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Laser and Electron Beam Processing of Materials
- 1st Edition - November 12, 2012
- Editor: C.W. White
- Language: English
- Paperback ISBN:9 7 8 - 0 - 1 2 - 4 1 2 3 3 8 - 0
- eBook ISBN:9 7 8 - 0 - 3 2 3 - 1 4 2 5 3 - 3
Laser and Electron Beam Processing of Materials contains the papers presented at the symposium on "Laser and Electron Beam Processing of Materials," held in Cambridge,… Read more
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Request a sales quoteLaser and Electron Beam Processing of Materials contains the papers presented at the symposium on "Laser and Electron Beam Processing of Materials," held in Cambridge, Massachusetts, in November 1979, sponsored by the Materials Research Society. The compilation presents reports and research papers on the use of directed energy sources, such as lasers and electron beams for materials processing. The majority of the materials presented emphasize results on semiconductor materials research. Substantial findings on research on metals, alloys, and other materials are presented as well. Topics covered by the papers include the use of scanned cw sources (both photons and electrons) to recrystallize amorphous layers, enhanced substitutional solubility, solute trapping, zone refining of impurities, and constitutional supercooling. The use of lasers and electron beams to anneal ion implant damage and contacts formation, processing of ion-implanted metals, and surface alloying of films deposited on metallic surfaces are also discussed. Metallurgists, engineers, and materials scientists will find the book very insightful.
PrefaceAcknowledgmentsVon Hippie Award Presentation Some Thoughts on Directions in Materials SciencePart I Fundamental Mechanisms Coupling of Beam Energy to Solids* Transient Laser-Induced Processes in Semiconductors* Macroscopic Theory of Pulsed Laser Annealing* Evidence for and Nature of a Nonthermal Mechanism of Pulsed Laser Annealing of Si Plasma Bottlenecks: Dynamics of Laser-Induced Plasmas Melting by Pulsed Laser Irradiation Raman Temperature Measurements During Laser Heating of Silicon Modelling of Solid-Phase Thin-Film Reactions Induced by a Scanning CW Laser Adiabatic Approach to Transport Processes: A General Analytic Technique for Nonlinear Dynamic Heat and Mass DiffusionPart II Enhanced Solubilities, Solute Trapping, and Zone Refining Rapid Solidification* Solute Trapping Supersaturated Substitutional Alloys in Silicon Formed by Ion Implantation and Laser Annealing Solubility Limit of Dopants in Laser-Treated Silicon Surface Segregation in Laser Annealing of Ion-Implanted Silicon Surface Accumulation of Impurities After Laser-Induced Melting Segregation Effects in Pulsed Laser Annealing of Ion-Implanted Silicon The Direct Relation Between Segregation in Pulsed Laser Annealing and Equilibrium Crystal GrowthPart III Ultrarapid Heating and Cooling Laser-Induced Order-Disorder Transitions in Silicon by Pulsed Uv Laser* Picosecond Laser Pulse-Induced Melting and Resolidification Morphology on Silicon Dynamic Behavior of 30-ps Pulsed Laser Annealing in Ion-Implanted SiPart IV Annealing and Recrystallization Laser-Induced Epitaxy in Ion-Implanted and -Deposited Amorphous Layers* Damage Recrystallization Phenomena and Impurity-Segregation in Ion-Implanted and Laser Annealed Silicon On Threshold Effects in Laser Annealing of Semiconductors Electrolyte Electroreflectance Investigation of Ion-Damaged Laser-Annealed Silicon Silicon Surface Structure and Surface Impurities After Pulsed Laser Annealing Photoacoustic Detection Methods for Characterizing Laser Irradiation and Recrystallization of Semiconductors Diagnostics of Laser-Annealed Semiconductor