
Preparation and Properties of Thin Films
Treatise on Materials Science and Technology, Vol. 24
- 1st Edition - December 28, 1982
- Imprint: Academic Press
- Editors: K. N. Tu, R. Rosenberg
- Language: English
- Paperback ISBN:9 7 8 - 1 - 4 8 3 2 - 0 4 8 6 - 4
- eBook ISBN:9 7 8 - 1 - 4 8 3 2 - 1 8 2 9 - 8
Treatise on Materials Science and Technology, Volume 24: Preparation and Properties of Thin Films covers the progress made in the preparation of thin films and the corresponding… Read more

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Request a sales quoteTreatise on Materials Science and Technology, Volume 24: Preparation and Properties of Thin Films covers the progress made in the preparation of thin films and the corresponding study of their properties. The book discusses the preparation and property correlations in thin film; the variation of microstructure of thin films; and the molecular beam epitaxy of superlattices in thin film. The text also describes the epitaxial growth of silicon structures (thermal-, laser-, and electron-beam-induced); the characterization of grain boundaries in bicrystalline thin films; and the mechanical properties of thin films on substrates. The ion beam modification of thin film; the use of thin alloy films for metallization in microelectronic devices; and the fabrication and physical properties of ultrasmall structures are also encompassed. Materials scientists and materials engineers will find the book invaluable.
Contributors
Preface
Part I. Introduction
1 Preparation and Property Correlations in Thin Films
Part II. Variation Of Microstructure Of Thin Films
2 Molecular Beam Epitaxy of Superlattices in Thin Films
I. Introduction
II. Molecular Beam Epitaxy
III. Structure of Semiconductor Superlattices
IV. Properties of Superlattice Structures
V. Concluding Remarks
References
3 Epitaxial Growth of Silicon Structures—Thermal, Laser-, and Electron-Beam-Induced
I. Introduction
II. Thermal and Laser-Induced Epitaxy: Implanted-Amorphous Silicon
III. Deposited Layers of Silicon on Silicon
IV. Epitaxial Suicides
V. Crystallization of Deposited Films
VI. Summary
References
4 Characterization of Grain Boundaries in Bicrystalline Thin Films
I. Introduction
II. Structure of Grain Boundaries
III. Properties of Grain Boundaries
IV. Preparation of Bicrystalline Thin Films
V. Characterization of Grain Boundary Structure
VI. Recent Experimental Results
VII. Summary
VIII. Perspective
References
5 Mechanical Properties of Thin Films on Substrates
I.Introduction
II.Biaxial Strain Model
III.Strain Relaxation Mechanisms
IV.Strain Relaxation by Dislocation Glide
V.Strain Relaxation by Diffusional Creep
VI.Strain at Grain Boundaries
VII.Strain and Stress at Film Edges
VIII.Microstructures Which Affect Mechanical Properties of Thin Films
IX.Application
References
Part III. Variation Of Composition Of Thin Films
6 Ion Beam Modification of Thin Films
I. Introduction
II. Range and Energy Deposition
III. Sputtering-Induced Compositional Changes
IV Implanted Metastable Phases
V. Ion-Beam-Induced Reactions of Metal Films
References
7 Thin Alloy Films for Metallization in Microelectronic Devices
I. Introduction
II. Metallurgical Degradation in Microelectronic Devices
III. Near-Equilibrium Multilayered Thin-Film Structure
IV Applications of Thin Alloy Films in Forming Shallow Suicide Contacts
V. Conclusion
References
Part Iv Variation Of Pattern Of Thin Films
8 Fabrication and Physical Properties of Ultrasmall Structures
I. Introduction
II. Fabrication
III. Physical Properties
IV. Summary
References
Index
- Edition: 1
- Published: December 28, 1982
- No. of pages (eBook): 350
- Imprint: Academic Press
- Language: English
- Paperback ISBN: 9781483204864
- eBook ISBN: 9781483218298
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