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Books in Physics

Physics titles offer comprehensive research and advancements across the fundamental and applied areas of physical science. From quantum mechanics and particle physics to astrophysics and materials science, these titles drive innovation and deepen understanding of the principles governing the universe. Essential for researchers, educators, and students, this collection supports scientific progress and practical applications across a diverse range of physics disciplines.

    • Progress in Analytical Atomic Spectroscopy

      • 1st Edition
      • June 23, 2016
      • C L Chakrabarti
      • English
      • Paperback
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      • Hardback
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      • eBook
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      Progress in Analytical Atomic Spectroscopy, Volume 2 discusses several concerns regarding analytical atomic spectroscopy. The book contains five parts that tackle a specific area of concern. The first part covers the basic principles and applications of atomic fluorescence spectrometry and contains eight chapters that tackle several areas, such as optical pumping process, analytical detectability, plasma diagnostic, and Doppler-free high resolution spectroscopy. The second part discusses trace element analysis of food and beverages by atomic spectrometry. The third part covers the determination of trace metals in ultrapure water; this part contains three chapters that discuss the sources and control of contamination; techniques and methodology; and evaluation of the reliability of existing data. The following part tackles the interference in flame spectrometry, and the last part discusses emission spectroscopic analysis using cool flames. The book will be of great interest to researcher whose work involves analytical atomic spectroscopy.
    • Transistors

      • 1st Edition
      • June 23, 2016
      • E. J. M. Kendall
      • D. Ter Haar
      • English
      • eBook
        9 7 8 1 4 8 3 1 3 8 5 0 3
      Transistors reviews major advances that have been made with respect to transistors and illustrates some of the many facets of transistor research and development. Topics covered range from point contact devices and junction devices to p-n junctions in semiconductors, unipolar and analog transistors, and hole injection in transistor action. The physical principles involved in transistor action are also discussed, along with the nature of the forward current in germanium point contacts. This book is comprised of 19 papers and begins with a summary of the semiconductor physics pertinent to the understanding of transistors. The reader is then introduced to developments in point contact devices and junction devices; how the conductance of thin films of semiconductors is modulated by surface charges; the relation between surface states and rectification at a metal-semiconductor contact; and a three-element electronic device that utilizes a semiconductor as the basic element. The remaining papers focus on p-n junction transistors; the theory of alpha for p-n-p diffused junction transistors; and unipolar and analog transistors. The effects of electrical forming on the rectifying barriers of n- and p-germanium transistors are also analyzed. The final chapter describes a thin-film transistor fabricated by evaporation of all components onto an insulating substrate. This monograph will be of interest to physicists and electronics engineers.
    • Men of Physics: L.D. Landau

      • 1st Edition
      • June 22, 2016
      • D. Ter Haar
      • D. Ter Haar
      • English
      • Paperback
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      • Hardback
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      • eBook
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      Men of Physics: L. D. Landau, Volume 2: Thermodynamics, Plasma Physics and Quantum Mechanics is dedicated to L. D. Landau's contributions in the fields of thermodynamics, plasma physics, and quantum mechanics. Landau's theory of second-order phase transitions is discussed, along with his contributions to nuclear physics, astrophysics, cosmic ray physics, and quantum field theory. This volume is comprised of 15 chapters and begins with a discussion on Landau's theory of second-order phase transitions, which includes his assumption that all thermodynamic functions would allow regular series expansions near the transition point. The following chapters focus on Landau's papers on the transport equation for ionized systems and on plasma oscillations; his contributions to nuclear physics, cosmic ray physics, and astrophysics; his work in pure quantum mechanics; and his contributions to quantum field theory. The second section elaborates on the theory of phase transitions; the transport equation in the case of Coulomb interactions; the vibrations of the electronic plasma; and the statistical theory of nuclei. The origin of stellar energy is also examined, along with the multiple production of particles during collisions of fast particles and the extension of the uncertainty principle to relativistic quantum theory. A theory of energy transfer in collisions is also described. The final chapter considers the conservation laws for weak interactions. This book will be a useful resource for physicists and students interested in the work of L. D. Landau.
    • Thin Films by Chemical Vapour Deposition

