobic surfaces. The book serves as a reference for the manufacturing of materials with superior water-repellency, self-cleaning, anti-icing and corrosion resistance. It thoroughly discusses many types of hydrophobic surfaces such as natural superhydrophobic surfaces, superhydrophobic polymers, metallic superhydrophobic surfaces, biological interfaces, and advanced/hybrid superhydrophobic surfaces.

  • Physics of Polymer Surfaces and Interfaces

    • 1st Edition
    • Isaac C. Sanchez
    • English
    Physics of Polymer Surfaces and Interfaces emphasizes current theoretical ideas and modern experimental tools for characterizing the physical properties of polymer surfaces and interfaces. Foremost are their important roles in polymer technologythroughthe processes of wetting, adhesion, adsorption, and through their effect on the kinetics of phase separation and mechanical mixing of molten polymers. Each of the 14 chapters in this book stands as a 'mini-review' of a specific subject. Thisup-to-date compendium of the most significant theoretical and experimental works provides a scientific understanding of the physics of polymer interfaces and surfaces and will aid scientists in planning and interpreting new results.

  • Organic Thin Films and Surfaces: Directions for The Nineties

    Directions for the Nineties
    • 1st Edition
    • Volume 20
    • Abraham Ulman
    • English
    Physics of Thin Films has been one of the longest running continuing series in thin film science consisting of 20 volumes since 1963. The series contains some of the highest quality studies of the properties ofvarious thin films materials and systems.In order to be able to reflect the development of todays science and to cover all modern aspects of thin films, the series, beginning with Volume 20, will move beyond the basic physics of thin films. It will address the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.Edited by Abraham Ulman, Organic Thin Films and Surfaces: Directions for the Nineties will be the first volume to link two dynamic areas in the physical sciences--organic thin films and surface science. Contributions from leading experts in the field cover a range of important topics on the processing, characterization, and applications of organic thin films.

  • Langmuir-Blodgett Films

    • 1st Edition
    • Volume 1
    • W.A. Barlow
    • English
    Topics covered range from basic structural studies to areas as diverse as electron tunneling, photovoltaic effects and solid state polymerisation.

  • Thin Films for Advanced Electronic Devices

    Advances in Research and Development
    • 1st Edition
    • Volume 15
    • Maurice H. Francombe
    • English
    In this volume of the highly esteemed Physics of Thin Films serial, focused coverage is given to new trends in solid state devices. Four chapters combine to provide comprehensive discussions of magnetostatic wave phenomena in epitaxial magnetic oxide films and their applications in microwave signal processing devices: Thin-film rare earth transition metal alloys for magnetooptic recording. Two new classes of quantum well structures that have been used for infrared detectors and ultrafast resonant tunneling devices. Recent applications of Fourier transform spectroscopy for the analysis of inorganic thin solid films. This book provides a focused treatment of recent developments in novel thin film solid state components, and specifically discusses magnetic, semiconducting, and optical phenomena.

  • Theory and Practice of Emulsion Technology

    • 1st Edition
    • A.L. Smith
    • English
    Theory and Practice of Emulsion Technology covers the proceedings of the Theory and Practice of Emulsion Technology Symposium, held at Brunel University on September 16-18, 1974. This book is organized into four sessions encompassing 19 chapters. The opening session deals with the emulsification process and emulsion polymerization, as well as the adsorption behavior of polyelectrolyte-stab... emulsions. The following session examines the rheological properties, stability, and fluid mechanics of emulsions. This session also looks into the role of protein conformation and crude oil-water interfacial properties in emulsion stability. The third session highlights the preparation, formation, properties, and application of bitumen emulsions. The concluding session describes the process of spontaneous emulsification; the steric emulsion stabilization; the interfacial measurements of oil-in-water emulsions; and the influence of the disperse phase on emulsion stability. This book will be of value to chemists, chemical and process engineers, and researchers.

  • Vacuum Technology, Thin Films, and Sputtering

    An Introduction
    • 1st Edition
    • R. V. Stuart
    • English
    Vacuum technology is advancing and expanding so rapidly that a major difficulty for most companies in the field is finding qualified technicians needed for expansion and as replacements. The only recourse for most companies is to hire capable, though untrained, people to train them in-house. One of the problems in this course of action is that it repeatedly draws on the valuable time of experienced personnel to explain fundamental concepts to a trainee.

  • Metallurgical Coatings and Thin Films 1991

    • 1st Edition
    • G.E. McGuire + 2 more
    • English
    The contributions in this two-volume set represent the work of over two hundred international researchers from universities, government laboratories and industry, with diverse backgrounds and interests in a wide range of coatings and thin film processes. The two hundred and six papers attest to the fact that Metallurgical Coatings is a rapidly growing field attracting experts from the large materials, scientific and technical community. The papers will be a useful and dynamic tool for those wishing to increase their knowledge on metallurgical coatings, as well as providing a guide to recent literature in this field.

