Skip to main content

Frontiers of Thin Film Technology

  • 1st Edition, Volume 28 - November 7, 2000
  • Latest edition
  • Editors: Maurice H. Francombe, Stephen M. Rossnagel, Abraham Ulman
  • Language: English

Frontiers of Thin Film Technology, Volume 28 focuses on recent developments in those technologies that are critical to the successful growth, fabrication, and charac… Read more

Purchase options

Sorry, this title is not available for purchase in your country/region.

Description

Frontiers of Thin Film Technology, Volume 28 focuses on recent developments in those technologies that are critical to the successful growth, fabrication, and characterization of newly emerging solid-state thin film device architectures.

Volume 28 is a condensed sampler of the Handbook for use by professional scientists, engineers, and students involved in the materials, design, fabrication, diagnostics, and measurement aspects of these important new devices.

Readership

Thin film and surface science researchers in chemistry, materials science, electrical engineering, biology, and condensed matter physics.

Product details

  • Edition: 1
  • Latest edition
  • Volume: 28
  • Published: November 7, 2000
  • Language: English

About the editors

Maurice H. Francombe

Serial Volume Editor
Affiliations and expertise
Georgia State University, Atlanta, U.S.A.

Stephen M. Rossnagel

Serial Editor
Affiliations and expertise
IBM Corporation, T.J. Watson Research Center, Yorktown Heights, New York, U.S.A.

Abraham Ulman

Serial Editor
Affiliations and expertise
Polytechnic University, Brooklyn, New York, U.S.A.

View book on ScienceDirect

Read Frontiers of Thin Film Technology on ScienceDirect