Thin Film Processes II
- 1st Edition - April 28, 1991
- Author: Werner Kern
- Editor: John L. Vossen
- Language: English
- Hardback ISBN:9 7 8 - 0 - 1 2 - 7 2 8 2 5 1 - 0
- eBook ISBN:9 7 8 - 0 - 0 8 - 0 5 2 4 2 1 - 4
This sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately… Read more
This sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to the literature. Though edited to stand alone, when taken together, Thin Film Processes II and its predecessor present a thorough grounding in modern thin film techniques.
- Provides an all-new sequel to the 1978 classic, Thin Film Processes
- Introduces new topics, and several key topics presented in the original volume are updated
- Emphasizes practical applications of major thin film deposition and etching processes
- Helps readers find the appropriate technology for a particular application
Engineers, technicians, and beginning graduate students in electrical engineering and materials science
J.L. Vossen and W. Kern, Introduction. S.M. Rossnagel, Glow Discharge Plasma and Sources for Etching and Deposition. C.V. Deshpandey and R.F. Bunshah, Evaporation Processes. P.P. Chow, Molecular Beam Epitaxy. R. Parsons, Sputter Deposition Processes. P.C. Johnson, The Cathodic Arc Plasma Deposition of Thin Films. K.F. Jensen and W. Kern, Thermal Chemical Vapor Deposition. K.F. Jensen and T. Kuech, Metal-Organic Chemical Vapor Deposition. J.G. Eden, Photochemical Vapor Deposition. L.C. Klein, Sol-Gel Coatings. R. Reif and W. Kern, Plasma-Enhanced Chemical Vapor Deposition. G. Lucovsky, D.V. Tsu, R.A. Rudder, and R.J. Markunas, Formation of Inorganic Films by Remote Plasma-Enhanced Chemical-Vapor Deposition. T.M. Mayer and S.D. Allen, Selected Area Processing. H.W. Lehman, Plasma-Assisted Etching. P.R. Puckett, S.L. Michel, and W.E. Hughes, Ion Beam Etching. C.I.H. Ashby, Laser-Driven Etching.
- Edition: 1
- Published: April 28, 1991
- Language: English
JV
John L. Vossen
Affiliations and expertise
RCA Laboratories, Princeton, New JerseyWK
Werner Kern
Affiliations and expertise
Lam Research, San Diego, CA, USARead Thin Film Processes II on ScienceDirect