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Books in Surfaces and interfaces

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Theory and Practice of Emulsion Technology

  • 1st Edition
  • November 12, 2012
  • A.L. Smith
  • English
  • eBook
    9 7 8 - 0 - 3 2 3 - 1 5 4 3 7 - 6
Theory and Practice of Emulsion Technology covers the proceedings of the Theory and Practice of Emulsion Technology Symposium, held at Brunel University on September 16-18, 1974. This book is organized into four sessions encompassing 19 chapters. The opening session deals with the emulsification process and emulsion polymerization, as well as the adsorption behavior of polyelectrolyte-stabilized emulsions. The following session examines the rheological properties, stability, and fluid mechanics of emulsions. This session also looks into the role of protein conformation and crude oil-water interfacial properties in emulsion stability. The third session highlights the preparation, formation, properties, and application of bitumen emulsions. The concluding session describes the process of spontaneous emulsification; the steric emulsion stabilization; the interfacial measurements of oil-in-water emulsions; and the influence of the disperse phase on emulsion stability. This book will be of value to chemists, chemical and process engineers, and researchers.

Vacuum Technology, Thin Films, and Sputtering

  • 1st Edition
  • November 12, 2012
  • R. V. Stuart
  • English
  • eBook
    9 7 8 - 0 - 3 2 3 - 1 3 9 1 5 - 1
Vacuum technology is advancing and expanding so rapidly that a major difficulty for most companies in the field is finding qualified technicians needed for expansion and as replacements. The only recourse for most companies is to hire capable, though untrained, people to train them in-house. One of the problems in this course of action is that it repeatedly draws on the valuable time of experienced personnel to explain fundamental concepts to a trainee.

Thin Film Processes

  • 1st Edition
  • November 12, 2012
  • John L. Vossen
  • English
  • eBook
    9 7 8 - 0 - 3 2 3 - 1 3 8 9 8 - 7
Remarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines for their implementation, a guide to the literature, and an overview of each process.

Vacuum Engineering Calculations, Formulas, and Solved Exercises

  • 1st Edition
  • November 11, 2012
  • Armand Berman
  • English
  • eBook
    9 7 8 - 0 - 3 2 3 - 1 4 0 4 1 - 6
This book was written with two main objectives in mind - to summarize and organize the vast material of vacuum technology in sets of useful formulas, and to provide a collection of worked out exercises showing how to use these formulas for solving technological problems. It is an ideal reference source for those with little time to devote to a full mathematical treatment of the many problems issued in vacuum practice, but who have a working knowledge of the essentials of vacuum technology, elementary physics, and mathematics. This time saving book employs a problem-solving approach throughout, providing the methodology for computing vacuum parameters. References and solved exercises are appended to the end of each chapter.

Photonic Probes of Surfaces

  • 1st Edition
  • November 11, 2012
  • P. Halevi
  • English
  • eBook
    9 7 8 - 0 - 4 4 4 - 5 9 9 3 4 - 6
This volume is devoted principally to optical spectroscopies of material surfaces and also encompasses scattering techniques and theoretical response analysis as well as spectroscopies. In addition to solid surfaces some attention is also devoted to interfaces between two solids, between a solid and a liquid and to a liquid-vapor interface. These surfaces may be clean and perfect, in which case the purpose of the spectroscopical method at hand is to determine the deviation of the atomic structure in the surface region from that in the bulk, namely the surface reconstruction. Otherwise the surface may be imperfect due to roughness, strain or overlayers, in which case the spectroscopy can yield information on the nature of such imperfections, including the monitoring of growth processes. One of the foremost purposes of surface spectroscopies is to extract information on atomic and molecular adsorbates on solid surfaces. Most of the 10 chapters are concerned with photonic sources of excitation, the respective spectral regions ranging from the far infrared to X-rays.In conclusion this book provides a state-of-the-art review of all major types of photonic probes of surfaces and interfaces and deals with both applications and experiment and theory.