  • Methods of Surface Analysis

    • 1st Edition
    • Volume 1
    • A.W. Czanderna
    • English
    Methods of Surface Analysis deals with the determination of the composition of surfaces and the identification of species attached to the surface. The text applies methods of surface analysis to obtain a composition depth profile after various stages of ion etching or sputtering. The composition at the solid—solid interface is revealed by systematically removing atomic planes until the interface of interest is reached, in which the investigator can then determine its composition. The book reviews the effect of ion etching on the results obtained by any method of surface analysis including the effect of the rate of etching, incident energy of the bombarding ion, the properties of the solid, the effect of the ion etching on generating an output signal of electrons, ions, or neutrals. The text also describes the effect of the residual gases in the vacuum environment. The book considers the influence of the sample geometry, of the type (metal, insulator, semiconductor, organic), and of the atomic number can have on surface analysis. The text describes in detail low energy ion scattering spectroscopy, X-ray photoelectron spectroscopy, Auger electron spectroscopy, secondary ion mass spectroscopy, and infrared reflection-absorptio... spectroscopy. The book can prove useful for researchers, technicians, and scientists whose works involve organic chemistry, analytical chemistry, and other related fields of chemistry, such as physical chemistry or inorganic chemistry.

  • Surfaces and Interfaces: Physics and Electronics

    • 1st Edition
    • R.S. Bauer
    • English
    Surfaces and Interfaces: Physics and Electronics covers the proceedings of the second Trieste ICTP-IUPAP Semiconductor Symposium, conducted at the International Center for Theoretical Physics in Trieste, Italy on August 30 to September 3, 1982. The book focuses on the processes, methodologies, reactions, and approaches involved in semiconductor physics. The selection first elaborates on the electronic properties and surface geometry of GaAs and ZnO surfaces; electronic structure of Si (III) surfaces; and photoemission studies of surface states on Si (III) 2X1. Discussions focus on consistency of different experiments, relating experiments to a theoretical model, quenching of surface states by hydrogen, inverse photoemission results, and basic data and models of the low-index ZnO surfaces. The text then examines Si (III) 2X1 studies by angle resolved photoemission; electronic surface states at steps in Si (III) 2X1; and a novel method for the study of optical properties of surfaces. The manuscript takes a look at spot profile analysis (LEED) of defects at silicon surfaces; chemisorption-induce... defects at interfaces on compound semiconductors; and surface defects on semiconductors. The microscopic properties and behavior of silicide interfaces, recombination at semiconductor surfaces and interfaces, and dipoles, defects, and interfaces are also discussed. The selection is a highly recommended source of data for physicists and readers wanting to study semiconductor physics.

  • Semiconductor Materials Analysis and Fabrication Process Control

    • 1st Edition
    • Volume 34
    • G.M. Crean + 2 more
    • English
    There is a growing awareness that the successful implementation of novel material systems and technology steps in the fabrication of microelectronic and optoelectronic devices, is critically dependent on the understanding and control of the materials, the process steps and their interactions. The contributions in this volume demonstrate that characterisation and analysis techniques are an essential support mechanism for research in these fields. Current major research themes are reviewed both in the development and application of diagnostic techniques for advanced materials analysis and fabrication process control. Two distinct trends are elucidated: the emergence and evaluation of sophisticated in situ optical diagnostic techniques such as photoreflectance and spectroellipsometry and the industrial application of ultra-high sensitivity chemical analysis techniques for contamination monitoring. The volume will serve as a useful and timely overview of this increasingly important field.

  • Metallurgical Coatings and Thin Films 1992

    • 1st Edition
    • G.E. McGuire + 2 more
    • English
    One of the increasingly important requirements for high technology materials is that they possess near-surface properties different to their bulk properties. Specific surface properties are generally achieved through the use of these films or coatings or by modifying the structure or composition of the near surface. This two-volume work contains 157 papers covering a wide range of topics involving films, coatings, and modified surfaces. All aspects of the development of deposition technologies are addressed including basic research, applied research, applications development and full scale industrial production. The work will be of interest to materials scientists, physicists, electronic, chemical and mechanical engineers, and chemists.

  • Thin Film Processes

    • 1st Edition
    • John L. Vossen
    • English
    Remarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines for their implementation, a guide to the literature, and an overview of each process.

  • Shallow Impurity Centers in Semiconductors

    • 1st Edition
    • A. Baldereschi + 1 more
    • English
    Shallow Impurity Centers in Semiconductors presents the proceedings of the Second International Conference on Shallow Impurity Centers/Fourth Trieste IUPAP-ICTP Semiconductor Symposium, held at the International Center for Theoretical Physics in Trieste, Italy, on July 28 to August 1, 1986. The book presents the perspectives of some of the leading scientists in the field who address basic physical aspects and device implications, novel phenomena, recent experimental and theoretical techniques, and the behavior of impurities in new semiconductor materials. Organized into 22 chapters, the book begins with an overview of the early years of shallow impurity states before turning to a discussion of progress in spectroscopy of shallow centers in semiconductors since 1960. It then looks at theoretical and experimental aspects of hydrogen diffusion and shallow impurity passivation in semiconductors, along with optical excitation spectroscopy of isolated double donors in silicon. The book methodically walks the reader through recent research on double acceptors using near-, mid-, and far-infrared spectroscopy, the far-infrared absorption spectrum of elemental shallow donors and acceptors in germanium, and impurity spectra in stress-induced uniaxial germanium using Zeeman spectroscopy. Other papers focus on the theoretical properties of hydrogenic impurities in quantum wells, lattice relaxations at substitutional impurities in semiconductors, shallow bound excitons in silver halides, and the electronic structure of bound excitons in semiconductors. The book concludes with a chapter that reviews picosecond spectroscopy experiments performed in III-V compounds and alloy semiconductors. This volume will be useful to physicists and researchers who are working on shallow impurity centers in semiconductor physics.

