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Books in Physics

Physics titles offer comprehensive research and advancements across the fundamental and applied areas of physical science. From quantum mechanics and particle physics to astrophysics and materials science, these titles drive innovation and deepen understanding of the principles governing the universe. Essential for researchers, educators, and students, this collection supports scientific progress and practical applications across a diverse range of physics disciplines.

  • Non-Stoichiometry in Semiconductors

    • 1st Edition
    • December 2, 2012
    • K.J. Bachmann + 2 more
    • English
    Significant advances have occurred in the theory of non-stoichiometry problems and fundamentally new and wide-ranging applications have been developed, helping to better identify relevant issues. The contributions in this volume bring together the experience of specialists from different disciplines (materials scientists, physicists, chemists and device people) confronted with non-stoichiometry problems. The 40 papers, including 9 invited papers, give an advanced scenario of this wide interdisciplinary area, which is highly important in its diverse aspects of theory, implementation and applications. This work will be of interest not only to universities and laboratories engaged in studies and research in this field, but also to organizations and industrial centres concerned with implementations and applications. The diversity of the topics, as well as the extraordinary tempo in which Non-stoichiometry in Semiconductors has progressed in recent years attest to the permanent vitality of this field of research and development.

  • Subnuclear Phenomena Part A

    • 1st Edition
    • December 2, 2012
    • A Zichichi
    • English
    Subnuclear Phenomena, Part A is the first part of the compilation of the proceedings of the seventh Course of the International School of Physics, held in July 1969 in Erice, Italy. The said program is focused on the analyticity and algebraic properties in particle physics. Topics covered in the book include inelastic electron scattering; multiperipheral dynamics; duality and exchange degeneracy; anomalies of currents in Spinor field theories; the quark model and its developments; and the Efimov-Fradkin method in nonlinear field theory. The book also covers other areas such as the normalization of the wave function; causality and relativity; and the Feynman-Wheeler electrodynamics. The text is recommended for physicists, especially those interested in the further study of particle physics.

  • Kinetics of Aggregation and Gelation

    • 1st Edition
    • December 2, 2012
    • F. Family + 1 more
    • English
    Kinetics of Aggregation and Gelation presents the proceedings of the International Topical Conference on Kinetics of Aggregation and Gelation held on April 2-4, 1984 in Athens, Georgia. The purpose of the conference was to bring together international experts from a wide variety of backgrounds who are studying phenomena inherently similar to the formation of large clusters by the union of many separate, small elements, to present and exchange ideas on new theories and results of experimental and computer simulations. This book is divided into 57 chapters, each of which represents an oral presentation that is part of a unified whole. The book begins with a presentation on fractal concepts in aggregation and gelation, followed by presentations on topics such as aggregative fractals called ""squigs""; multi-particle fractal aggregation; theory of fractal growth processes; self-similar structures; and interface dynamics. Other chapters cover addition polymerization and related models; the kinetic gelation model; a new model of linear polymers; red cell aggregation kinetics; the Potts Model; aggregation of colloidal silica; the ballistic model of aggregation; stochastic dynamics simulation of particle aggregation; particle-cluster aggregation; kinetic clustering of clusters; computer simulations of domain growth; and perspectives in the kinetics of aggregation and gelation. This book will be of interest to practitioners in the fields of chemistry, theoretical physics, and materials engineering.

  • Nanostructure Physics and Fabrication

    Proceedings of the International Symposium, College Station, Texas, March 13*b115, 1989.
    • 1st Edition
    • December 2, 2012
    • Mark A. Reed + 1 more
    • English
    Nanostructure Physics and Fabrication contains the contributions of an interdisciplinary group of specialists in nanometer scale fabrication, physics of mesoscopic systems, electronic transport, and materials science brought together to discuss the current status of nanometer scale electronic structures. These articles provide the most current assessment of this active and growing area of interest. The introductory chapter provides comments and background material for those somewhat unfamiliar with this new area of research and serves as a condensed overview and summary of the contributions that follow.

  • Ion Beam Processing of Materials and Deposition Processes of Protective Coatings

    • 1st Edition
    • Volume 53
    • December 2, 2012
    • P.L.F. Hemment + 9 more
    • English
    Containing the proceedings of three symposia in the E-MRS series this book is divided into two parts. Part one is concerned with ion beam processing, a particularly powerful and versatile technology which can be used both to synthesise and modify materials, including metals, semiconductors, ceramics and dielectrics, with great precision and excellent control. Furthermore it also deals with the correlated effects in atomic and cluster ion bombardment and implantation.Part two deals with the deposition techniques, characterization and applications of advanced ceramic, metallic and polymeric coatings or thin films for surface protection against corrosion, erosion, abrasion, diffusion and for lubrication of contracting surfaces in relative motion.

