
Silicon Integrated Circuits
Advances in Materials and Device Research
- 1st Edition - July 24, 1985
- Imprint: Academic Press
- Editor: Dawon Kahng
- Language: English
- Paperback ISBN:9 7 8 - 1 - 4 8 3 2 - 0 1 3 5 - 1
- eBook ISBN:9 7 8 - 1 - 4 8 3 2 - 1 4 7 8 - 8
Silicon Integrated Circuits, Part 2 covers some of the most promising approaches along with the new understanding of processing-related areas of physics and chemistry. The first… Read more

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Request a sales quoteSilicon Integrated Circuits, Part 2 covers some of the most promising approaches along with the new understanding of processing-related areas of physics and chemistry. The first chapter is about the transient thermal processing of silicon, including annealing with directed-energy beams and rapid isothermal annealing; adiabatic annealing with laser and electron beams; pulsed melting; thermal flux annealing; rapid isothermal annealing; and several applications stemming from rapid annealing and semiconductor processing with directed-energy beams. The second chapter is concerned with the use of electron cyclotron resonance plasmas in two important materials processing techniques: reactive ion-beam etching and plasma deposition. The last chapter of the book deals with the exploding area of very large scale integration processing and process simulation. Physicists, chemists, and engineers involved in silicon integrated circuits will find the book invaluable.
List of Contributors
Preface
Transient Thermal Processing of Silicon
I. Introduction
II. Adiabatic Annealing
III. Thermal Flux Annealing
IV. Isothermal Rapid Annealing
V. Related Rapid Thermal Processes
VI. Summary
References
Reactive Ion-Beam Etching and Plasma Deposition Techniques Using Electron Cyclotron Resonance Plasmas
I. Introduction
II. Reactive Ion-Beam Etching
III. Plasma Deposition
References
Physics of VLSI Processing and Process Simulation
I. Introduction
II. Physics of Processing and Process Simulation
III. Conclusions and the Future
References
Author Index
Subject Index
- Edition: 1
- Published: July 24, 1985
- No. of pages (eBook): 370
- Imprint: Academic Press
- Language: English
- Paperback ISBN: 9781483201351
- eBook ISBN: 9781483214788
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