Handbook of Thin Film Deposition

  • 3rd Edition
  • June 27, 2012
  • Krishna Seshan
  • English
  • Hardback
    9 7 8 - 1 - 4 3 7 7 - 7 8 7 3 - 1
  • eBook
    9 7 8 - 1 - 4 3 7 7 - 7 8 7 4 - 8
The Handbook of Thin Film Deposition is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, new materials for memory applications and methods for thin film optical processes.  In a major restructuring, this edition of the handbook lays the foundations with an up-to-date treatment of lithography, contamination and yield management, and reliability of thin films. The established physical and chemical deposition processes and technologies are then covered, the last section of the book being devoted to more recent technological developments such as microelectromechanical systems, photovoltaic applications, digital cameras, CCD arrays, and optical thin films.

Advances in CMP Polishing Technologies

  • 1st Edition
  • November 30, 2011
  • Toshiro Doi + 2 more
  • English
  • Hardback
    9 7 8 - 1 - 4 3 7 7 - 7 8 5 9 - 5
  • eBook
    9 7 8 - 1 - 4 3 7 7 - 7 8 6 0 - 1
CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. Advances in CMP/Polishing Technologies for Manufacture of Electronic Devices presents the latest developments and technological innovations in the field – making cutting-edge R&D accessible to the wider engineering community. Most of the applications of these processes are kept as confidential as possible (proprietary information), and specific details are not seen in professional or technical journals and magazines. This book makes these processes and applications accessible to a wider industrial and academic audience. Building on the fundamentals of tribology – the science of friction, wear and lubrication – the authors explore the practical applications of CMP and polishing across various market sectors. Due to the high pace of development of the electronics and semiconductors industry, many of the presented processes and applications come from these industries.

Developments in Surface Contamination and Cleaning, Volume 4

  • 1st Edition
  • September 26, 2011
  • Rajiv Kohli + 1 more
  • English
  • eBook
    9 7 8 - 1 - 4 3 7 7 - 7 8 8 4 - 7
In this series Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. The expert contributions in this volume cover important fundamental aspects of surface contamination that are key to understanding the behavior of specific types of contaminants. This understanding is essential to develop preventative and mitigation methods for contamination control. The coverage complements the treatment of surface contamination in vol.1, Fundamental and Applied Aspects. This volume covers: Sources and Generation of Particles; Manipulation Techniques for Particles on Surfaces; Particle Deposition and Rebound; Particle Behavior in Liquid Systems; Biological and Metallic Contamination; and includes a comprehensive list of current standards and resources.

Thin Film Growth

  • 1st Edition
  • July 18, 2011
  • Zexian Cao
  • English
  • Paperback
    9 7 8 - 0 - 0 8 - 1 0 1 7 2 2 - 7
  • eBook
    9 7 8 - 0 - 8 5 7 0 9 - 3 2 9 - 5
Thin film technology is used in many applications such as microelectronics, optics, hard and corrosion resistant coatings and micromechanics, and thin films form a uniquely versatile material base for the development of novel technologies within these industries. Thin film growth provides an important and up-to-date review of the theory and deposition techniques used in the formation of thin films.Part one focuses on the theory of thin film growth, with chapters covering nucleation and growth processes in thin films, phase-field modelling of thin film growth and surface roughness evolution. Part two covers some of the techniques used for thin film growth, including oblique angle deposition, reactive magnetron sputtering and epitaxial growth of graphene films on single crystal metal surfaces. This section also includes chapters on the properties of thin films, covering topics such as substrate plasticity and buckling of thin films, polarity control, nanostructure growth dynamics and network behaviour in thin films.With its distinguished editor and international team of contributors, Thin film growth is an essential reference for engineers in electronics, energy materials and mechanical engineering, as well as those with an academic research interest in the topic.

Developments in Surface Contamination and Cleaning, Volume 3

  • 1st Edition
  • March 25, 2011
  • Rajiv Kohli + 1 more
  • English
  • Hardback
    9 7 8 - 1 - 4 3 7 7 - 7 8 8 5 - 4
  • eBook
    9 7 8 - 1 - 4 3 7 7 - 7 8 8 6 - 1
The contributions in this volume cover methods for removal of particle contaminants on surfaces. Several of these methods are well established and have been employed in industrial applications for a long time. However, the ever- higher demand for removal of smaller particles on newer substrate materials is driving continuous development of the established cleaning methods and alternative innovative methods for particle removal. This book provides information on the latest developments in this topic area.