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Elsevier

Books in Surfaces and interfaces

This portfolio explores the physical and chemical properties of surfaces, thin films, and interfaces. Supporting materials scientists, chemists, and physicists, it features advances in surface characterization, nanostructures, and catalysis, driving innovations in electronics, energy, and nanotechnology.

  • Surface Science Techniques

    • 1st Edition
    • J.M. Walls + 1 more
    • English
    This volume provides a comprehensive and up to the minute review of the techniques used to determine the nature and composition of surfaces. Originally published as a special issue of the Pergamon journal Vacuum, it comprises a carefully edited collection of chapters written by specialists in each of the techniques and includes coverage of the electron and ion spectroscopies, as well as the atom-imaging methods such as the atom probe field ion microscope and the scanning tunnelling microscope. Surface science is an important area of study since the outermost surface layers play a crucial role in processses such as catalysis, adhesion, wear, and corrosion, with applications in metallurgy, thin films and surface coatings, the chemicals and polymer industries, and microelectronics, to name a few. This book covers those techniques used routinely for surface analysis as well as those employed for more fundamental scientific studies. It will be of interest to university research workers, graduate students and to industrial scientists solving practical problems.

  • Progress in Surface and Membrane Science

    Volume 12
    • 1st Edition
    • D. A. Cadenhead + 1 more
    • English
    Progress in Surface and Membrane Science, Volume 12 covers the advances in the study of surface and membrane science. The book discusses the topographical differentiation of the cell surface; the NMR studies of model biological membrane system; and an irreversible thermodynamic approach to energy coupling in mitochondria and chloroplasts. The text also describes water at surfaces; the nature of microemulsions; and the energy principle in the stability of interfaces. Biochemists, physicists, chemical engineers, and people involved in surface and coatings research will find the book invaluable.

  • Organic Thin Films and Surfaces: Directions for The Nineties

    Directions for the Nineties
    • 1st Edition
    • Volume 20
    • Abraham Ulman
    • English
    Physics of Thin Films has been one of the longest running continuing series in thin film science consisting of 20 volumes since 1963. The series contains some of the highest quality studies of the properties ofvarious thin films materials and systems.In order to be able to reflect the development of todays science and to cover all modern aspects of thin films, the series, beginning with Volume 20, will move beyond the basic physics of thin films. It will address the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.Edited by Abraham Ulman, Organic Thin Films and Surfaces: Directions for the Nineties will be the first volume to link two dynamic areas in the physical sciences--organic thin films and surface science. Contributions from leading experts in the field cover a range of important topics on the processing, characterization, and applications of organic thin films.

  • Thin Films for Advanced Electronic Devices

    Advances in Research and Development
    • 1st Edition
    • Volume 15
    • Maurice H. Francombe
    • English
    In this volume of the highly esteemed Physics of Thin Films serial, focused coverage is given to new trends in solid state devices. Four chapters combine to provide comprehensive discussions of magnetostatic wave phenomena in epitaxial magnetic oxide films and their applications in microwave signal processing devices: Thin-film rare earth transition metal alloys for magnetooptic recording. Two new classes of quantum well structures that have been used for infrared detectors and ultrafast resonant tunneling devices. Recent applications of Fourier transform spectroscopy for the analysis of inorganic thin solid films. This book provides a focused treatment of recent developments in novel thin film solid state components, and specifically discusses magnetic, semiconducting, and optical phenomena.

  • Langmuir-Blodgett Films

    • 1st Edition
    • Volume 1
    • W.A. Barlow
    • English
    Topics covered range from basic structural studies to areas as diverse as electron tunneling, photovoltaic effects and solid state polymerisation.

