Books in Structure and properties of surfaces interfaces and thin films

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Complex Wave Dynamics on Thin Films

• 1st Edition
• Volume 14
• March 14, 2002
• Hen-hong Chang + 1 more
• English
• eBook 978-0-08-052953-0

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Wave evolution on a falling film is a classical hydrodynamic instability whose rich wave dynamics have been carefully recorded in the last fifty years. Such waves are known to profoundly affect the mass and heat transfer of multi-phase industrial units.This book describes the collective effort of both authors and their students in constructing a comprehensive theory to describe the complex wave evolution from nearly harmonic waves at the inlet to complex spatio-temporal patterns involving solitary waves downstream. The mathematical theory represents a significant breakthrough from classical linear stability theories, which can only describe the inlet harmonic waves and also extends classical soliton theory for integrable systems to real solitrary wave dynamics with dissipation. One unique feature of falling-film solitary wave dynamics, which drives much of the spatio-temporal wave evolution, is the irreversible coalescence of such localized wave structures. It represents the first full description of a hydrodynamic instability from inception to developed chaos. This approach should prove useful for other complex hydrodynamic instabilities and would allow industrial engineers to better design their multi-phase apparati by exploiting the deciphered wave dynamics. This publication gives a comprehensive review of all experimental records and existing theories and significantly advances state of the art on the subject and are complimented by complex and attractive graphics from computational fluid mechanics.

Advances in Plasma-Grown Hydrogenated Films

• 1st Edition
• Volume 30
• November 28, 2001
• V. M. Agranovich + 1 more
• English
• eBook 978-0-08-054287-4

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Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical and their technological aspects. Starting with Volume 30, the title of the series, Thin Films, is being changed to Thin Films and Nanostructures. We feel that this new titlereflects more accurately the rapidly growing inclusion of research anddevelopment efforts on nanostructures, especially in relation to novel solid-state device formats

Materials Science of Thin Films

• 2nd Edition
• October 15, 2001
• Milton Ohring
• English
• Hardback 978-0-12-524975-1

  9 7 8 - 0 - 1 2 - 5 2 4 9 7 5 - 1
• eBook 978-0-08-049178-3

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This is the first book that can be considered a textbook on thin film science, complete with exercises at the end of each chapter. Ohring has contributed many highly regarded reference books to the AP list, including Reliability and Failure of Electronic Materials and the Engineering Science of Thin Films. The knowledge base is intended for science and engineering students in advanced undergraduate or first-year graduate level courses on thin films and scientists and engineers who are entering or require an overview of the field. Since 1992, when the book was first published, the field of thin films has expanded tremendously, especially with regard to technological applications. The second edition will bring the book up-to-date with regard to these advances. Most chapters have been greatly updated, and several new chapters have been added.

Frontiers of Thin Film Technology

• 1st Edition
• Volume 28
• November 7, 2000
• Maurice H. Francombe + 2 more
• English
• eBook 978-0-08-054294-2

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Frontiers of Thin Film Technology, Volume 28 focuses on recent developments in those technologies that are critical to the successful growth, fabrication, and characterization of newly emerging solid-state thin film device architectures. Volume 28 is a condensed sampler of the Handbook for use by professional scientists, engineers, and students involved in the materials, design, fabrication, diagnostics, and measurement aspects of these important new devices.

Thinning Films and Tribological Interfaces

• 1st Edition
• Volume 38
• September 1, 2000
• D. Dowson + 9 more
• English
• Hardback 978-0-444-50531-6

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• eBook 978-0-08-054297-3

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This collection of fully peer-reviewed papers were presented at the 26th Leeds-Lyon Tribology Symposium which was held in Leeds, UK, 14-17 September, 1999. The Leeds-Lyon Symposia on Tribology were launched in 1974, and the large number of references to original work published in the Proceedings over many years confirms the quality of the published papers. It also indicates that the volumes have served their purpose and become a recognised feature of the tribological literature. This year's title is 'Thinning Films and Tribological Interfaces', and the papers cover practical applications of tribological solutions in a wide range of situations. The evolution of a full peer review process has been evident for a number of years. An important feature of the Leeds-Lyon Symposia is the presentation of current research findings. This remains an essential feature of the meetings, but for the 26th Symposium authors were invited to submit their papers for review a few weeks in advance of the Symposium. This provided an opportunity to discuss recommendations for modifications with the authors.