  • High Tc Superconductor Thin Films

    • 1st Edition
    • L. Correra
    • English
    Interdisciplinary research on superconducting oxides is the main focus of the contributions in this volume. Several aspects of the thin film field from fundamental properties to applications are examined. Interesting results for the Bi system are also reviewed. The 132 papers, including 8 invited, report mainly on the 1-2-3 system, indicating that the Y-Ba-Cu-O and related compounds are still the most intensively studied materials in this field. The volume attests to the significant progress that has been made in this field, as well as reporting on the challenging problems that still remain to be solved.

  • Photonic Probes of Surfaces

    • 1st Edition
    • P. Halevi
    • English
    This volume is devoted principally to optical spectroscopies of material surfaces and also encompasses scattering techniques and theoretical response analysis as well as spectroscopies. In addition to solid surfaces some attention is also devoted to interfaces between two solids, between a solid and a liquid and to a liquid-vapor interface. These surfaces may be clean and perfect, in which case the purpose of the spectroscopical method at hand is to determine the deviation of the atomic structure in the surface region from that in the bulk, namely the surface reconstruction. Otherwise the surface may be imperfect due to roughness, strain or overlayers, in which case the spectroscopy can yield information on the nature of such imperfections, including the monitoring of growth processes. One of the foremost purposes of surface spectroscopies is to extract information on atomic and molecular adsorbates on solid surfaces. Most of the 10 chapters are concerned with photonic sources of excitation, the respective spectral regions ranging from the far infrared to X-rays.In conclusion this book provides a state-of-the-art review of all major types of photonic probes of surfaces and interfaces and deals with both applications and experiment and theory.

  • Thin Film Processes II

    • 1st Edition
    • Werner Kern
    • John L. Vossen
    • English
    This sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to the literature. Though edited to stand alone, when taken together, Thin Film Processes II and its predecessor present a thorough grounding in modern thin film techniques.

  • Silicon Molecular Beam Epitaxy

    • 1st Edition
    • Volume 10A
    • Erwin Kasper + 1 more
    • English
    This two-volume work covers recent developments in the single crystal growth, by molecular beam epitaxy, of materials compatible with silicon, their physical characterization, and device application. Papers are included on surface physics and related vacuum synthesis techniques such as solid phase epitaxy and ion beam epitaxy.A selection of contents: Volume I. SiGe Superlattices. SiGe strained layer superlattices (G. Abstreiter). Optical properties of strained GeSi superlattices grown on (001)Ge (T.P. Pearsall et al.). Growth and characterization of SiGe atomic layer superlattices (J.-M. Baribeau et al.). Optical properties of perfect and imperfect SiGe superlattices (K.B. Wong et al.). Confined phonons in stained short-period (001) Si/Ge superlattices (W. Bacsa et al.). Calculation of energies and Raman intensities of confined phonons in SiGe strained layer superlattices (J. White et al.). Rippled surface topography observed on silicon molecular beam epitaxial and vapour phase epitaxial layers (A.J. Pidduck et al.). The 698 meV optical band in MBE silicon (N. de Mello et al.). Silicon Growth Doping. Dopant incorporation kinetics and abrupt profiles during silicon molecular beam epitaxy (J.-E. Sundgren et al.). Influence of substrate orientation on surface segregation process in silicon-MBE (K. Nakagawa et al.). Growth and transport properties of SimSb1 (H. Jorke, H. Kibbel). Author Index. Volume. II. In-situ electron microscope studies of lattice mismatch relaxation in GexSi1-x/Si heterostructures (R. Hull et al.). Heterogeneous nucleation sources in molecular beam epitaxy-grown GexSi1-x/Si strained layer superlattices (D.D. Perovic et al.). Silicon Growth. Hydrogen-terminated silicon substrates for low-temperature molecular beam epitaxy (P.J. Grunthaner et al.). Interaction of structure with kinetics in Si(001) homoepitaxy (S. Clarke et al.). Surface step structure of a lens-shaped Si(001) vicinal substrate (K. Sakamoto et al.). Photoluminescence characterization of molecular beam epitaxial silicon (E.C. Lightowlers et al.). Doping. Boron doping using compound source (T. Tatsumi). P-type delta doping in silicon MBE (N.L. Mattey et al.). Modulation-doped superlattices with delta layers in silicon (H.P. Zeindell et al.). Steep doping profiles obtained by low-energy implantation of arsenic in silicon MBE layers (N. Djebbar et al.). Alternative Growth Methods. Limited reaction processing: growth of Si/Si1-xGex for heterojunction bipolar transistor applications (J.L. Hoyt et al.). High gain SiGe heterojunction bipolar transistors grown by rapid thermal chemical vapor deposition (M.L. Green et al.). Epitaxial growth of single-crystalline Si1-xGex on Si(100) by ion beam sputter deposition (F. Meyer et al.). Phosphorus gas doping in gas source silicon-MBE (H. Hirayama, T. Tatsumi). Devices. Narrow band gap base heterojunction bipolar transistors using SiGe alloys (S.S. Iyer et al.). Silicon-based millimeter-wave integrated circuits (J-F. Luy). Performance and processing line integration of a silicon molecular beam epitaxy system (A.A. van Gorkum et al.). Silicides. Reflection high energy electron diffraction study of Cosi2/Si multilayer structures (Q. Ye at al.). Epitaxy of metal silicides (H. von Kanel et al.). Epitaxial growth of ErSi2 on (111)si (D. Loretto et al.). Other Material Systems. Oxygen-doped and nitrogen-doped silicon films prepared by molecular beam epitaxy (M. Tabe et al.). Properties of diamond structure SnGe films grown by molecular beam epitaxy (A. Harwit et al.). Si-MBE: Prospects and Challenges. Prospects and challenges for molecular beam epitaxy in silicon very-large-scale integration (W. Eccleston). Prospects and challenges for SiGe strained-layer epitaxy (T.P. Pearsall). Author Index.

