Books in Structure and properties of surfaces interfaces and thin films

21-30 of 65 results in All results

Photonic Probes of Surfaces

• 1st Edition
• November 11, 2012
• P. Halevi
• English
• eBook 978-0-444-59934-6

  9 7 8 - 0 - 4 4 4 - 5 9 9 3 4 - 6

This volume is devoted principally to optical spectroscopies of material surfaces and also encompasses scattering techniques and theoretical response analysis as well as spectroscopies. In addition to solid surfaces some attention is also devoted to interfaces between two solids, between a solid and a liquid and to a liquid-vapor interface. These surfaces may be clean and perfect, in which case the purpose of the spectroscopical method at hand is to determine the deviation of the atomic structure in the surface region from that in the bulk, namely the surface reconstruction. Otherwise the surface may be imperfect due to roughness, strain or overlayers, in which case the spectroscopy can yield information on the nature of such imperfections, including the monitoring of growth processes. One of the foremost purposes of surface spectroscopies is to extract information on atomic and molecular adsorbates on solid surfaces. Most of the 10 chapters are concerned with photonic sources of excitation, the respective spectral regions ranging from the far infrared to X-rays.In conclusion this book provides a state-of-the-art review of all major types of photonic probes of surfaces and interfaces and deals with both applications and experiment and theory.

Handbook of Thin Film Deposition

• 3rd Edition
• June 27, 2012
• Krishna Seshan
• English
• Hardback 978-1-4377-7873-1

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• eBook 978-1-4377-7874-8

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The Handbook of Thin Film Deposition is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, new materials for memory applications and methods for thin film optical processes.  In a major restructuring, this edition of the handbook lays the foundations with an up-to-date treatment of lithography, contamination and yield management, and reliability of thin films. The established physical and chemical deposition processes and technologies are then covered, the last section of the book being devoted to more recent technological developments such as microelectromechanical systems, photovoltaic applications, digital cameras, CCD arrays, and optical thin films.

Thin Film Growth

• 1st Edition
• July 18, 2011
• Zexian Cao
• English
• Paperback 978-0-08-101722-7

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• eBook 978-0-85709-329-5

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Thin film technology is used in many applications such as microelectronics, optics, hard and corrosion resistant coatings and micromechanics, and thin films form a uniquely versatile material base for the development of novel technologies within these industries. Thin film growth provides an important and up-to-date review of the theory and deposition techniques used in the formation of thin films.Part one focuses on the theory of thin film growth, with chapters covering nucleation and growth processes in thin films, phase-field modelling of thin film growth and surface roughness evolution. Part two covers some of the techniques used for thin film growth, including oblique angle deposition, reactive magnetron sputtering and epitaxial growth of graphene films on single crystal metal surfaces. This section also includes chapters on the properties of thin films, covering topics such as substrate plasticity and buckling of thin films, polarity control, nanostructure growth dynamics and network behaviour in thin films.With its distinguished editor and international team of contributors, Thin film growth is an essential reference for engineers in electronics, energy materials and mechanical engineering, as well as those with an academic research interest in the topic.

Physico-Chemical Phenomena in Thin Films and at Solid Surfaces

• 1st Edition
• Volume 34
• June 7, 2007
• Leonid I. Trakhtenberg + 2 more
• English
• eBook 978-0-08-048001-5

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The book is devoted to the consideration of the different processes taking place in thin films and at surfaces. Since the most important physico-chemical phenomena in such media are accompanied by the rearrangement of an intra- and intermolecular coordinates and consequently a surrounding molecular ensemble, the theory of radiationless multi-vibrational transitions is used for its description. The second part of the book considers the numerous surface phenomena. And in the third part is described the preparation methods and characteristics of different types of thin films. Both experimental and theoretical descriptions are represented. Media rearrangement coupled with the reagent transformation largely determines the absolute value and temperature dependence of the rate constants and other characteristics of the considered processes. These effects are described at the atomic or molecular level based on the multi-phonon theory, starting from the first pioneering studies through to contemporary studies.A number of questions are included at the end of many chapters to further reinforce the material presented.

Thin Film Micro-Optics

• 1st Edition
• February 19, 2007
• Ruediger Grunwald
• English
• Hardback 978-0-444-51746-3