  • Developments in Surface Contamination and Cleaning - Vol 6

    Methods of Cleaning and Cleanliness Verification
    • 1st Edition
    • Rajiv Kohli + 1 more
    • English
    In this series Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. The expert contributions in this volume cover important fundamental aspects of surface contamination that are key to understanding the behavior of specific types of contaminants. This understanding is essential to develop preventative and mitigation methods for contamination control. The coverage complements the treatment of surface contamination in vol.1, Fundamental and Applied Aspects. This volume covers: Sources and Generation of Particles; Manipulation Techniques for Particles on Surfaces; Particle Deposition and Rebound; Particle Behavior in Liquid Systems; Biological and Metallic Contamination; and includes a comprehensive list of current standards and resources.

  • Surfaces and Interfaces: Physics and Electronics

    • 1st Edition
    • R.S. Bauer
    • English
    Surfaces and Interfaces: Physics and Electronics covers the proceedings of the second Trieste ICTP-IUPAP Semiconductor Symposium, conducted at the International Center for Theoretical Physics in Trieste, Italy on August 30 to September 3, 1982. The book focuses on the processes, methodologies, reactions, and approaches involved in semiconductor physics. The selection first elaborates on the electronic properties and surface geometry of GaAs and ZnO surfaces; electronic structure of Si (III) surfaces; and photoemission studies of surface states on Si (III) 2X1. Discussions focus on consistency of different experiments, relating experiments to a theoretical model, quenching of surface states by hydrogen, inverse photoemission results, and basic data and models of the low-index ZnO surfaces. The text then examines Si (III) 2X1 studies by angle resolved photoemission; electronic surface states at steps in Si (III) 2X1; and a novel method for the study of optical properties of surfaces. The manuscript takes a look at spot profile analysis (LEED) of defects at silicon surfaces; chemisorption-induce... defects at interfaces on compound semiconductors; and surface defects on semiconductors. The microscopic properties and behavior of silicide interfaces, recombination at semiconductor surfaces and interfaces, and dipoles, defects, and interfaces are also discussed. The selection is a highly recommended source of data for physicists and readers wanting to study semiconductor physics.

  • Methods of Surface Analysis

    • 1st Edition
    • Volume 1
    • A.W. Czanderna
    • English
    Methods of Surface Analysis deals with the determination of the composition of surfaces and the identification of species attached to the surface. The text applies methods of surface analysis to obtain a composition depth profile after various stages of ion etching or sputtering. The composition at the solid—solid interface is revealed by systematically removing atomic planes until the interface of interest is reached, in which the investigator can then determine its composition. The book reviews the effect of ion etching on the results obtained by any method of surface analysis including the effect of the rate of etching, incident energy of the bombarding ion, the properties of the solid, the effect of the ion etching on generating an output signal of electrons, ions, or neutrals. The text also describes the effect of the residual gases in the vacuum environment. The book considers the influence of the sample geometry, of the type (metal, insulator, semiconductor, organic), and of the atomic number can have on surface analysis. The text describes in detail low energy ion scattering spectroscopy, X-ray photoelectron spectroscopy, Auger electron spectroscopy, secondary ion mass spectroscopy, and infrared reflection-absorptio... spectroscopy. The book can prove useful for researchers, technicians, and scientists whose works involve organic chemistry, analytical chemistry, and other related fields of chemistry, such as physical chemistry or inorganic chemistry.

  • Thin Film Processes

    • 1st Edition
    • John L. Vossen
    • English
    Remarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines for their implementation, a guide to the literature, and an overview of each process.

  • Metallurgical Coatings and Thin Films 1992

    • 1st Edition
    • G.E. McGuire + 2 more
    • English
    One of the increasingly important requirements for high technology materials is that they possess near-surface properties different to their bulk properties. Specific surface properties are generally achieved through the use of these films or coatings or by modifying the structure or composition of the near surface. This two-volume work contains 157 papers covering a wide range of topics involving films, coatings, and modified surfaces. All aspects of the development of deposition technologies are addressed including basic research, applied research, applications development and full scale industrial production. The work will be of interest to materials scientists, physicists, electronic, chemical and mechanical engineers, and chemists.

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