  • Handbook of Thin Film Deposition

    • 3rd Edition
    • Krishna Seshan
    • English
    The Handbook of Thin Film Deposition is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, new materials for memory applications and methods for thin film optical processes. In a major restructuring, this edition of the handbook lays the foundations with an up-to-date treatment of lithography, contamination and yield management, and reliability of thin films. The established physical and chemical deposition processes and technologies are then covered, the last section of the book being devoted to more recent technological developments such as microelectromechanic... systems, photovoltaic applications, digital cameras, CCD arrays, and optical thin films.

  • Thin Film Growth

    Physics, Materials Science and Applications
    • 1st Edition
    • Zexian Cao
    • English
    Thin film technology is used in many applications such as microelectronics, optics, hard and corrosion resistant coatings and micromechanics, and thin films form a uniquely versatile material base for the development of novel technologies within these industries. Thin film growth provides an important and up-to-date review of the theory and deposition techniques used in the formation of thin films.Part one focuses on the theory of thin film growth, with chapters covering nucleation and growth processes in thin films, phase-field modelling of thin film growth and surface roughness evolution. Part two covers some of the techniques used for thin film growth, including oblique angle deposition, reactive magnetron sputtering and epitaxial growth of graphene films on single crystal metal surfaces. This section also includes chapters on the properties of thin films, covering topics such as substrate plasticity and buckling of thin films, polarity control, nanostructure growth dynamics and network behaviour in thin films.With its distinguished editor and international team of contributors, Thin film growth is an essential reference for engineers in electronics, energy materials and mechanical engineering, as well as those with an academic research interest in the topic.

  • Physico-Chemical Phenomena in Thin Films and at Solid Surfaces

    • 1st Edition
    • Volume 34
    • English
    The book is devoted to the consideration of the different processes taking place in thin films and at surfaces. Since the most important physico-chemical phenomena in such media are accompanied by the rearrangement of an intra- and intermolecular coordinates and consequently a surrounding molecular ensemble, the theory of radiationless multi-vibrational transitions is used for its description. The second part of the book considers the numerous surface phenomena. And in the third part is described the preparation methods and characteristics of different types of thin films. Both experimental and theoretical descriptions are represented. Media rearrangement coupled with the reagent transformation largely determines the absolute value and temperature dependence of the rate constants and other characteristics of the considered processes. These effects are described at the atomic or molecular level based on the multi-phonon theory, starting from the first pioneering studies through to contemporary studies.A number of questions are included at the end of many chapters to further reinforce the material presented.

  • Waveguide Spectroscopy of Thin Films

    • 1st Edition
    • Volume 33
    • Alexander Vasil'evich Khomchenko
    • English
    In Waveguide Spectroscopy of Thin Films new methods of study of the linear and nonlinear optical properties of thin films are presented. These techniques are based on the principles of the spatial Fourier spectroscopy of the light beam reflected from a prism-coupling device with the tunnel excitation of guided lightmodes in thin-film structures. Measurement techniques of determination of the absorption coefficient, refractive index and thickness of the dielectric, semiconductor or metallic films are considered. This book is highly recommended for specialists in the fields of integrated and thin film optics and for graduated students in related specialties.