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• eBook 978-0-08-047125-9

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"Thin-film microoptics" stands for novel types of microoptical components and systems which combine the well-known features of miniaturized optical elements with the specific advantages of thin optical layers. This approach enables for innovative solutions in shaping light fields in spatial, temporal and spectral domain. Low-dispersion and small-angle systems for tailoring and diagnosing laser pulses under extreme conditions as well as VUV-capable microoptics can be realized. Continuous-relief microstructures of refractive, reflective and hybrid characteristics are obtained by vapor deposition technologies with shadow masks in rotating systems. The book gives a comprehensive overview on fundamental laws of microoptics, types of thin-film microoptical components, methods and constraints of their design, fabrication and characterization, structure transfer into substrates, optical functions and applications. Recent theoretical and experimental results of basic and applied research are addressed. Particular emphasis will be laid on the generation of localized, nondiffracting few-cycle wavepackets of extended depth of focus and high tolerance against distortions. It is shown that the spectral interference of ultrabroadband conical beams results in spatio-temporal structures of characteristic X-shape, so-called X-waves, which are interesting for robust optical communication. New prospects are opened by exploiting small conical angles from nanolayer microoptics and self-apodized truncation of Bessel beams leading to the formation of single-maximum nondiffracting beams or "needle beams". Thin-film microoptical beam shapers have an enormous potential for future applications like the two-dimensional ultrafast optical processing, multichannel laser-matter interaction, nonlinear spectroscopy or advanced measuring techniques.

Waveguide Spectroscopy of Thin Films

• 1st Edition
• Volume 33
• December 19, 2005
• Alexander Vasil'evich Khomchenko
• English
• eBook 978-0-08-045789-5

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In Waveguide Spectroscopy of Thin Films new methods of study of the linear and nonlinear optical properties of thin films are presented. These techniques are based on the principles of the spatial Fourier spectroscopy of the light beam reflected from a prism-coupling device with the tunnel excitation of guided lightmodes in thin-film structures. Measurement techniques of determination of the absorption coefficient, refractive index and thickness of the dielectric, semiconductor or metallic films are considered. This book is highly recommended for specialists in the fields of integrated and thin film optics and for graduated students in related specialties.

Handbook of Ellipsometry

• 1st Edition
• January 6, 2005
• Harland Tompkins + 1 more
• Harland Tompkins + 1 more
• English
• eBook 978-0-8155-1747-4

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The Handbook of Ellipsometry is a critical foundation text on an increasingly critical subject. Ellipsometry, a measurement technique based on phase and amplitude changes in polarized light, is becoming popular in a widening array of applications because of increasing miniaturization of integrated circuits and breakthroughs in knowledge of biological macromolecules deriving from DNA and protein surface research. Ellipsometry does not contact or damage samples, and is an ideal measurement technique for determining optical and physical properties of materials at the nano scale. With the acceleration of new instruments and applications now occurring, this book provides an essential foundation for the current science and technology of ellipsometry for scientists and engineers in industry and academia at the forefront of nanotechnology developments in instrumentation, integrated circuits, biotechnology, and pharmaceuticals. Divided into four parts, this comprehensive handbook covers the theory of ellipsometry, instrumentation, applications, and emerging areas. Experts in the field contributed to its twelve chapters, covering various aspects of ellipsometry.

Thin Film Materials Technology

• 1st Edition
• May 10, 2004
• Kiyotaka Wasa + 2 more
• English
• eBook 978-0-8155-1931-7

  9 7 8 - 0 - 8 1 5 5 - 1 9 3 1 - 7

An invaluable resource for industrial science and engineering newcomers to sputter deposition technology in thin film production applications, this book is rich in coverage of both historical developments and the newest experimental and technological information about ceramic thin films, a key technology for nano-materials in high-speed information applications and large-area functional coating such as automotive or decorative painting of plastic parts, among other topics. In seven concise chapters, the book thoroughly reviews basic thin film technology and deposition processes, sputtering processes, structural control of compound thin films, and microfabrication by sputtering.

Thin-Film Diamond I

• 1st Edition
• Volume 76
• December 12, 2003
• Christopher Nebel + 1 more
• English
• eBook 978-0-08-054103-7

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This volume reviews the state of the art of thin film diamond, a very promising new semiconductor that may one day rival silicon as the material of choice for electronics. Diamond has the following important characteristics; it is resistant to radiation damage, chemically inert and biocompatible and it will become "the material" for bio-electronics, in-vivo applications, radiation detectors and high-frequency devices. Thin-Film Diamond is the first book to summarize state of the art of CVD diamond in depth. It covers the most recent results regarding growth and structural properties, doping and defect characterization, hydrogen in and on diamond as well as surface properties in general, applications of diamond in electrochemistry, as detectors, and in surface acoustic wave devices.

Photoreactive Organic Thin Films

• 1st Edition
• October 23, 2002
• Zouheir Sekkat + 1 more
• English
• Hardback 978-0-12-635490-4

  9 7 8 - 0 - 1 2 - 6 3 5 4 9 0 - 4
• eBook 978-0-08-047997-2

  9 7 8 - 0 - 0 8 - 0 4 7 9 9 7 - 2

Wolfgang Knoll is a former Directory of Polymer research at the Max Planck Institute. He is extremely well know for his research in this area. Zouheir Sekkat was a Postdoctoral researcher at Max Planck working under Professor Knoll. With Knoll's involvement, we can be confident that the best people in this field will be contributing to the reference.