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Books in Surfaces and interfaces

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    • Thin Films for Emerging Applications

      • 1st Edition
      • Volume 16
      • October 22, 2013
      • Maurice H. Francombe
      • English
      • eBook
        9 7 8 1 4 8 3 2 8 8 9 1 8
      Following in the long-standing tradition of excellence established by this serial, this volume provides a focused look at contemporary applications. High Tc superconducting thin films are discussed in terms of ion beam and sputtering deposition, vacuum evaporation, laser ablation, MOCVD, and other deposition processes in addition to their ultimate applications. Detailed treatment is also given to permanent magnet thin films, lateral diffusion and electromigration in metallic thin films, and fracture and cracking phenomena in thin films adhering to high-elongation substrates.

    • Progress in Surface and Membrane Science

      • 1st Edition
      • October 22, 2013
      • D. A. Cadenhead + 1 more
      • English
      • Hardback
        9 7 8 0 1 2 5 7 1 8 1 2 7
      • Paperback
        9 7 8 1 4 8 3 2 0 6 3 5 6
      • eBook
        9 7 8 1 4 8 3 2 1 9 7 8 3
      Progress in Surface and Membrane Science, Volume 12 covers the advances in the study of surface and membrane science. The book discusses the topographical differentiation of the cell surface; the NMR studies of model biological membrane system; and an irreversible thermodynamic approach to energy coupling in mitochondria and chloroplasts. The text also describes water at surfaces; the nature of microemulsions; and the energy principle in the stability of interfaces. Biochemists, physicists, chemical engineers, and people involved in surface and coatings research will find the book invaluable.

    • Thin Films for Advanced Electronic Devices

      • 1st Edition
      • Volume 15
      • October 22, 2013
      • Maurice H. Francombe
      • English
      • eBook
        9 7 8 1 4 8 3 2 8 8 9 0 1
      In this volume of the highly esteemed Physics of Thin Films serial, focused coverage is given to new trends in solid state devices. Four chapters combine to provide comprehensive discussions of magnetostatic wave phenomena in epitaxial magnetic oxide films and their applications in microwave signal processing devices: Thin-film rare earth transition metal alloys for magnetooptic recording. Two new classes of quantum well structures that have been used for infrared detectors and ultrafast resonant tunneling devices. Recent applications of Fourier transform spectroscopy for the analysis of inorganic thin solid films. This book provides a focused treatment of recent developments in novel thin film solid state components, and specifically discusses magnetic, semiconducting, and optical phenomena.

    • Thermoforming of Single and Multilayer Laminates

      • 1st Edition
      • November 7, 2013
      • Syed Ali Ashter
      • English
      • Hardback
        9 7 8 1 4 5 5 7 3 1 7 2 5
      • eBook
        9 7 8 1 4 5 5 7 3 1 8 6 2
      Thermoforming of Single and Multilayer Laminates explains the fundamentals of lamination and plastics thermoforming technologies along with current and new developments. It focuses on properties and thermoforming mechanics of plastic films and in particular single and multilayered laminates, including barrier films. For environmental and economic reasons, laminates are becoming increasingly important as a replacement for solid sheets and paint finishes in many industries, including transportation, packaging, and construction. Yet the processes of film formability during the extensive deformation and elevated temperatures experienced in conventional processing technologies, such as thermoforming, are poorly understood by most engineers. This book covers production processes, such as extrusion, calendaring, and casting, as well as mechanical and impact testing methods. It also describes how testing protocols developed for metals can be leveraged for plastic films and laminates, and includes a thorough discussion on methods for performing optical strain analysis. Applications in transportation vehicles and packaging, including packaging for food, medical and electronics applications, sports equipment, and household appliances, are discussed. Safety, recycling and environmental aspects of thermoforming and its products complete the book.

    • Surface Treatment of Materials for Adhesive Bonding

      • 2nd Edition
      • October 22, 2013
      • Sina Ebnesajjad + 1 more
      • English
      • Hardback
        9 7 8 0 3 2 3 2 6 4 3 5 8
      • eBook
        9 7 8 0 3 2 3 2 6 5 0 4 1
      Aimed at engineers and materials scientists in a wide range of sectors, this book is a unique source of surface preparation principles and techniques for plastics, thermosets, elastomers, ceramics and metals bonding. With emphasis on the practical, it draws together the technical principles of surface science and surface treatments technologies to enable practitioners to improve existing surface preparation processes to improve adhesion and, as a result, enhance product life. This book describes and illustrates the surface preparations and operations that must be applied to a surface before acceptable adhesive bonding is achieved. It is meant to be an exhaustive overview, including more detailed explanation where necessary, in a continuous and logical progression. The book provides a necessary grounding in the science and practice of adhesion, without which adequate surface preparation is impossible. Surface characterization techniques are included, as is an up-to-date assessment of existing surface treatment technologies such as Atmospheric Plasma, Degreasing, Grit blasting, laser ablation and more. Fundamental material considerations are prioritised over specific applications, making this book relevant to all industries using adhesives, such as medical, automotive, aerospace, packaging and electronics. This second edition represents a full and detailed update, with all major developments in the field included and three chapters added to cover ceramic surface treatment, plasma treatment of non-metallic materials, and the effect of additives on surface properties of plastics.