  • Handbook of Ellipsometry

    • 1st Edition
    • Harland Tompkins + 1 more
    • Harland Tompkins + 1 more
    • English
    The Handbook of Ellipsometry is a critical foundation text on an increasingly critical subject. Ellipsometry, a measurement technique based on phase and amplitude changes in polarized light, is becoming popular in a widening array of applications because of increasing miniaturization of integrated circuits and breakthroughs in knowledge of biological macromolecules deriving from DNA and protein surface research. Ellipsometry does not contact or damage samples, and is an ideal measurement technique for determining optical and physical properties of materials at the nano scale. With the acceleration of new instruments and applications now occurring, this book provides an essential foundation for the current science and technology of ellipsometry for scientists and engineers in industry and academia at the forefront of nanotechnology developments in instrumentation, integrated circuits, biotechnology, and pharmaceuticals. Divided into four parts, this comprehensive handbook covers the theory of ellipsometry, instrumentation, applications, and emerging areas. Experts in the field contributed to its twelve chapters, covering various aspects of ellipsometry.

  • Thin Film Materials Technology

    Sputtering of Compound Materials
    • 1st Edition
    • Kiyotaka Wasa + 2 more
    • English
    An invaluable resource for industrial science and engineering newcomers to sputter deposition technology in thin film production applications, this book is rich in coverage of both historical developments and the newest experimental and technological information about ceramic thin films, a key technology for nano-materials in high-speed information applications and large-area functional coating such as automotive or decorative painting of plastic parts, among other topics. In seven concise chapters, the book thoroughly reviews basic thin film technology and deposition processes, sputtering processes, structural control of compound thin films, and microfabrication by sputtering.

  • Thin-Film Diamond I

    (part of the Semiconductors and Semimetals Series)
    • 1st Edition
    • Volume 76
    • Christopher Nebel + 1 more
    • English
    This volume reviews the state of the art of thin film diamond, a very promising new semiconductor that may one day rival silicon as the material of choice for electronics. Diamond has the following important characteristics; it is resistant to radiation damage, chemically inert and biocompatible and it will become "the material" for bio-electronics, in-vivo applications, radiation detectors and high-frequency devices.Thin-Film Diamond is the first book to summarize state of the art of CVD diamond in depth. It covers the most recent results regarding growth and structural properties, doping and defect characterization, hydrogen in and on diamond as well as surface properties in general, applications of diamond in electrochemistry, as detectors, and in surface acoustic wave devices.

  • Complex Wave Dynamics on Thin Films

    • 1st Edition
    • Volume 14
    • Hen-hong Chang + 1 more
    • English
    Wave evolution on a falling film is a classical hydrodynamic instability whose rich wave dynamics have been carefully recorded in the last fifty years. Such waves are known to profoundly affect the mass and heat transfer of multi-phase industrial units.This book describes the collective effort of both authors and their students in constructing a comprehensive theory to describe the complex wave evolution from nearly harmonic waves at the inlet to complex spatio-temporal patterns involving solitary waves downstream. The mathematical theory represents a significant breakthrough from classical linear stability theories, which can only describe the inlet harmonic waves and also extends classical soliton theory for integrable systems to real solitrary wave dynamics with dissipation. One unique feature of falling-film solitary wave dynamics, which drives much of the spatio-temporal wave evolution, is the irreversible coalescence of such localized wave structures. It represents the first full description of a hydrodynamic instability from inception to developed chaos. This approach should prove useful for other complex hydrodynamic instabilities and would allow industrial engineers to better design their multi-phase apparati by exploiting the deciphered wave dynamics. This publication gives a comprehensive review of all experimental records and existing theories and significantly advances state of the art on the subject and are complimented by complex and attractive graphics from computational fluid mechanics.

  • Advances in Plasma-Grown Hydrogenated Films

    • 1st Edition
    • Volume 30
    • English
    Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical and their technological aspects. Starting with Volume 30, the title of the series, Thin Films, is being changed to Thin Films and Nanostructures. We feel that this new titlereflects more accurately the rapidly growing inclusion of research anddevelopment efforts on nanostructures, especially in relation to novel solid-state device formats

  • Materials Science of Thin Films

    Depositon and Structure
    • 2nd Edition
    • Milton Ohring
    • English
    This is the first book that can be considered a textbook on thin film science, complete with exercises at the end of each chapter. Ohring has contributed many highly regarded reference books to the AP list, including Reliability and Failure of Electronic Materials and the Engineering Science of Thin Films. The knowledge base is intended for science and engineering students in advanced undergraduate or first-year graduate level courses on thin films and scientists and engineers who are entering or require an overview of the field. Since 1992, when the book was first published, the field of thin films has expanded tremendously, especially with regard to technological applications. The second edition will bring the book up-to-date with regard to these advances. Most chapters have been greatly updated, and several new chapters have been added.