Electronic Structure

• 1st Edition
• Volume 2
• July 19, 2000
• K. Horn + 1 more
• English
• Hardback 978-0-444-89291-1

  9 7 8 - 0 - 4 4 4 - 8 9 2 9 1 - 1
• eBook 978-0-08-053075-8

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This book is the second volume in the Handbook of Surface Science series and deals with aspects of the electronic structure of surfaces as investigated by means of the experimental and theoretical methods of physics. The importance of understanding surface phenomena stems from the fact that for many physical and chemical phenomena, the surface plays a key role: in electronic, magnetic, and optical devices, in heterogenous catalysis, in epitaxial growth, and the application of protective coatings, for example. Therefore a better understanding and, ultimately, a predictive description of surface and interface properties is vital for the progress of modern technology. An investigation of surface electronic structure is also central to our understanding of all aspects of surfaces from a fundamental point of view. The chapters presented here review the goals achieved in the field and map out the challenges ahead, both in experiment and theory.

Ionized Physical Vapor Deposition

• 1st Edition
• Volume 27
• October 14, 1999
• Ronald Powell + 1 more
• English
• eBook 978-0-08-054293-5

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This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and memory chips. For the first time, the most recent developments in thin film deposition using ionized physical vapor deposition (I-PVD) are presented in a single coherent source. Readers will find detailed descriptions of relevant plasma source technology, specific deposition systems, and process recipes. The tools and processes covered include DC hollow cathode magnetrons, RF inductively coupled plasmas, and microwave plasmas that are used for depositing technologically important materials such as copper, tantalum, titanium, TiN, and aluminum. In addition, this volume describes the important physical processes that occur in I-PVD in a simple and concise way. The physical descriptions are followed by experimentally-verified numerical models that provide in-depth insight into the design and operation I-PVD tools. Practicing process engineers, research and development scientists, and students will find that this book's integration of tool design, process development, and fundamental physical models make it an indispensable reference.Key Features:The first comprehensive volume on ionized physical vapor depositionCombines tool design, process development, and fundamental physical understanding to form a complete picture of I-PVDEmphasizes practical applications in the area of IC fabrication and interconnect technologyServes as a guide to select the most appropriate technology for any deposition application

Thin Film Materials for Large Area Electronics

• 1st Edition
• Volume 80
• March 17, 1999
• B. Equer + 3 more
• English
• Hardback 978-0-08-043607-4

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The symposium brought together more than a hundred attendees from many countries including a significant participation from Japan and other East-Asia countries. Many of the trends observed in the 1st Symposium held in 1996 were confirmed: displays are indeed the main application in LAE (photovoltaics were not included in the topics of this symposium) and active matrix display (AMLCD) is still the leading technology. Future AMLCDs integrating the display drivers onto the same substrate require much faster thin-film transistors (TFTs) than those used for LCD addressing, therefore putting a strong demand on polysilicon performances. As a consequence the quest for an improved low temperature, large area (and low cost) polysilicon process is intensive and the competitors, including direct plasma deposition and excimer laser crystallization of amorphous layers, are reporting significant steps forward. With the tremendous demand for efficient colour flat panel displays, other display technologies are gaining interest. Field emission display (FED) is one of them. FEDs based on amorphous tetrahedral carbon thin-films are stimulating intensive studies on the optoelectronic properties of this complex material.Large area pixellized sensors for x-ray radiography and document scanning is another field of application in LAE which has recently reached initial production. Using a TFT or diode pixel addressing similar to AMLCD, this kind of device benefits from most of the AMLCD technology. However these devices present an increased complexity and stringent specifications on noise which in turn means materials with improved electronic transport properties. Finally, LAE is a fast developing area in thin-film research and technology. Initially an all-silicon domain, it now involves a large range of thin-film semiconductors and dielectrics, whose properties need to be fully understood and for which flexible and efficient processes have still to be developed.

Materials Science and Engineering Serving Society

• 1st Edition
• December 23, 1998
• R.P.H. Chang + 3 more
• English
• eBook 978-0-08-053587-6

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This symposium was organised with the aim of encouraging collaboration in international science and engineering communities for the benefit of human kind. It consisted of invited talks by experts on materials and poster presentation papers. Approximately 140 scientists participated and the resulting proceedings present an up-to-date review of the research in this area.

PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing

• 1st Edition
• Volume 26
• October 23, 1998
• Stephen M. Rossnagel + 2 more
• English
• Hardback 978-0-12-533026-8

  9 7 8 - 0 - 1 2 - 5 3 3 0 2 6 - 8
• eBook 978-0-08-054292-8

  9 7 8 - 0 - 0 8 - 0 5 4 2 9 2 - 8

Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems.In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts.