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Elsevier

Principles of Vapor Deposition of Thin Films

  • 1st Edition - December 16, 2005
  • Latest edition
  • Author: Professor K.S. K.S Sree Harsha
  • Language: English

The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in… Read more

Description

The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology.Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible.

Key features

* Offers detailed derivation of important formulae.
* Thoroughly covers the basic principles of materials science that are important to any thin film preparation.
* Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.

Readership

Graduate students interested in entering electronics materials industry and other thin film device technology areas. Students in materials and electronic engineering. Professionals in the materials science industry.

Product details

  • Edition: 1
  • Latest edition
  • Published: January 17, 2006
  • Language: English

About the author

PS

Professor K.S. K.S Sree Harsha

Affiliations and expertise
Emeritus Professor of Materials Engineering, San Jose State University, San Jose.

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