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Elsevier

Books in Surfaces and interfaces

This portfolio explores the physical and chemical properties of surfaces, thin films, and interfaces. Supporting materials scientists, chemists, and physicists, it features advances in surface characterization, nanostructures, and catalysis, driving innovations in electronics, energy, and nanotechnology.

  • Advances in Plasma-Grown Hydrogenated Films

    • 1st Edition
    • Volume 30
    • English
    Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical and their technological aspects. Starting with Volume 30, the title of the series, Thin Films, is being changed to Thin Films and Nanostructures. We feel that this new titlereflects more accurately the rapidly growing inclusion of research anddevelopment efforts on nanostructures, especially in relation to novel solid-state device formats

  • Manufacturing Surface Technology

    Surface Integrity and Functional Performance
    • 1st Edition
    • Brian Griffiths
    • English
    The first title in the "Manufacturing Engineering Modular" series, the publication of this book marks recognition of the effect of surface finish obtained in manufacture ("surface integrity") on the functional performance of product, in terms of such factors as fatigue, corrosion and strength. It is a concise work, intended chiefly for undergraduate and postgraduate students, which should also provide useful material for the professional manufacturing engineer.

  • Materials Science of Thin Films

    Depositon and Structure
    • 2nd Edition
    • Milton Ohring
    • English
    This is the first book that can be considered a textbook on thin film science, complete with exercises at the end of each chapter. Ohring has contributed many highly regarded reference books to the AP list, including Reliability and Failure of Electronic Materials and the Engineering Science of Thin Films. The knowledge base is intended for science and engineering students in advanced undergraduate or first-year graduate level courses on thin films and scientists and engineers who are entering or require an overview of the field. Since 1992, when the book was first published, the field of thin films has expanded tremendously, especially with regard to technological applications. The second edition will bring the book up-to-date with regard to these advances. Most chapters have been greatly updated, and several new chapters have been added.

  • Oxide Surfaces

    • 1st Edition
    • Volume 9
    • English
    The book is a multi-author survey (in 15 chapters) of the current state of knowledge and recent developments in our understanding of oxide surfaces. The author list includes most of the acknowledged world experts in this field. The material covered includes fundamental theory and experimental studies of the geometrical, vibrational and electronic structure of such surfaces, but with a special emphasis on the chemical properties and associated reactivity. The main focus is on metal oxides but coverage extends from 'simple' rocksalt materials such as MgO through to complex transition metal oxides with different valencies.

  • Thinning Films and Tribological Interfaces

    Proceedings of the 26th Leeds-Lyon Symposium
    • 1st Edition
    • Volume 38
    • D. Dowson + 9 more
    • English
    This collection of fully peer-reviewed papers were presented at the 26th Leeds-Lyon Tribology Symposium which was held in Leeds, UK, 14-17 September, 1999. The Leeds-Lyon Symposia on Tribology were launched in 1974, and the large number of references to original work published in the Proceedings over many years confirms the quality of the published papers. It also indicates that the volumes have served their purpose and become a recognised feature of the tribological literature. This year's title is 'Thinning Films and Tribological Interfaces', and the papers cover practical applications of tribological solutions in a wide range of situations. The evolution of a full peer review process has been evident for a number of years. An important feature of the Leeds-Lyon Symposia is the presentation of current research findings. This remains an essential feature of the meetings, but for the 26th Symposium authors were invited to submit their papers for review a few weeks in advance of the Symposium. This provided an opportunity to discuss recommendations for modifications with the authors.

  • Electronic Structure

    • 1st Edition
    • Volume 2
    • English
    This book is the second volume in the Handbook of Surface Science series and deals with aspects of the electronic structure of surfaces as investigated by means of the experimental and theoretical methods of physics. The importance of understanding surface phenomena stems from the fact that for many physical and chemical phenomena, the surface plays a key role: in electronic, magnetic, and optical devices, in heterogenous catalysis, in epitaxial growth, and the application of protective coatings, for example. Therefore a better understanding and, ultimately, a predictive description of surface and interface properties is vital for the progress of modern technology. An investigation of surface electronic structure is also central to our understanding of all aspects of surfaces from a fundamental point of view. The chapters presented here review the goals achieved in the field and map out the challenges ahead, both in experiment and theory.

