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Books in Physics of beams

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Topics in Soliton Theory

  • 1st Edition
  • Volume 167
  • November 26, 1991
  • R.W. Carroll
  • English
  • eBook
    9 7 8 - 0 - 0 8 - 0 8 7 2 7 8 - 0
When soliton theory, based on water waves, plasmas, fiber optics etc., was developing in the 1960-1970 era it seemed that perhaps KdV (and a few other equations) were really rather special in the set of all interesting partial differential equations. As it turns out, although integrable systems are still special, the mathematical interaction of integrable systems theory with virtually all branches of mathematics (and with many currently developing areas of theoretical physics) illustrates the importance of this area. This book concentrates on developing the theme of the tau function. KdV and KP equations are treated extensively, with material on NLS and AKNS systems, and in following the tau function theme one is led to conformal field theory, strings, and other topics in physics. The extensive list of references contains about 1000 entries.

Beam Processing and Laser Chemistry

  • 1st Edition
  • Volume 12
  • February 1, 1990
  • I.W. Boyd + 1 more
  • English
  • eBook
    9 7 8 - 0 - 4 4 4 - 5 9 6 6 5 - 9
This volume discusses both the practical and theoretical aspects of energy beam materials processing. It highlights the recent advances in the use of beams and incoherent light sources to enhance or modify chemical processes at solid surfaces. Special attention is given to the latest developments in the use of ion, electron and photon beams, and on laser-assisted process chemistry. Thin film and surface and interface reactions as well as bulk phase transformations are discussed. Practical technological details and the criteria for present and future applications are also reviewed. The papers collected in this volume reflect the continuing strong interest and variety of development in this field. A selection of contents: Deposition. Photo-assisted MOVPE growth of calcium fluoride (K.J. Mackey et al.). XPS characterization of chromium films deposited from Cr(CO)6 at 248 nm (R. Nowak et al.). The chemistry of alkyl - aluminum compounds during laser-assisted chemical vapor deposition (G.S. Higashi). Influence of dilution in nitrogen on the photodissociation processes of silane and disilane at 193 nm. (E. Boch et al.). Growth processes of epitaxial metal films on semiconductor and insulator substrates by ionized cluster beam (I. Yamada). Kinetics and mechanisms of CW laser induced deposition of metals for microelectronics (G. Auvert). Damage Mechanisms. Modelling of lattice damage accumulation during high energy ion implantation (N. Hecking, E.H. te Kaat). Defects created by 3.5 GeV xenon ions in silicon (P. Mary et al.). Mixing, Crystallisation and Synthesis. Material transformations in semiconductor and magnetic thin films (E.E. Marinero). Explosive crystallization of amorphous silicon: triggering and propagation (W.C. Sinke et al.). Structural changes in AuxSi1-x alloy films under laser irradiation (J. Marfaing et al.). Ion-assisted recrystallization of amorphous silicon (F. Priola et al.). Ion beam synthesis of buried compound layers: accomplishments and perspectives (A. Golanski). Epitaxial lateral overgrowth of amorphous CVD silicon films induced by ion irradiation (M. Voelskow et al.). Wear resistant coatings produced by C+ implantation (C. Neelmeijer et al.). Laser surface alloying of Ni film on A1-based alloy (E. Gaffet et al.). Dielectrics. Photoenhanced CVD of hydrogenated amorphous silicon using an internal hydrogen discharge lamp (W.I. Milne et al.). Laser assisted synthesis of ultrafine silicon powder (R. Fantoni et al.). Doping. Excimer laser induced melting of heavily doped silicon: a contribution to the optimization of the laser doping process (E. Fogarassy et al.). In-situ doping of silicon using the gas immersion laser doping (GILD) process (P.G. Carey et al.). Laser solid-phase doping of semiconductors (A.M. Prokhorov et al.). Ablation. Photoablation of polyimide with IR and UV laser radiation (R. Braun et al.). Resputtering of low-energy implanted inert gases: an angle-resolved time-of-flight study (J. van Zwol et al.). Deposition of Y-Ba-Cu oxide superconducting thin films by Nd:YAG laser evaporation (W. Marine et al.). Cluster ion formation by laser evaporation of solid complex oxides (A. Mele et al.). Geometric optimisation for the deposition of high temperature superconductors (M. Brown et al.). Nucleation and growth of laser-plasma deposited thin films (S. Metev, K. Meteva). Etching. Time of flight study of low pressure laser etching of silicon by chlorine (J. Boulmer et al.). Nanosecond excimer laser-enhanced chemical etching (T.S. Baller, J. Dieleman). Laser patterned desorption within an upflow metalorganic chemical vapor deposition reactor (J.E. Epler et al.). Ion beam assisted etching of silicon with bromine. The role of the adsorbed state (G.C. Tyrrell et al.). Surface modification of low density polyethylene by N+, Ar+ ion implantation for space charge devices (S. Kuniyoshi et al.). Author index. Subject index.

Ion Beams for Materials Analysis

  • 1st Edition
  • November 28, 1989
  • R. Curtis Bird + 1 more
  • English
  • eBook
    9 7 8 - 0 - 0 8 - 0 9 1 6 8 9 - 7
The use of ion beams for materials analysis involves many different ion-atom interaction processes which previously have largely been considered in separate reviews and texts. A list of books and conference proceedings is given in Table 2. This book is divided into three parts, the first which treats all ion beam techniques and their applications in such diverse fields as materials science, thin film and semiconductor technology, surface science, geology, biology, medicine, environmental science, archaeology and so on.

Photon, Beam and Plasma Assisted Processing

  • 1st Edition
  • Volume 2
  • February 1, 1989
  • E.F. Krimmel + 1 more
  • English
  • eBook
    9 7 8 - 0 - 4 4 4 - 5 9 6 3 6 - 9
This symposium attracted 82 papers which were presented orally or as posters. Fourteen invited speakers presented state of the art reviews and aspects of future key topics in this increasingly important area of materials science. The high level of scientific presentation during the conference enhanced the aim of the symposium, which was to stimulate discussion amongst materials scientists, chemists, engineers and physicists with a common interest in this field and to disseminate knowledge of progress.

Problem Solving with Microbeam Analysis

  • 1st Edition
  • Volume 7
  • January 1, 1988
  • K. Kiss
  • English
  • eBook
    9 7 8 - 0 - 4 4 4 - 5 9 7 4 7 - 2
This book provides the reader with a working knowledge sufficient to select microbeam techniques for the efficient, cost-effective solution of complex problems arising in today's high-tech industries. Primarily written for the industrial analyst whose field of expertise is other than microbeam analysis, it will also be of help to engineers, plant chemists and industrial research scientists who often seek the aid of the microbeam analyst in their problem solving. Research and plant managers as well as administrators may also find this book helpful since they may be called upon to select and/or approve high-priced microbeam instruments.The book is organized into two parts. Part I gives a brief description of the various techniques and critically compares their capabilities and limitations. Part II consists of selected applications which show how the various techniques or their combinations are applied to characterize materials and to guide research in a wide variety of fields. The examples and case histories will undoubtedly aid the reader in problem solving, quality assurance and research-related tasks. Newcomers to the field will find enough information in the book to enable them to begin practical work and to apply the techniques.