    • Metallurgical Coatings and Thin Films 1992

      • 1st Edition
      • December 2, 2012
      • G.E. McGuire + 2 more
      • English
      • Paperback
        9 7 8 0 4 4 4 5 6 4 3 3 7
      • eBook
        9 7 8 0 4 4 4 5 9 6 8 8 8
      One of the increasingly important requirements for high technology materials is that they possess near-surface properties different to their bulk properties. Specific surface properties are generally achieved through the use of these films or coatings or by modifying the structure or composition of the near surface. This two-volume work contains 157 papers covering a wide range of topics involving films, coatings, and modified surfaces. All aspects of the development of deposition technologies are addressed including basic research, applied research, applications development and full scale industrial production. The work will be of interest to materials scientists, physicists, electronic, chemical and mechanical engineers, and chemists.

    • Methods of Surface Analysis

      • 1st Edition
      • Volume 1
      • December 2, 2012
      • A.W. Czanderna
      • English
      • Paperback
        9 7 8 0 4 4 4 5 6 7 3 5 2
      • eBook
        9 7 8 0 4 4 4 5 9 6 4 5 1
      Methods of Surface Analysis deals with the determination of the composition of surfaces and the identification of species attached to the surface. The text applies methods of surface analysis to obtain a composition depth profile after various stages of ion etching or sputtering. The composition at the solid—solid interface is revealed by systematically removing atomic planes until the interface of interest is reached, in which the investigator can then determine its composition. The book reviews the effect of ion etching on the results obtained by any method of surface analysis including the effect of the rate of etching, incident energy of the bombarding ion, the properties of the solid, the effect of the ion etching on generating an output signal of electrons, ions, or neutrals. The text also describes the effect of the residual gases in the vacuum environment. The book considers the influence of the sample geometry, of the type (metal, insulator, semiconductor, organic), and of the atomic number can have on surface analysis. The text describes in detail low energy ion scattering spectroscopy, X-ray photoelectron spectroscopy, Auger electron spectroscopy, secondary ion mass spectroscopy, and infrared reflection-absorptio... spectroscopy. The book can prove useful for researchers, technicians, and scientists whose works involve organic chemistry, analytical chemistry, and other related fields of chemistry, such as physical chemistry or inorganic chemistry.

    • Metallurgical Coatings and Thin Films 1991

      • 1st Edition
      • December 2, 2012
      • G.E. McGuire + 2 more
      • English
      • Paperback
        9 7 8 0 4 4 4 5 6 6 4 6 1
      • eBook
        9 7 8 0 4 4 4 5 9 9 9 3 3
      The contributions in this two-volume set represent the work of over two hundred international researchers from universities, government laboratories and industry, with diverse backgrounds and interests in a wide range of coatings and thin film processes. The two hundred and six papers attest to the fact that Metallurgical Coatings is a rapidly growing field attracting experts from the large materials, scientific and technical community. The papers will be a useful and dynamic tool for those wishing to increase their knowledge on metallurgical coatings, as well as providing a guide to recent literature in this field.

