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This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclot… Read more
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Design of High- Density Plasma Sources for Materials Processing
M.A. Lieberman and R.A. Gottscho
Electron Cyclotron Resonance Plasma Sources and Their Use in Plasma-Assisted Chemical Vapor Deposition of Thin Films
O.A. Popov
Unbalanced Magnetron Sputtering
S.L. Rohde
The Formation of Particles in Thin-Film Processing Plasmas
Steinbruchel
MF
JV