  • Thinning Films and Tribological Interfaces

    Proceedings of the 26th Leeds-Lyon Symposium
    • 1st Edition
    • Volume 38
    • D. Dowson + 9 more
    • English
    This collection of fully peer-reviewed papers were presented at the 26th Leeds-Lyon Tribology Symposium which was held in Leeds, UK, 14-17 September, 1999. The Leeds-Lyon Symposia on Tribology were launched in 1974, and the large number of references to original work published in the Proceedings over many years confirms the quality of the published papers. It also indicates that the volumes have served their purpose and become a recognised feature of the tribological literature. This year's title is 'Thinning Films and Tribological Interfaces', and the papers cover practical applications of tribological solutions in a wide range of situations. The evolution of a full peer review process has been evident for a number of years. An important feature of the Leeds-Lyon Symposia is the presentation of current research findings. This remains an essential feature of the meetings, but for the 26th Symposium authors were invited to submit their papers for review a few weeks in advance of the Symposium. This provided an opportunity to discuss recommendations for modifications with the authors.

  • Electronic Structure

    • 1st Edition
    • Volume 2
    • English
    This book is the second volume in the Handbook of Surface Science series and deals with aspects of the electronic structure of surfaces as investigated by means of the experimental and theoretical methods of physics. The importance of understanding surface phenomena stems from the fact that for many physical and chemical phenomena, the surface plays a key role: in electronic, magnetic, and optical devices, in heterogenous catalysis, in epitaxial growth, and the application of protective coatings, for example. Therefore a better understanding and, ultimately, a predictive description of surface and interface properties is vital for the progress of modern technology. An investigation of surface electronic structure is also central to our understanding of all aspects of surfaces from a fundamental point of view. The chapters presented here review the goals achieved in the field and map out the challenges ahead, both in experiment and theory.

  • Ionized Physical Vapor Deposition

    • 1st Edition
    • Volume 27
    • English
    This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and memory chips. For the first time, the most recent developments in thin film deposition using ionized physical vapor deposition (I-PVD) are presented in a single coherent source. Readers will find detailed descriptions of relevant plasma source technology, specific deposition systems, and process recipes. The tools and processes covered include DC hollow cathode magnetrons, RF inductively coupled plasmas, and microwave plasmas that are used for depositing technologically important materials such as copper, tantalum, titanium, TiN, and aluminum. In addition, this volume describes the important physical processes that occur in I-PVD in a simple and concise way. The physical descriptions are followed by experimentally-verif... numerical models that provide in-depth insight into the design and operation I-PVD tools. Practicing process engineers, research and development scientists, and students will find that this book's integration of tool design, process development, and fundamental physical models make it an indispensable reference.Key Features:The first comprehensive volume on ionized physical vapor depositionCombines tool design, process development, and fundamental physical understanding to form a complete picture of I-PVDEmphasizes practical applications in the area of IC fabrication and interconnect technologyServes as a guide to select the most appropriate technology for any deposition application

  • Thin Film Materials for Large Area Electronics

    • 1st Edition
    • Volume 80
    • B. Equer + 3 more
    • English
    The symposium brought together more than a hundred attendees from many countries including a significant participation from Japan and other East-Asia countries. Many of the trends observed in the 1st Symposium held in 1996 were confirmed: displays are indeed the main application in LAE (photovoltaics were not included in the topics of this symposium) and active matrix display (AMLCD) is still the leading technology. Future AMLCDs integrating the display drivers onto the same substrate require much faster thin-film transistors (TFTs) than those used for LCD addressing, therefore putting a strong demand on polysilicon performances. As a consequence the quest for an improved low temperature, large area (and low cost) polysilicon process is intensive and the competitors, including direct plasma deposition and excimer laser crystallization of amorphous layers, are reporting significant steps forward. With the tremendous demand for efficient colour flat panel displays, other display technologies are gaining interest. Field emission display (FED) is one of them. FEDs based on amorphous tetrahedral carbon thin-films are stimulating intensive studies on the optoelectronic properties of this complex material.Large area pixellized sensors for x-ray radiography and document scanning is another field of application in LAE which has recently reached initial production. Using a TFT or diode pixel addressing similar to AMLCD, this kind of device benefits from most of the AMLCD technology. However these devices present an increased complexity and stringent specifications on noise which in turn means materials with improved electronic transport properties. Finally, LAE is a fast developing area in thin-film research and technology. Initially an all-silicon domain, it now involves a large range of thin-film semiconductors and dielectrics, whose properties need to be fully understood and for which flexible and efficient processes have still to be developed.

  • Materials Science and Engineering Serving Society

    • 1st Edition
    • R.P.H. Chang + 3 more
    • English
    This symposium was organised with the aim of encouraging collaboration in international science and engineering communities for the benefit of human kind. It consisted of invited talks by experts on materials and poster presentation papers. Approximately 140 scientists participated and the resulting proceedings present an up-to-date review of the research in this area.

  • PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing

    • 1st Edition
    • Volume 26
    • English
    Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems.In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts.

  • Author and Subject Cumulative Index, Including Tables of Contents

    Subject and Author Cumulative Index, Volumes 1-24
    • 1st Edition
    • Volume 25
    • English
    Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems.In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.

