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Nanolithography and Surface Microscopy with Electron Beams
- 1st Edition, Volume 231 - October 25, 2024
- Editors: Peter W. Hawkes, Martin Hÿtch
- Language: English
- Hardback ISBN:9 7 8 - 0 - 4 4 3 - 3 1 4 6 2 - 9
- eBook ISBN:9 7 8 - 0 - 4 4 3 - 3 1 4 6 3 - 6
Nanolithography and Surface Microscopy with Electron Beams, Volume 231 merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical a… Read more
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Request a sales quoteNanolithography and Surface Microscopy with Electron Beams, Volume 231 merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains. Specific chapters cover Introduction to inverse problems in electron microscopy, Directional sinogram inpainting for limited angle tomography, Strain tomography of crystals, FISTA with adaptive discretization, Total variation discretization, and Reconstruction with a Gaussian Dictionary.
- Provides the authority and expertise of leading contributors from an international board of authors
- Presents the latest release in the Advances in Imaging and Electron Physics series
Physicists, electrical engineers, applied mathematicians in all branches of image processing and microscopy as well as electron physics in general
Introduction and Summary
Lord Broers
1. Early life
Lord Broers
2. Modification of an SEM/Ion beam system to improve the resolution and reliability of the SEM and remove oxygen ions from the ion beam
Lord Broers
3. Formation of cones and ridges on ion-etched surfaces
Lord Broers
4. Microfabrication in an SEM
Lord Broers
5. High Resolution Short Focal Length Lens Electron Probe
Lord Broers
6. Low-Loss Surface Microscopy in short focal length Probe
Lord Broers
7. Microfabrication in the 5Å electron probe
Lord Broers
8. Nanodevices fabricated in the HR Probe
Lord Broers
9. Fabrication of Structures with Dimensions Below 10 nm
Lord Broers
10. Semiconductor Lithography and Processing
Lord Broers
11. Nanolithography at 400kV
Lord Broers
12. Last twenty years and future of semiconductor chips
Lord Broers
Lord Broers
1. Early life
Lord Broers
2. Modification of an SEM/Ion beam system to improve the resolution and reliability of the SEM and remove oxygen ions from the ion beam
Lord Broers
3. Formation of cones and ridges on ion-etched surfaces
Lord Broers
4. Microfabrication in an SEM
Lord Broers
5. High Resolution Short Focal Length Lens Electron Probe
Lord Broers
6. Low-Loss Surface Microscopy in short focal length Probe
Lord Broers
7. Microfabrication in the 5Å electron probe
Lord Broers
8. Nanodevices fabricated in the HR Probe
Lord Broers
9. Fabrication of Structures with Dimensions Below 10 nm
Lord Broers
10. Semiconductor Lithography and Processing
Lord Broers
11. Nanolithography at 400kV
Lord Broers
12. Last twenty years and future of semiconductor chips
Lord Broers
- No. of pages: 406
- Language: English
- Edition: 1
- Volume: 231
- Published: October 25, 2024
- Imprint: Academic Press
- Hardback ISBN: 9780443314629
- eBook ISBN: 9780443314636
PH
Peter W. Hawkes
Peter Hawkes obtained his M.A. and Ph.D (and later, Sc.D.) from the University of Cambridge, where he subsequently held Fellowships of Peterhouse and of Churchill College. From 1959 – 1975, he worked in the electron microscope section of the Cavendish Laboratory in Cambridge, after which he joined the CNRS Laboratory of Electron Optics in Toulouse, of which he was Director in 1987. He was Founder-President of the European Microscopy Society and is a Fellow of the Microscopy and Optical Societies of America. He is a member of the editorial boards of several microscopy journals and serial editor of Advances in Electron Optics.
Affiliations and expertise
Founder-President of the European Microscopy Society and Fellow, Microscopy and Optical Societies of America; member of the editorial boards of several microscopy journals and Serial Editor, Advances in Electron Optics, FranceMH
Martin Hÿtch
Dr Martin Hÿtch, serial editor for the book series “Advances in Imaging and Electron Physics (AIEP)”, is a senior scientist at the French National Centre for Research (CNRS) in Toulouse. He moved to France after receiving his PhD from the University of Cambridge in 1991 on “Quantitative high-resolution transmission electron microscopy (HRTEM)”, joining the CNRS in Paris as permanent staff member in 1995. His research focuses on the development of quantitative electron microscopy techniques for materials science applications. He is notably the inventor of Geometric Phase Analysis (GPA) and Dark-Field Electron Holography (DFEH), two techniques for the measurement of strain at the nanoscale. Since moving to the CEMES-CNRS in Toulouse in 2004, he has been working on aberration-corrected HRTEM and electron holography for the study of electronic devices, nanocrystals and ferroelectrics. He was laureate of the prestigious European Microscopy Award for Physical Sciences of the European Microscopy Society in 2008. To date he has published 130 papers in international journals, filed 6 patents and has given over 70 invited talks at international conferences and workshops.
Affiliations and expertise
Senior Scientist, French National Centre for Research (CNRS), Toulouse, FranceRead Nanolithography and Surface Microscopy with Electron Beams on ScienceDirect