  • Fine Line Lithography

    • 1st Edition
    • Volume 1
    • December 2, 2012
    • R Newman
    • English
    Materials Processing - Theory and Practices, Volume 1: Fine Line Lithography reviews technical information as well as the theory and practices of materials processing. It looks at very large scale integration (VLSI) technology, with emphasis on the creation of fine line patterned structures that make up the devices and interconnects of complex functional circuits. It also describes a variety of other technologies that provide finer patterns, from modified versions of optical methods to electron-optic systems, non-plus-ultra of X-ray techniques, and dry processing that uses the chemical or kinetic energies of gas molecules or ions. Organized into five chapters, this volume begins with an overview of the fundamentals of electron and X-ray lithography, with a focus on resists and the way they function, and how they are used in microfabrication. It then discusses electron scattering and its effects on resist exposure and development, electron-beam lithography equipment, X-ray lithography, and optical methods for fine line lithography. It systematically introduces the reader to electron-beam projection techniques, dry processing methods, and application of electron-beam technology to large-scale integrated circuits. Other chapters focus on contact and proximity printing, projection printing, deep-UV lithography, and shadow printing with electrons and ions. The book describes reactive plasma etching and ion beam etching before concluding with a look at factors affecting the performance of the scanning-probe type of systems. This book is a valuable resource for materials engineers and processing engineers, as well as those in the academics and industry.

  • Modifications Induced by Irradiation in Glasses

    • 1st Edition
    • Volume 29
    • December 2, 2012
    • P. Mazzoldi
    • English
    Many aspects of the interaction of radiation with glasses are reviewed in this volume, with contributions from a broad scientific community. Several of the papers focus on the interdisciplinary approach required to connect technological applications to the basic interactions of energetic ions with insulators, reporting on the challenging problems that still remain to be solved. The high quality of these contributions once again demonstrates that the E-MRS is an efficient forum for interaction between research workers and industry. The proceedings represent an ideal bridge between the sixth and the planned seventh International Conference on Radiation Effects in Insulators to be held in Japan in 1993.

  • Seismology: Body Waves and Sources

    • 1st Edition
    • December 2, 2012
    • Bruce Bolt
    • English
    Methods in Computational Physics, Volume 12: Seismology: Body Waves and Sources is a six-chapter text that covers the numerical solution of some major problems on seismic body wave propagation and generation in the Earth. Chapter 1 considers the power of the computer to trace out detailed seismic response by means of ray theory, based from the results gathered in Soviet Union and the Continent. Chapter 2 exposes the finite difference methods employed to obtain complete theoretical seismograms for a source in a layered half-space, in wedges, and in a sphere, along with an outline of normal mode solutions for a source in a sphere and the ray expansion method. Chapter 3 discusses the theory and method of solution of the signals diffracted by the Earth's core using the response integral, the differential equations, and boundary conditions. This chapter deals also with the method of finding numerically the reflection coefficient in an inhomogeneous model. Chapter 4 describes a method for finding seismic velocity distributions that fit a given set of data and having found such distributions how to quantitatively assess their degree of uncertainty, such as their uniqueness. Chapter 5 surveys the theory of an observational technique for studying earthquake mechanism, while Chapter 6 provides a summary of theories of seismology and the important computational techniques together with some of their applications to seismic-source studies. This book will be greatly appreciated by geoscientists, physicists, and mathematicians.

  • Silicon Processing for Photovoltaics II

    • 1st Edition
    • December 2, 2012
    • C.P. Khattak + 1 more
    • English
    The processing of semiconductor silicon for manufacturing low cost photovoltaic products has been a field of increasing activity over the past decade and a number of papers have been published in the technical literature. This volume presents comprehensive, in-depth reviews on some of the key technologies developed for processing silicon for photovoltaic applications. It is complementary to Volume 5 in this series and together they provide the only collection of reviews in silicon photovoltaics available.The volume contains papers on: the effect of introducing grain boundaries in silicon; the commercial production for multicrystalline silicon ingots and ribbon; epitaxial solar cell fabrication; metallurgical approaches to producing low-cost meltstock; the non-conventional bifacial solar cell approach.

  • Fusion Part A

    Magnetic confinement Part A
    • 1st Edition
    • December 2, 2012
    • Edward Teller
    • English
    Fusion, Volume I: Magnetic Confinement, Part A is the first of the two-part volume that covers the complexity and application of controlled magnetic fusion. This book is divided into seven chapters and starts with a brief historical overview and some properties of controlled fusion. The subsequent chapters deal with the principles, thermodynamic stability, and configuration of Tokamak plasma. These topics are followed by discussions of the variations and application of stellarators; the concepts of mirror theory; and the establishment of the experimental basis of the mirror-confinement physics. The last chapter focuses on the principles, configuration, and application of the reversed-field pinch. This book will prove useful to physicists, physics students, and researchers.

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