Nanolithography and Surface Microscopy with Electron Beams

1st Edition, Volume 231 - October 25, 2024
Imprint: Academic Press
Editors: Peter W. Hawkes, Martin Hÿtch
Language: English
Hardback ISBN:
9 7 8 - 0 - 4 4 3 - 3 1 4 6 2 - 9
eBook ISBN:
9 7 8 - 0 - 4 4 3 - 3 1 4 6 3 - 6

Nanolithography and Surface Microscopy with Electron Beams, Volume 231 merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical a… Read more

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Nanolithography and Surface Microscopy with Electron Beams, Volume 231 merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains. Specific chapters cover Introduction to inverse problems in electron microscopy, Directional sinogram inpainting for limited angle tomography, Strain tomography of crystals, FISTA with adaptive discretization, Total variation discretization, and Reconstruction with a Gaussian Dictionary.

Nanolithography and Surface Microscopy with Electron Beams
Cover image
Title page
Table of Contents
Series Page
Copyright
Preface
Author's preface
Chapter One Early life
Abstract
Keywords
Geelong Grammar School
Melbourne University
Chapter Two SEM/ion beam system for examining ion etched surfaces
Abstract
Keywords
Summary of the final lens specifications
Theoretical estimation of beam diameter
Mass filter for the ion beam
Electrostatic quadrupole filter
Magnetic deflection filter
Shape of the magnetic deflecting field
Performance of the magnetic deflection filter
References
Chapter Three SEM examination of ion-etched metal and semiconductor crystals
Abstract
Keywords
Introduction
Formation of cones underneath particles of shielding material on the surface of ion-etched samples
Introduction
Results
Interpretation of results
Ion etching of mechanically distorted aluminum crystals
Introduction
Experimental results
Summary and interpretation of results
Formation of ridges on the surface of ion-etched crystalline metal specimens
Introduction
Experimental results
Summary and conclusions
Oxidation
Contamination
Back-sputtered material
Ion etching of silicon
Introduction
Experimental results
Conclusions
References
Chapter Four Microfabrication in an SEM
Abstract
Keywords
Micro-machining by ion etching through a mask of electron beam written contamination (Broers, 1964)
Micromachining by ion etching through a mask of electron beam exposed KPR photoresist (Broers, 1965a,b)
Summary of electron beam fabrication and recording techniques in 1964
Thermal processes
Electron beam-induced processes
Comparison of techniques for micro-machining
Ph.D. Oral Examination
References
Chapter Five My move to IBM and research on long-life cathodes
Abstract
Keywords
IBM Thomas J Watson research laboratory
Long-life tungsten cathodes for use in electron beam memory systems
Choice of cathode type
Experimental arrangement for measuring brightness
Rod cathode
Rod cathode experimental results
The cone cathode
Cone cathode experimental results
Long-life tungsten cathodes: Conclusions
Lanthanum hexaboride cathodes
References
Further reading
Chapter Six LaB6 cathode high-resolution electron probe and its application to microfabrication and surface microscopy
Abstract
Keywords
Theoretical electron optical performance
LaB6 electron gun
LaB6 material quality
Electron beam column
Vacuum system
Vibration isolation
Electronics
Experimental performance
Measurement of the ultimate resolution of the surface scanning electron microscopy using the Everhart/Thornley secondary electron detector
Routine surface scanning electron microscopy
Microfabrication probe used for making prototype silicon circuits
Microfabrication in the new SEM
Acoustic surface wave transducers
Thin window substrate
Scanning electron microscopy of biological samples
Red blood cells
Human marrow
Mineralized tissue
References
Chapter Seven Illumination systems and cathodes for electron probes and the design of a short focal length final lens electron probe
Abstract
Keywords
Illumination systems (Broers, 1979)
Comparison of thermal and field emission cathodes (Broers, 1972)
Cold field emission
High brightness electron gun using a field emission gun
Field emission gun and lens
Thermal electron sources
Microfabrication
The decision to use LaB6 Schottky cathode in the new high-resolution electron probe
Short focal length LaB6 cathode electron probe
Electron gun
Standard mode—Cross-over as the object for electron optical column
Kohler illumination
Measurement of brightness
References
Chapter Eight Performance of the high resolution short focal length final lens electron probe and low-loss surface scanning electron microscopy
Abstract
Keywords
Probe performance
Resolution limit and contamination
Surface microscopy with low-loss scattered electron
Low-loss scanning electron microscopy of biological specimens
Sample coating
Sample staining
Preparation and examination of 3C and T4 Bacteriophage
Low-loss imaging of bacterial virus T7
Results
Discussion
Conclusions
References
Further reading
Chapter Nine Microfabrication in the STEM
Abstract
Keywords
Measurement of the resolution of PMMA
Conclusions
Measurement of the resolution contrast function for PMMA as an electron resist
Sample preparation
Exposure
Determination of exposure distribution for thin resist on a thin window substrate
Contrast for an array of infinitely long parallel lines
Exposure distribution for solid substrates and thick resist layers
Normalized aperture exposure
Contrast and resolution for optical exposure
Contrast for optical and electron beam exposure
Direct fabrication with electron beams
Exposure of multi-layer Langmuir–Blodgett films
Experimental methods
Experimental results
Discussion
Radiation damage lithography
References
Chapter Ten Nano-devices fabricated with the short focal length electron probe
Abstract
Keywords
Josephson Effect in Nb Bridges
Ratio of Superconducting Transition Temperatures in Granular Nb Films (Laibowitz et al., 1980)
Quasiparticle charge-diffusion length in amorphous Re-W wires
Nanobridge SQUIDS
Observation of h/e Aharonov-Bohm Interference effects in submicron diameter, normal metal rings
Ring fabrication
Results and discussion
Conclusions
References
Chapter Eleven Semiconductor lithography and processing in the 1980s and 1990s
Abstract
Keywords
Semiconductor technology in 1980
Lithography in 1980
Optical lithography
Scanning mirror cameras
Step and repeat cameras
Electron beam lithography
Throughput limits for electron beam lithography
X-ray lithography
Electron storage ring
Resolution of X-ray lithography
Other lithography exposure methods being worked on in 1980
The future
References
Further reading
Chapter Twelve Nanolithography at 350 kV
Abstract
Keywords
Teaching and research at Cambridge 1984–1996
JEOL 4000 EX electron microscope
Projection TEM vs STEM
Measurement of the resolution of PMMA
Lift-off patterning with PMMA
Contamination-resist
Methods for manipulating resist processes to make sub-10 nm structures
Discussion
Direct exposure of SiO2 on bulk substrates
Experiments
Direct exposure of SiO2 on membrane substrates
Simulation of exposure profiles
Replication of SiO2 trenches into polycrystalline and single-crystal silicon
Use of deposited SiO2 as a resist (Pan et al., 1991)
Mechanism of the direct exposure of SiO2
Use of patterned SiO2 as a template
Device applications
References
Chapter Thirteen Nanolithography for modulation doped field effect transistors
Abstract
Keywords
Introduction
The scaling of high electron mobility transistors HEMTs
Normally conducting gates
Superconducting gates
Experimental results
Device fabrication
DC characteristics
Microwave characteristics
Summary and conclusions
References
Epilogue
EUV lithography
Electron beam lithography
Multibeam electron beam masks writers
Thermal field and Schottky emission cathodes
Limited-area cathodes
Ultimate resolution of optical, electron beam, and X-ray lithographies
References
Index