  • Tribology of Miniature Systems

    • 1st Edition
    • Z. Rymuza
    • English
    The tribology of miniature systems is quite different from the tribology of large machinery. This is the first publication to cover on an academic level both the basic concepts of the tribology of miniature systems and some areas of its practical application. A comprehensive survey is given on the specific problems encountered in this field, providing a volume that will be useful in solving professional engineering problems in the fast growing field of precision engineering and microtechnology.The suitability of various materials and lubricants for the tribological systems in miniature mechanisms is discussed. The tribological properties and the friction and wear properties which occur in such systems are analysed. Specific lubrication problems are examined in detail; in particular, the use of special tribological coatings to solve many difficult lubrication problems and to obtain high wear resistance of the rubbing elements is considered. The special investigation techniques used to characterize miniature tribological systems and their elements (e.g. lubricants) are reviewed. The tribological aspects of many of the most common assemblies found in miniature mechanism and electromechanism design are analysed and some practical suggestions are put forward for the rational design of such systems. Also special tribological problems such as those met in computer technology, bioengineering, etc. are presented. The book is intended for tribologists (both seasoned researchers and newcomers) studying the problems of this specific branch of tribology and also for practising engineers active in the design, manufacture and exploitation of various miniature systems.

  • Magnetic Ultra Thin Films, Multilayers and Surfaces

    • 1st Edition
    • Volume 62
    • F. Petroff + 1 more
    • English
    The Symposium on Magnetic Ultrathin Films, Multilayers andSurfaces, hosted by the European Materials Research Society, washeld at the Palais de la Musique et des Congré inStrasbourg, France on June 4-7, 1996. Its central theme was therelationship of magnetic properties and device performance tostructure at the nano and micrometer length scale. Research onthe magnetism of surfaces, ultrathin films and multilayers hasincreased dramatically during recent years. This development wastriggered by the discovery of coupling between ferromagneticlayers across nonmagnetic spacer layers and of the giantmagnetoresistan... effect in systems of reduced dimension usingvarious micro and nanofabrication techniques has become a subjectof special interest. It is certainly the promising applicationpotential of these effects in new magnetic recording devicegeometries which causes this intensive research, which is doneboth by companies and at universities and researchinstitutes.A selection of invited and contributed paperspresented at the Symposium and accepted for publication iscontained in this volume. The contents of these proceedings areorganized into seven sections.A. Nanowires, Nanoparticles,Nanost... Ultrathin Films and Surfaces,Characteriz... Giant MagnetoresistanceD. Coupling,TunnelingE. Growth, Structure, MagnetismF. Growth,Structure, MagnetoresistanceG. Coupling, Magnetic processes,Magneto-op... first four sections contain invited andoral contributed papers in the listed research domains, while thelast three sections contain the contributions presented duringthree large poster sessions.

  • Foam and Foam Films

    Theory, Experiment, Application
    • 1st Edition
    • Volume 5
    • D. Exerowa + 1 more
    • English
    The main physicochemical aspects of foam and foam films such as preparation, structure, properties, are considered, giving a special emphasis on foam stability. It is shown that the foam and foam films are an efficient object in the study of various surface phenomena and in establishing regularities common for different interfaces, in particular, water/oil interface. The techniques and results on foam films have an independent meaning and involve the latest achievement in this field, with a focus on authors' results.The book has an expressed monographic character. It reveals joint ideas, i.e. the quantitative approach in treating foams is based on foam film behaviour and the techniques for controlling the foam liquid content, developed by the authors. A major contribution represents the independent consideration of formation and stability of foam films in theoretical and experimental aspects. No monograph published so far reveals these topics in the mentioned manner. Data and information about foams, physicochemical characterization of surfactants, phospholipids and polymers can also be found. Furthermore, the book provides information about: techniques involved in the study of foam films and foam structure and properties; foam drainage; processes of destruction in gravitational and centrifugal fields; reasons for stability of films and their role in the processes running in the foam; mechanical, rheological, optical, thermophysical, electrical properties; foam destruction upon addition of antifoams (mechanism of destruction, techniques, application); scientific principles of controlling foam properties and their application in foam separation and concentration; enhanced oil recovery; thermodynamic and non-equilibrium properties of foam films, stabilized by surfactants, phospholipids and polymers; techniques for the study of surface forces; formation and stability of foam films; black films, including bilayers; new theories of stability of amphiphile bilayer; experiments involved in this stability; application in biology and medicine.