      • 1st Edition
      • Volume 7
      • June 22, 2016
      • C.E. Morosanu
      • G. Siddall
      • English
      • eBook
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      The explosive growth in the semiconductor industry has caused a rapid evolution of thin film materials that lend themselves to the fabrication of state-of-the-art semiconductor devices. Early in the 1960s an old research technique named chemical vapour phase deposition (CVD), which has several unique advantages, developed into the most widely used technique for thin film preparation in electronics technology. In the last 25 years, tremendous advances have been made in the science and technology of thin films prepared by means of CVD. This book presents in a single volume, an up-to-date overview of the important field of CVD processes which has never been completely reviewed previously. Contents: Part I. 1. Evolution of CVD Films. Introductory remarks. Short history of CVD thin films. II. Fundamentals. 2. Techniques of Preparing Thin Films. Electrolytic deposition techniques. Vacuum deposition techniques. Plasma deposition techniques. Liquid-phase deposition techniques. Solid-phase deposition techniques. Chemical vapour conversion of substrate. Chemical vapour deposition. Comparison between CVD and other thin film deposition techniques. 3. Chemical Processes Used in CVD. Introduction. Description of chemical reactions used in CVD. 4. Thermodynamics of CVD. Feasibility of a CVD process. Techniques for equilibrium calculations in CVD systems. Examples of thermodynamic studies of CVD systems. 5. Kinetics of CVD. Steps and control type of a CVD heterogeneous reaction. Influence of experimental parameters on thin film deposition rate. Continuous measurement of the deposition rate. Experimental methods for studying CVD kinetics. Role of homogeneous reactions in CVD. Mechanism of CVD processes. Kinetics and mechanism of dopant incorporation. Transport phenomena in CVD. Status of kinetic and mechanism investigations in CVD systems. 6. Measurement of Thin Film Thickness. Mechanical methods. Mechanical-optical methods. Optical methods. Electrical methods. Miscellaneous methods. 7. Nucleation and Growth of CVD Films. Stages in the nucleation and growth mechanism. Regimes of nucleation and growth. Nucleation theory. Dependence of nucleation on deposition parameters. Heterogeneous nucleation and CVD film structural forms. Homogeneous nucleation. Experimental techniques. Experimental results of CVD film nucleation. 8. Thin Film Structure. Techniques for studying thin film structure. Structural defects in CVD thin films. 9. Analysis of CVD Films. Analysis techniques of thin film bulk. Analysis techniques of thin film surfaces. Film composition measurement. Depth concentration profiling. 10. Properties of CVD Films. Mechanical properties. Thermal properties. Optical properties. Photoelectric properties. Electrical properties. Magnetic properties. Chemical properties. Part III. 11. Equipment and Substrates. Equipment for CVD. Safety in CVD. Substrates. 12. Preparation and Properties of Semiconducting Thin Films. Homoepitaxial semiconducting films. Heteroepitaxial semiconducting films. 13. Preparation and Properties of Amorphous Insulating Thin Films. Oxides. Nitrides and Oxynitrides. Polymeric thin films. 14. Preparation and Properties of Conductive Thin Films. Metals and metal alloys. Resistor materials. Transparent conducting films. Miscellaneous materials. 15. Preparation and Properties of Superconducting and Magnetic Thin Films. Superconducting materials. Magnetic materials. 16. Uses of CVD Thin Films. Applications in electronics and microelectronics. Applications in the field of microwaves and optoelectronics. Miscellaneous applications. Artificial heterostructures (Quantum wells, superlattices, monolayers, two-dimensional electron gases). Part V. 17. Present and Future Importance of CVD Films. Present status and future trends in CVD films. References. Index of Acronyms and Abbreviations. Author Index. CVD Film Index. Subject Index. Supplier Index.
    • Heat Transfer Enhancement Using Nanofluid Flow in Microchannels

      • 1st Edition
      • June 11, 2016
      • Davood Domairry Ganji + 1 more
      • English
      • Hardback
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      • eBook
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      Heat Transfer Enhancement Using Nanofluid Flow in Microchannels: Simulation of Heat and Mass Transfer focuses on the numerical simulation of passive techniques, and also covers the applications of external forces on heat transfer enhancement of nanofluids in microchannels. Economic and environmental incentives have increased efforts to reduce energy consumption. Heat transfer enhancement, augmentation, or intensification are the terms that many scientists employ in their efforts in energy consumption reduction. These can be divided into (a) active techniques which require external forces such as magnetic force, and (b) passive techniques which do not require external forces, including geometry refinement and fluid additives.