    • Silicon Molecular Beam Epitaxy

      • 1st Edition
      • Volume 10A
      • December 2, 2012
      • Erwin Kasper + 1 more
      • English
      • Paperback
        9 7 8 0 0 8 0 9 7 8 4 1 3
      • eBook
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      This two-volume work covers recent developments in the single crystal growth, by molecular beam epitaxy, of materials compatible with silicon, their physical characterization, and device application. Papers are included on surface physics and related vacuum synthesis techniques such as solid phase epitaxy and ion beam epitaxy.A selection of contents: Volume I. SiGe Superlattices. SiGe strained layer superlattices (G. Abstreiter). Optical properties of strained GeSi superlattices grown on (001)Ge (T.P. Pearsall et al.). Growth and characterization of SiGe atomic layer superlattices (J.-M. Baribeau et al.). Optical properties of perfect and imperfect SiGe superlattices (K.B. Wong et al.). Confined phonons in stained short-period (001) Si/Ge superlattices (W. Bacsa et al.). Calculation of energies and Raman intensities of confined phonons in SiGe strained layer superlattices (J. White et al.). Rippled surface topography observed on silicon molecular beam epitaxial and vapour phase epitaxial layers (A.J. Pidduck et al.). The 698 meV optical band in MBE silicon (N. de Mello et al.). Silicon Growth Doping. Dopant incorporation kinetics and abrupt profiles during silicon molecular beam epitaxy (J.-E. Sundgren et al.). Influence of substrate orientation on surface segregation process in silicon-MBE (K. Nakagawa et al.). Growth and transport properties of SimSb1 (H. Jorke, H. Kibbel). Author Index. Volume. II. In-situ electron microscope studies of lattice mismatch relaxation in GexSi1-x/Si heterostructures (R. Hull et al.). Heterogeneous nucleation sources in molecular beam epitaxy-grown GexSi1-x/Si strained layer superlattices (D.D. Perovic et al.). Silicon Growth. Hydrogen-terminated silicon substrates for low-temperature molecular beam epitaxy (P.J. Grunthaner et al.). Interaction of structure with kinetics in Si(001) homoepitaxy (S. Clarke et al.). Surface step structure of a lens-shaped Si(001) vicinal substrate (K. Sakamoto et al.). Photoluminescence characterization of molecular beam epitaxial silicon (E.C. Lightowlers et al.). Doping. Boron doping using compound source (T. Tatsumi). P-type delta doping in silicon MBE (N.L. Mattey et al.). Modulation-doped superlattices with delta layers in silicon (H.P. Zeindell et al.). Steep doping profiles obtained by low-energy implantation of arsenic in silicon MBE layers (N. Djebbar et al.). Alternative Growth Methods. Limited reaction processing: growth of Si/Si1-xGex for heterojunction bipolar transistor applications (J.L. Hoyt et al.). High gain SiGe heterojunction bipolar transistors grown by rapid thermal chemical vapor deposition (M.L. Green et al.). Epitaxial growth of single-crystalline Si1-xGex on Si(100) by ion beam sputter deposition (F. Meyer et al.). Phosphorus gas doping in gas source silicon-MBE (H. Hirayama, T. Tatsumi). Devices. Narrow band gap base heterojunction bipolar transistors using SiGe alloys (S.S. Iyer et al.). Silicon-based millimeter-wave integrated circuits (J-F. Luy). Performance and processing line integration of a silicon molecular beam epitaxy system (A.A. van Gorkum et al.). Silicides. Reflection high energy electron diffraction study of Cosi2/Si multilayer structures (Q. Ye at al.). Epitaxy of metal silicides (H. von Kanel et al.). Epitaxial growth of ErSi2 on (111)si (D. Loretto et al.). Other Material Systems. Oxygen-doped and nitrogen-doped silicon films prepared by molecular beam epitaxy (M. Tabe et al.). Properties of diamond structure SnGe films grown by molecular beam epitaxy (A. Harwit et al.). Si-MBE: Prospects and Challenges. Prospects and challenges for molecular beam epitaxy in silicon very-large-scale integration (W. Eccleston). Prospects and challenges for SiGe strained-layer epitaxy (T.P. Pearsall). Author Index.

    • Shallow Impurity Centers in Semiconductors

      • 1st Edition
      • December 2, 2012
      • A. Baldereschi + 1 more
      • English
      • Paperback
        9 7 8 0 0 8 0 9 7 8 4 7 5
      • Hardback
        9 7 8 0 4 4 4 8 7 0 8 7 2
      • eBook
        9 7 8 0 0 8 0 9 8 4 5 9 9
      Shallow Impurity Centers in Semiconductors presents the proceedings of the Second International Conference on Shallow Impurity Centers/Fourth Trieste IUPAP-ICTP Semiconductor Symposium, held at the International Center for Theoretical Physics in Trieste, Italy, on July 28 to August 1, 1986. The book presents the perspectives of some of the leading scientists in the field who address basic physical aspects and device implications, novel phenomena, recent experimental and theoretical techniques, and the behavior of impurities in new semiconductor materials. Organized into 22 chapters, the book begins with an overview of the early years of shallow impurity states before turning to a discussion of progress in spectroscopy of shallow centers in semiconductors since 1960. It then looks at theoretical and experimental aspects of hydrogen diffusion and shallow impurity passivation in semiconductors, along with optical excitation spectroscopy of isolated double donors in silicon. The book methodically walks the reader through recent research on double acceptors using near-, mid-, and far-infrared spectroscopy, the far-infrared absorption spectrum of elemental shallow donors and acceptors in germanium, and impurity spectra in stress-induced uniaxial germanium using Zeeman spectroscopy. Other papers focus on the theoretical properties of hydrogenic impurities in quantum wells, lattice relaxations at substitutional impurities in semiconductors, shallow bound excitons in silver halides, and the electronic structure of bound excitons in semiconductors. The book concludes with a chapter that reviews picosecond spectroscopy experiments performed in III-V compounds and alloy semiconductors. This volume will be useful to physicists and researchers who are working on shallow impurity centers in semiconductor physics.

Related subjects

Biosurfaces and biointerfaces

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Surfaces and interfaces general

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