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Nanolithography and Surface Microscopy with Electron Beams

1st Edition, Volume 230 - June 1, 2024

Editors: Peter W. Hawkes, Martin Hÿtch

Language: English
Hardback ISBN:
9 7 8 - 0 - 4 4 3 - 2 9 7 8 4 - 7
eBook ISBN:
9 7 8 - 0 - 4 4 3 - 2 9 7 8 5 - 4

Relativistic Theory and Calculation of Electrostatic Focusing Systems, Volume 230, the latest release in the Advances in Imaging and Electron Physics series, merges two long-runn… Read more

Nanolithography and Surface Microscopy with Electron Beams

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Relativistic Theory and Calculation of Electrostatic Focusing Systems, Volume 230, the latest release in the Advances in Imaging and Electron Physics series, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.