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Books in Physical sciences and engineering

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    • VLSI and Computer Architecture

      • 1st Edition
      • Volume 20
      • Ravi Shankar + 1 more
      • Norman G. Einspruch
      • English
      VLSI Electronics Microstructure Science, Volume 20: VLSI and Computer Architecture reviews the approaches in design principles and techniques and the architecture for computer systems implemented in VLSI. This volume is divided into two parts. The first section is concerned with system design. Chapters under this section focus on the discussion of such topics as the evolution of VLSI; system performance and processor design considerations; and VLSI system design and processing tools. Part II of the book focuses on the architectural possibilities that have become cost effective with the development of VLSI circuits. Topics on architectural requirements and various architectures such as the Reduced Instruction Set, Extended Von Neumann, Language-Oriented, and Microprogrammable architectures are elaborated in detail. Also included are chapters that discuss the evaluation of architecture, multiprocessing configurations, and the future of VLSI. Computer designers, those evaluating computer systems, researchers, and students of computer architecture will find the book very useful.

    • VLSI Metallization

      • 1st Edition
      • Volume 15
      • Norman G. Einspruch + 2 more
      • English
      VLSI Electronics Microstructure Science, Volume 15: VLSI Metallization discusses the various issues and problems related to VLSI metallization. It details the available solutions and presents emerging trends. This volume is comprised of 10 chapters. The two introductory chapters, Chapter 1 and 2 serve as general references for the electrical and metallurgical properties of thin conducting films. Subsequent chapters review the various aspects of VLSI metallization. The order of presentation has been chosen to follow the common processing sequence. In Chapter 3, some relevant metal deposition techniques are discussed. Chapter 4 presents the methods of VLSI lithography and etching. Conducting films are first deposited at the gate definition step; therefore, the issues related to gate metallization are discussed next in Chapter 5.In Chapter 6, contact metallization is elaborated, and Chapter 7 is devoted to multilevel metallization schemes. Long-time reliability is the subject of Chapter 8, which discusses the issues of contact and interconnect electromigration. GaAs metallization is tackled in Chapter 9. The volume concludes with a general discussion of the functions of interconnect systems in VLSI. Materials scientists, processing and design engineers, and device physicists will find the book very useful.

    • Annual Reports on Fermentation Processes

      • 1st Edition
      • Volume 6
      • George T. Tsao
      • English
      Annual Reports on Fermentation Processes, Volume 6 focuses on the significant developments in fermentation processes. This book discusses the application of immobilized living microbial cells, aerobic high-rate process for concentrated wastes, and large-scale cell culture technology. The gas-liquid mass transfer fermentation step, aeration devices, relative motion of cells and medium, and enzymes of industrial interest are also elaborated. This text likewise covers the microbial sensors for waste waters control, ventures in yeast utilization, and advances in D-xylose conversion by yeasts. Other topics include the effect of high energy radiation on lignocellulose, interaction between the solid substrate and the enzyme, and control and operation of fed-batch processes. This volume is valuable to students and researchers aiming to acquire knowledge of fermentation research and developments.

    • Advances in Space Science and Technology

      • 1st Edition
      • Volume 10
      • Frederick I. Ordway
      • English
      Advances in Space Science and Technology, Volume 10 provides information pertinent to the developments in space science and technology. This book discusses the logistic and shelter construction, environment, and transportation aspects of Antarctic and lunar exploration. Organized into five chapters, this volume begins with an overview of the comparison of the lunar exploration program with the exploration of Antarctica. This text then explores the surface geology of the planet Mars wherein the study emphasizes that water erosion transport does not exist, that an oxidizing atmosphere is absent, and that wind erosion must be minimal. Other chapters consider the problems associated with navigation aboard spaceships traveling between the stars. This book discusses as well the inadequacy of space communication systems as a means of providing an instantaneous and uninterrupted service. The final chapter deals with predictions about the utility of space flight. This book is a valuable resource for readers who are interested in space science and technology.

    • Advances in Cell Culture

      • 1st Edition
      • Volume 6
      • Karl Maramorosch + 1 more
      • English
      Advances in Cell Culture, Volume 6 is a compilation of research papers in the field of cell culture. The contributions reflect the applications of cell culture to biotechnology, to the study of basic mechanisms of cellular behavior, and to the study of pathogens and diseases. This volume contains chapters that deal with the differentiation of human epidermal cells, cell injury, and regeneration in cell culture models; the description of the testing of anticancer compounds in cultured cells; and the interactions of cells and asbestos. Other contributions cover the production in plant tissue culture of the potent antimalarial drug, artemisinin; plant cell suspensions used for studying the mode of action of plant growth retardants; and the in vitro genetic manipulation of cereals and grasses. Also included is a biographical sketch of Nobel Laureate Renato Dulbecco, whose pioneering work on mammalian cell layers has had an enormous impact on cell culture and virology. Cell biologists and researchers who use in vitro techniques will find the book highly informative and insightful.

