Advances in Optics of Charged Particle Analyzers: Part Two, Volume 233 merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The release in the series features articles on Electrostatic Energy, Mass Analyzers With Combined Electrostatic and Magnetic Fields, Mass Analyzers based on Fourier Transform, Principles of Time-of-Flight Mass Analyzers, Multi-Pass Time-of-Flight Mass Analyzers, and Radiofrequency Mass Analyzers.
Advances in Optics of Charged Particle Analyzers: Part 1, Volume 232 merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains. Specific chapters cover Introduction to inverse problems in electron microscopy, Directional sinogram inpainting for limited angle tomography, Strain tomography of crystals, FISTA with adaptive discretization, Total variation discretization, and Reconstruction with a Gaussian Dictionary.
Nanolithography and Surface Microscopy with Electron Beams, Volume 231 merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains. Specific chapters cover Introduction to inverse problems in electron microscopy, Directional sinogram inpainting for limited angle tomography, Strain tomography of crystals, FISTA with adaptive discretization, Total variation discretization, and Reconstruction with a Gaussian Dictionary.
Coulomb Interactions in Particle Beams, Volume 230, the latest release in the Advances in Imaging and Electron Physics series, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.
The Properties of Ponderomotive Lenses, Volume 228 in the Advances in Imaging and Electron Physics series, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. Chapters in this new release cover Characterization of nanomaterials properties using FE-TEM, Cold field-emission electron sources: From higher brightness to ultrafast beams, Every electron counts: Towards the development of aberration optimized and aberration corrected electron sources, and more. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains.
Coherent Electron Microscopy: Designing Faster and Brighter Electron Sources, Volume 227 in the Advances in Imaging and Electron Physics series, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. Chapters in this new release cover Characterization of nanomaterials properties using FE-TEM, Cold field-emission electron sources: From higher brightness to ultrafast beams, Every electron counts: Towards the development of aberration optimized and aberration corrected electron sources, and more. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains.
Now in its Third Edition, Fundamentals of Optical Waveguides continues to be an essential resource for any researcher, professional or student involved in optics and communications engineering. Any reader interested in designing or actively working with optical devices must have a firm grasp of the principles of lightwave propagation. Katsunari Okamoto continues to present this difficult technology clearly and concisely with several illustrations and equations. Optical theory encompassed in this reference includes coupled mode theory, nonlinear optical effects, finite element method, beam propagation method, staircase concatenation method, along with several central theorems and formulas. Silicon photonics devices such as coupled resonator optical waveguides (CROW), lattice-form filters, and AWGs are also fully described. This new edition gives readers not only a thorough understanding the silicon photonics devices for on-chip photonic network, but also the capability to design various kinds of devices.
Computer Techniques for Image Processing in Electron Microscopy, Volume 214 in the Advances in Imaging and Electron Physics series, presents the latest advances in the field, with this new volume covering Image Formation Theory, The Discrete Fourier Transform, Analytic Images, The Image and Diffraction Plane Problem: Uniqueness, The Image and Diffraction Plane Problem: Numerical Methods, The Image and Diffraction Plane Problem: Computational Trials, Alternative Data for the Phase Determination, The Hardware of Digital Image Handling, Basic Software or Digital Image Handling, Improc, and much more.
Nonlinear Optics, Fourth Edition, is a tutorial-based introduction to nonlinear optics that is suitable for graduate-level courses in electrical and electronic engineering, and for electronic and computer engineering departments, physics departments, and as a reference for industry practitioners of nonlinear optics. It will appeal to a wide audience of optics, physics and electrical and electronic engineering students, as well as practitioners in related fields, such as materials science and chemistry.
Reliability of Photonics Devices discusses the advantages of training computer scientists with a knowledge base that is broad enough to adapt to the context of different companies, administrations and organizations. The book's focus is multidisciplinary, including the inclusion of computer science, information systems, organization and management, communication, professionalization and applied mathematics. The MIAGE sector is offered by 22 French universities, 6 of which offer a joint remote version, also shared by 5 associated foreign institutions.In this sector, students come from scientific or economics-management fields. Their mathematical background, without being elementary, is not that of a student engaged in a long mathematical field. The applied mathematics concepts of the MIAGE program focus on descriptive statistics, probabilities, data analysis, random processes and numerical simulation.