Peter W. Hawkes

Peter Hawkes obtained his M.A. and Ph.D (and later, Sc.D.) from the University of Cambridge, where he subsequently held Fellowships of Peterhouse and of Churchill College. From 1959 – 1975, he worked in the electron microscope section of the Cavendish Laboratory in Cambridge, after which he joined the CNRS Laboratory of Electron Optics in Toulouse, of which he was Director in 1987. He was Founder-President of the European Microscopy Society and is a Fellow of the Microscopy and Optical Societies of America. He is a member of the editorial boards of several microscopy journals and serial editor of Advances in Electron Optics.

Affiliations and expertise

Founder-President of the European Microscopy Society and Fellow, Microscopy and Optical Societies of America; member of the editorial boards of several microscopy journals and Serial Editor, Advances in Electron Optics, France

Martin Hÿtch

Dr Martin Hÿtch, serial editor for the book series “Advances in Imaging and Electron Physics (AIEP)”, is a senior scientist at the French National Centre for Research (CNRS) in Toulouse. He moved to France after receiving his PhD from the University of Cambridge in 1991 on “Quantitative high-resolution transmission electron microscopy (HRTEM)”, joining the CNRS in Paris as permanent staff member in 1995. His research focuses on the development of quantitative electron microscopy techniques for materials science applications. He is notably the inventor of Geometric Phase Analysis (GPA) and Dark-Field Electron Holography (DFEH), two techniques for the measurement of strain at the nanoscale. Since moving to the CEMES-CNRS in Toulouse in 2004, he has been working on aberration-corrected HRTEM and electron holography for the study of electronic devices, nanocrystals and ferroelectrics. He was laureate of the prestigious European Microscopy Award for Physical Sciences of the European Microscopy Society in 2008. To date he has published 130 papers in international journals, filed 6 patents and has given over 70 invited talks at international conferences and workshops.

Affiliations and expertise

Senior Scientist, French National Centre for Research (CNRS), Toulouse, France

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