  • Composite Sheet Forming

    • 1st Edition
    • Volume 11
    • D. Bhattacharyya
    • English
    Sheet forming is the most common process used in metal forming and is therefore constantly being adapted or modified to suit the needs of forming composite sheets. Due to the increasing availability of various types of fibre reinforced polymeric sheets, especially with thermoplastic matrices, the scope of use of such materials is rapidly expanding in the automobile, building, sports and other manufacturing industries beyond the traditional areas of aerospace and aircraft applications. This book contains twelve chapters and attempts to cover different aspects of sheet forming including both thermoplastic and thermosetting materials. In view of the expanded role of fibre reinforced composite sheets in the industry, the book also describes some non-traditional applications, processes and analytical techniques involving such materials.The first chapter is a brief introduction to the principles of sheet metal forming. The next two chapters introduce the various forms of materials, manufacturing techniques and the fundamentals of computer simulation. Chapter 4 describes the different aspects of thermoforming of continuous fibre reinforced thermoplastics and the following chapter studies the shear and frictional behaviour of composite sheets during forming. Chapter 6 explores the possibility of applying the grid strain analysis method in continuous fibre reinforced polymeric sheets. The next two chapters address fundamental concepts and recent developments in finite element modelling and rheology. Chapter 9 introduces the theory of bending of thermoplastic composite sheets and shows a novel way of determining both longitudinal and transverse viscosities through vee-bend tests. A significant expansion in the usage of composite materials is taking place in biomedical areas. Chapter 10 discusses the thermoforming of knitted fabric reinforced thermoplastics for load bearing and anisotropic bio-implants. The final chapter introduces roll forming, a commonly used rapid manufacturing process for sheet metals, and discusses the possibility of applying it economically for continuous reinforced thermoplastic sheets.

  • Physical Structure

    • 1st Edition
    • Volume 1
    • English
    The primary goal of this book is to summarize the current level of accumulated knowledge about the physical structure of solid surfaces with emphasis on well-defined surfaces at the gas-solid and vacuum-solid interfaces. The intention is not only to provide a standard reference for practitioners, but also to provide a good starting point for scientists who are just entering the field. The presentation in most of the chapters therefore assumes that the typical reader will have a good undergraduate background in chemistry, physics, or materials science. At the same time, coverage is comprehensive and at a high technical level with emphasis on fundamental physical principles. This first volume in a new series is appropriately devoted to the physical structure of surfaces, knowledge of which will be essential for a complete understanding of electronic properties and dynamical processes, the topics of the next two volumes in the series.The volume is divided into four parts. Part I describes the equilibrium properties of surfaces with emphasis on clean surfaces of bulk materials. Part II provides an introduction to some of the primary experimental methods that are used to determine surface crystal structures. Part III gives an overview of the vast topic of the structure of adsorbed layers. The concluding Part IV deals with the topics of defects in surface structures and phase transitions.

  • Modern Aspects of Diffusion-Controlled Reactions

    Cooperative Phenomena in Bimolecular Processes
    • 1st Edition
    • Volume 34
    • E. Kotomin + 1 more
    • English
    This monograph deals with the effects of reactant spatial correlations arising in the course of basic bimolecular reactions describing defect recombination, energy transfer and exciton annihilation in condensed matter. These effects lead to the kinetics considered abnormal from the standard chemical kinetics point of view. Numerous bimolecular reaction regimes and conditions are analysed in detail. Special attention is paid to the development and numerous applications of a novel, many-point density (MPD) formalism, which is based on Kirkwood's superposition approximation used for decoupling three-particle correlation functions.The book demonstrates that incorporation of the reaction-induced spatial correlations of similar reactants (e.g., vacancy-vacancy) leads to the development of an essentially non-Poisson spectrum of reactant density fluctuations. This can completely change the kinetics at longer times since it no longer obeys the law of mass action. The language of the correlation lengths and critical exponents similar to physics of critical phenomena is used instead. A relation between MPD theory and synergistics is discussed. The validity of the theorem giving a critical complexity for the two-step reactions exhibiting self-organization phenomena is questioned. Theoretical results are illustrated by numerous experimental data.

  • Surface Engineering Casebook

    Solutions to Corrosion and Wear-Related Failures
    • 1st Edition
    • J S Burnell-Gray + 1 more
    • English
    This book concisely and uniquely encompasses the principles of corrosion and wear as manifested in industrial failures and the solutions offered by surface engineering.

  • Cohesion and Structure of Surfaces

    • 1st Edition
    • Volume 4
    • K. Binder + 3 more
    • English
    During the past fifteen years there has been a dramatic increase in the number of different surfaces whose structures have been determined experimentally. For example, whereas in 1979 there were only 25 recorded adsorption structures, to date there are more than 250. This volume is therefore a timely review of the state-of-the-art in this dynamic field.Chapter one contains a compilation of the structural data base on surfaces within a series of tables that allows direct comparison of structural parameters for related systems. Experimental structural trends amongst both clean surfaces and adsorbate systems are highlighted and discussed.The next chapter outlines the successes of local density functional theory in predicting the relaxations and reconstructions of clean metal and semiconductor surfaces, and the behaviour of adsorbates such as hydrogen, oxygen and alkali elements on metal surfaces, thereby explaining some of the experimental trends observed within the database. These ab initio density functional calculations are of ground state properties at the absolute zero of temperature. Chapter three provides an introduction to finite temperature effects in a pedagogical review of current statistical mechanical treatments of phase transitions at surfaces, many of which display the prominent role of fluctuations or non-mean field behaviour. The final chapter discusses the relationship of the reactivity of a surface to its morphology and composition, which is particularly relevant to a fundamental understanding of catalysis.