  • Ionized Physical Vapor Deposition

    • 1st Edition
    • Volume 27
    • English
    This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and memory chips. For the first time, the most recent developments in thin film deposition using ionized physical vapor deposition (I-PVD) are presented in a single coherent source. Readers will find detailed descriptions of relevant plasma source technology, specific deposition systems, and process recipes. The tools and processes covered include DC hollow cathode magnetrons, RF inductively coupled plasmas, and microwave plasmas that are used for depositing technologically important materials such as copper, tantalum, titanium, TiN, and aluminum. In addition, this volume describes the important physical processes that occur in I-PVD in a simple and concise way. The physical descriptions are followed by experimentally-verif... numerical models that provide in-depth insight into the design and operation I-PVD tools. Practicing process engineers, research and development scientists, and students will find that this book's integration of tool design, process development, and fundamental physical models make it an indispensable reference.Key Features:The first comprehensive volume on ionized physical vapor depositionCombines tool design, process development, and fundamental physical understanding to form a complete picture of I-PVDEmphasizes practical applications in the area of IC fabrication and interconnect technologyServes as a guide to select the most appropriate technology for any deposition application

  • Paint and Surface Coatings

    Theory and Practice
    • 2nd Edition
    • R Lambourne + 1 more
    • English
    This second edition of an established and well received book has been carefully revised, in many instances by the original authors, and enlarged by the addition of two completely new chapters. These deal with the use of computers in the paint industry and with the increasingly important subject of health and safety. The chapter on pigments has also been re-written by an author new to this edition.It was the editor’s intention in the first edition to provide science graduates entering the paint industry with a bridge between academia and the applied science and technology of paints. The great strength and appeal of this book remains that it deals with the technology of paints and surface coatings while also providing a basic understanding of the chemistry and physics of coatings.

  • Thin Film Materials for Large Area Electronics

    • 1st Edition
    • Volume 80
    • B. Equer + 3 more
    • English
    The symposium brought together more than a hundred attendees from many countries including a significant participation from Japan and other East-Asia countries. Many of the trends observed in the 1st Symposium held in 1996 were confirmed: displays are indeed the main application in LAE (photovoltaics were not included in the topics of this symposium) and active matrix display (AMLCD) is still the leading technology. Future AMLCDs integrating the display drivers onto the same substrate require much faster thin-film transistors (TFTs) than those used for LCD addressing, therefore putting a strong demand on polysilicon performances. As a consequence the quest for an improved low temperature, large area (and low cost) polysilicon process is intensive and the competitors, including direct plasma deposition and excimer laser crystallization of amorphous layers, are reporting significant steps forward. With the tremendous demand for efficient colour flat panel displays, other display technologies are gaining interest. Field emission display (FED) is one of them. FEDs based on amorphous tetrahedral carbon thin-films are stimulating intensive studies on the optoelectronic properties of this complex material.Large area pixellized sensors for x-ray radiography and document scanning is another field of application in LAE which has recently reached initial production. Using a TFT or diode pixel addressing similar to AMLCD, this kind of device benefits from most of the AMLCD technology. However these devices present an increased complexity and stringent specifications on noise which in turn means materials with improved electronic transport properties. Finally, LAE is a fast developing area in thin-film research and technology. Initially an all-silicon domain, it now involves a large range of thin-film semiconductors and dielectrics, whose properties need to be fully understood and for which flexible and efficient processes have still to be developed.

  • Fundamental and Applied Aspects of Chemically Modified Surfaces

    • 1st Edition
    • J P Blitz + 1 more
    • English
    The field of chemically modified particle surfaces has seen many significant developments. This text covers analytical and synthetic techniques for the development and understanding of these surfaces. Encompassing subjects including self-assembled monolayers, scanning probe microscopies, combinatorial synthetic techniques, plasma polymerizations and molecular modelling of modified surfaces, the book provides a snap-shot of concepts and tools.

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