Advances in Plasma-Grown Hydrogenated Films
- 1st Edition, Volume 30 - November 28, 2001
- Imprint: Academic Press
- Editors: V. M. Agranovich, Deborah Taylor
- Language: English
- Hardback ISBN:9 7 8 - 0 - 1 2 - 5 3 3 0 3 0 - 5
- eBook ISBN:9 7 8 - 0 - 0 8 - 0 5 4 2 8 7 - 4
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the proper… Read more
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Request a sales quotePhysics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical and their technological aspects. Starting with Volume 30, the title of the series, Thin Films, is being changed to Thin Films and Nanostructures. We feel that this new titlereflects more accurately the rapidly growing inclusion of research anddevelopment efforts on nanostructures, especially in relation to novel solid-state device formats
Thin film and surface science researchers in chemistry, materials science, electrical engineering, biology, and condensed matter physics.
- Preface
- Methods of Deposition of Hydrogenated Amorphous Silicon for Device Applications
- 1.1 Introduction
- 1.2 Research and Industrial Equipment
- 1.3 Physics and Chemistry of PECVD
- 1.4 Plasma Modeling
- 1.5 Plasma Analysis
- 1.6 Relation between Plasma Parameters and Material Properties
- 1.7 Deposition Models
- 1.8 Modifications of PECVD
- 1.9 Hot Wire Chemical Vapor Deposition
- 1.10 Expanding Thermal Plasma Chemical Vapor Deposition
- 1.11 Applications
- 1.12 Conclusion
- Acknowledgments
- Growth, Structure, and Properties of Plasma-Deposited Amorphous Hydrogenated Carbon–Nitrogen Films
- 2.1 Introduction
- 2.2 Amorphous Hydrogenated Carbon Films
- 2.3 Nitrogen Incorporation Into a-C:H Films
- 2.4 Characterization of a-C(N):H Film Structure
- 2.5 Mechanical Properties
- 2.6 Optical and Electrical Properties
- Subject index
- Publisher Summary
- Recent volumes in this series
- Edition: 1
- Volume: 30
- Published: November 28, 2001
- No. of pages (eBook): 281
- Imprint: Academic Press
- Language: English
- Hardback ISBN: 9780125330305
- eBook ISBN: 9780080542874
VA
V. M. Agranovich
Affiliations and expertise
Russian Academy of Sciences, Moscow, RussiaDT
Deborah Taylor
Affiliations and expertise
Motorola, Austin, Texas, U.S.A.Read Advances in Plasma-Grown Hydrogenated Films on ScienceDirect