Thin Films for Emerging Applications
- 1st Edition, Volume 16 - May 22, 1992
- Imprint: Academic Press
- Editors: John L. Vossen, Maurice H. Francombe
- Language: English
- eBook ISBN:9 7 8 - 1 - 4 8 3 2 - 8 8 9 1 - 8
Following in the long-standing tradition of excellence established by this serial, this volume provides a focused look at contemporary applications. High Tc superconducting thin… Read more
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Request a sales quoteFollowing in the long-standing tradition of excellence established by this serial, this volume provides a focused look at contemporary applications. High Tc superconducting thin films are discussed in terms of ion beam and sputtering deposition, vacuum evaporation, laser ablation, MOCVD, and other deposition processes in addition to their ultimate applications. Detailed treatment is also given to permanent magnet thin films, lateral diffusion and electromigration in metallic thin films, and fracture and cracking phenomena in thin films adhering to high-elongation substrates.
Researchers, students, and engineers concerned with electronic and optical devices, thin film applications, and novel new materials such as High Tc Superconductors.
N.G. Dhere, High Tc Superconducting Thin Films. K.V. Reddy, Lateral Diffusion and Electromigration in Metallic Thin Films. F.J. Cadieu, Permanent Magnet Thin Films. P.H. Wojciechowski and M.S. Mendolia, Fracture and Cracking Phenomena in Thin Films Adhering to High-Elongation Substrates. Each chapter includes references. Index.
- Edition: 1
- Volume: 16
- Published: May 22, 1992
- No. of pages (eBook): 367
- Imprint: Academic Press
- Language: English
- eBook ISBN: 9781483288918
JV
John L. Vossen
Affiliations and expertise
RCA Laboratories, Princeton, New JerseyMF
Maurice H. Francombe
Affiliations and expertise
Georgia State University, Atlanta, U.S.A.Read Thin Films for Emerging Applications on ScienceDirect