Photodetectors: Materials, Devices and Applications discusses the devices that convert light to electrical signals, key components in communication, computation, and imaging systems. In recent years, there has been significant improvement in photodetector performance, and this important book reviews some of the key advances in the field. Part one covers materials, detector types, and devices, and includes discussion of silicon photonics, detectors based on reduced dimensional charge systems, carbon nanotubes, graphene, nanowires, low-temperature grown gallium arsenide, plasmonic, Si photomultiplier tubes, and organic photodetectors, while part two focuses on important applications of photodetectors, including microwave photonics, communications, high-speed single photon detection, THz detection, resonant cavity enhanced photodetection, photo-capacitors and imaging.
Working at the nano-scale demands an understanding of the high-precision measurement techniques that make nanotechnology and advanced manufacturing possible. Richard Leach introduces these techniques to a broad audience of engineers and scientists involved in nanotechnology and manufacturing applications and research. He also provides a routemap and toolkit for metrologists engaging with the rigor of measurement and data analysis at the nano-scale. Starting from the fundamentals of precision measurement, the author progresses into different measurement and characterization techniques. The focus on nanometrology in engineering contexts makes this book an essential guide for the emerging nanomanufacturing / nanofabrication sector, where measurement and standardization requirements are paramount both in product specification and quality assurance. This book provides engineers and scientists with the methods and understanding needed to design and produce high-performance, long-lived products while ensuring that compliance and public health requirements are met. Updated to cover new and emerging technologies, and recent developments in standards and regulatory frameworks, this second edition includes many new sections, e.g. new technologies in scanning probe and e-beam microscopy, recent developments in interferometry and advances in co-ordinate metrology.
The Handbook of Ellipsometry is a critical foundation text on an increasingly critical subject. Ellipsometry, a measurement technique based on phase and amplitude changes in polarized light, is becoming popular in a widening array of applications because of increasing miniaturization of integrated circuits and breakthroughs in knowledge of biological macromolecules deriving from DNA and protein surface research. Ellipsometry does not contact or damage samples, and is an ideal measurement technique for determining optical and physical properties of materials at the nano scale. With the acceleration of new instruments and applications now occurring, this book provides an essential foundation for the current science and technology of ellipsometry for scientists and engineers in industry and academia at the forefront of nanotechnology developments in instrumentation, integrated circuits, biotechnology, and pharmaceuticals. Divided into four parts, this comprehensive handbook covers the theory of ellipsometry, instrumentation, applications, and emerging areas. Experts in the field contributed to its twelve chapters, covering various aspects of ellipsometry.
The importance of surface metrology has long been acknowledged in manufacturing and mechanical engineering, but has now gained growing recognition in an expanding number of new applications in fields such as semiconductors, electronics and optics. Metrology is the scientific study of measurement, and surface metrology is the study of the measurement of rough surfaces. In this book, Professor David Whitehouse, an internationally acknowledged subject expert, covers the wide range of theory and practice, including the use of new methods of instrumentation.
This volume, from an international authority on the subject, deals with the physical and instrumentation aspects of measurement science, the availability of major measurement tools, and how to use them. This book not only lays out basic concepts of electronic measurement systems, but also provides numerous examples and exercises for the student.
This publication deals with the latest developments in the field of 3D surface metrology and will become a seminal text in this important area. It has been prepared with the support of the European Community’s Directorate General XII and represents the culmination of research conducted by 11 international partners as part of an EU-funded project. The aim of the project is to inform standards bodies of the possibilities that exist for a new international standard covering the field of 3D surface characterisation.The book covers a description of the proposed 3D surface parameters and advanced filtering techniques using wavelet and robust Gaussian methodologies. The next generation areal surface characterisation theories are discussed and their practical implementation is illustrated. It describes techniques for calibration of 3D instrumentation, including stylus instruments as well as scanning probe instrumentation. Practical verification of the 3D parameters and the filtering is illustrated through a series of case studies which cover bio-implant surfaces, automotive cylinder liner and steel sheet. Finally, future developments of the subject are alluded to and implications for future standardisation and development are discussed.
The importance of surface metrology has long been acknowledged in manufacturing and mechanical engineering, but has now gained growing recognition in an expanding number of new applications in fields such as semiconductors, electronics and optics. Metrology is the scientific study of measurement, and surface metrology is the study of the measurement of rough surfaces. In this book, Professor David Whitehouse, an internationally acknowledged subject expert, covers the wide range of theory and practice, including the use of new methods of instrumentation.
This fully illustrated text explains the basic measurement techniques, describes the commercially available instruments and provides an overview of the current perception of 3-D topography analysis in the academic world and industry, and the commonly used 3-D parameters and plots for the characterizing and visualizing 3-D surface topography. It also includes new sections providing full treatment of surface characterization, filtering technology and engineered surfaces, as well as a fully updated bibliography.