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Plasma Sources for Thin Film Deposition and Etching

1st Edition - August 18, 1994

Editors: Maurice H. Francombe, John L. Vossen

Hardback ISBN:
9 7 8 - 0 - 1 2 - 5 3 3 0 1 8 - 3
eBook ISBN:
9 7 8 - 0 - 0 8 - 0 9 2 5 1 3 - 4

This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron… Read more

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This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing plasma.