    • Geomorphological Fieldwork

      • 1st Edition
      • Volume 18
      • English
      Geomorphological Fieldwork addresses a topic that always remains popular within the geosciences and environmental science. More specifically, the volume conveys a growing legacy of field-based learning for young geomorphologists that can be used as a student book for field-based university courses and postgraduate research requiring fieldwork or field schools. The editors have much experience of field-based learning within geomorphology and extend this to physical geography. The topics covered are relevant to basic geomorphology as well as applied approaches in environmental and cultural geomorphology. The book integrates a physical-human approach to geography, but focuses on physical geography and geomorphology from an integrated field-based geoscience perspective.

    • Beam Processing Technologies

      • 1st Edition
      • Volume 21
      • Norman G. Einspruch + 2 more
      • English
      Beam Processing Technologies is a collection of papers that deals with the miniaturization of devices that will be faster, consume less power, and cost less per operation or fabrication. One paper discusses metal oxide semiconductor (MOS) integrated circuit technology including the operation of devices whose lateral and vertical dimensions are scaled down. If the devices' silicon doping profiles are increased by the same scale factor, they can operate on lower voltages and currents, with the same performance. Another paper describes laser beam processing and wafer-scale integration as techniques to increase the number of devices on a silicon chip. Electron beam technologies can be used in many fabrication processes such as in microlithography, selective oxidation, doping, metrology. Ion beam applications depend on the presence of the ion introduced into the device (e.g. implantation doping), on pseudoelastic collisions (e.g. physical sputtering or crystal damage), and on inelastic scattering (e.g. polymer resist exposure). Silicon molecular beam epitaxy (SiMBE) can also grow high-quality layers at low temperature, particularly concerning germanium, especially as reagrds the growth system design and utilization of n- and p-type doping. Chemical beam epitaxy (CBE) is another epitaxial growth technique that can surpass MBE and metal organic chemical vapor deposition (MO-CVD). The collection is suitable chemical engineers, industrial physicists, and researchers whose work involve micro-fabrication and development of integrated circuits.

    • VLSI Electronics

      Microstructure Science
      • 1st Edition
      • Volume 5
      • Norman G. Einspruch
      • English
      VLSI Electronics: Microstructure Science, Volume 5 considers trends for the future of very large scale integration (VLSI) electronics and the scientific base that supports its development. This book discusses the automation for VLSI manufacture, silicon material properties for VLSI circuitry, and high-performance computer packaging and thin-film multichip module. The nanometer-scale fabrication techniques, high-density CCD memories, and solid-state infrared imaging are also elaborated. This text likewise covers the impact of microelectronics upon radar systems and quantum-mechanical limitations on device performance. This volume is a good source for scientists and engineers who wish to become familiar with VLSI electronics, device designers concerned with the fundamental character of and limitations to device performance, systems architects who will be charged with tying VLSI circuits together, and engineers conducting work on the utilization of VLSI circuits in specific areas of application.

    • VLSI Electronics Microstructure Science

      • 1st Edition
      • Volume 7
      • Norman G. Einspruch
      • English
      VLSI Electronics: Microstructure Science, Volume 7 presents a comprehensive exposition and assessment of the developments and trends in VLSI (Very Large Scale Integration) electronics. This treatise covers subjects that range from microscopic aspects of materials behavior and device performance to the comprehension of VLSI in systems applications. Each chapter is prepared by a recognized authority. The topics contained in this volume include a basic introduction to the application of superconductivity in high-speed digital systems; the expected impact of VLSI technology on the implementation of AI (artificial intelligence); the limits to improvement of silicon integrated circuits; and the various spontaneous noise sources in VLSI circuits and their effect on circuit operation. Scientists, engineers, researchers, device designers, and systems architects will find the book very useful.

    • Advances in Control Systems

      Theory and Applications
      • 1st Edition
      • Volume 4
      • C. T. Leondes
      • English
      Advances in Control Systems: Theory and Applications, Volume 4 provides information pertinent to the significant progress in the field of automatic control. This book presents several fundamental approaches to algorithms for the determination of optimum control inputs to a system. Organized into six chapters, this volume begins with an overview of presents the method of sequential optimization including examples of its application. This text then examines the powerful direct method of Liapunov function techniques to the subject of the stability of stochastic dynamical systems. Other chapters consider the aspect of optimum control of large-scale complex system, which is the most striking characteristic in the evolution of the practice of control systems theory. This book discusses as well the basic techniques for the modification of the control problem. The final chapter deals with the problem of convergence properties of the method of gradients. This book is a valuable resource for engineers.

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