Materials Using Photoacoustic, Related Optical, and Rutherford Backscattering Techniques Laser-Induced Explosive Radial Crystallization of Deposited Ge and Si Thin Films An Analysis of the Explosive Crystallization of Amorphous Layers Solid-Phase Crystallization Produced by Laser Scanning of Amorphous Ge Films: The Role of Latent Heat in Crystallization-Front DynamicsPart V Elemental Semiconductors Laser and Thermal Annealing of Ion-Implanted P-Type Dopants in Silicon Laser Annealing of High Dose P+ As+ B+ O+ and C+ Implanted Si Structure Stability of Arsenic-Implanted Si After Pulsed Laser Irradiation Infrared Reflectivity and Transmissivity of Boron-Implanted, Laser-Annealed Silicon Laser-Annealed Polycrystalline Silicon Characteristics Characterization of Implanted Layers After Laser and Electron Beam Annealing Characterization of Silicon Layers Implanted by Low Speed Molecular Ions and Annealed by a Pulsed Laser Electronic Properties of Ion-Implanted Silicon Annealed With Microsecond Dye-Laser Pulses CW Laser Annealing of Ion-Implanted Polycrystalline Silicon Films Physical Properties of Ion-Implanted Sem-Annealed Silicon Optimization of Two Wavelength Laser Annealing of Implanted SemiconductorsPart VI Compound Semiconductors Laser and Electron Beam Annealing of GaAs* Laser Annealing Effects in Ion-Implanted GaAs Pulsed E-Beam and Ruby Laser Annealing of Ion-Implanted GaAs Annealing of Implanted Layers in Compound Semiconductors by Localized Beam Heating Techniques Annealing of Ion-Implanted GaAs with a Pulsed Ruby Laser Transient Annealing of Implanted GaAs by a Pulsed Electron Beam A Comparison of Laser-Annealed Donor and Acceptor Ions Implantd into Gaas Annealing of Ion-Implanted GaAs Layers Using a Nd-Yag Laser Beam of Large Dimension Optical Properties of Laser-Annealed CdSe Thin Films Photoluminescent Properties of Laser-Annealed GaA1As Laser Annealing of Pb-Implanted InSbPart VII Defects Defects in Laser-Processed Semiconductors* Structural Defects in Laser- and Electron-Beam-Annealed Silicon* Hydrogen and Defects in Laser-Annealed Amorphous Silicon Laser Annealing of a-Si: H A Comparison of Ion-Implantation-Induced Deep Levels in Scanned Electron-Beam-Annealed and CW Laser-Annealed Silicon Post Illumination Annealing of Defects in Laser-Processed Silicon Defect Luminescence in CW Laser-Annealed Silicon EPR of Laser-Annealed, Ion-Implanted Silicon Higher Order Defects in Silicon TEM and RBS Studies of Single and Double Discrete Buried Damage Layers in P+-Implanted Si on Subsequent Laser Annealing Positron Annihilation in Ion-Implanted, Laser-Annealed SiliconPart VIII Ohmic Contacts Overview of Ohmic-Contact Formation on N-Type Gaas by Laser and Electron Beam Annealing* Ohmic Contacts Produced by Laser Beams to Indium Implanted Into and Indium Deposited Onto GaAs Pulsed Electron Beam Alloying of Au-Ge/Pt Ohmic Contacts to Gaas Fabrication of Ohmic Contact on p-Type InP Using Ion Implantation and Laser Annealing Redistribution of Implanted Zn IN InP After Q-Switched Laser Annealing and the Related Specific Contact Resistance Metal-Semiconductor Interfaces by Pulsed Electron Beam ProcessingPart IX Metal-Silicon Interactions Laser- and Ion-Beam-Induced Reactions* Structure of Laser-Produced Silicide Layers CW Laser-Induced Reactions for Silicide Formation Silicide Formation by Millisecond Laser Pulses Phase Transformation in Laser-Irradiated Au-Si Thin FilmsPart X Deposited Layers Characteristics of P+N Alloy Junctions Produced by Single Laser Pulses Structure of P-N Junctions Alloyed by Pulsed Electron Beams CW Laser Annealing Studies of Deposited Films Scanning CW Laser-Induced Crystallization of Silicon on Amorphous Substrates Pulsed Electron Beam Liquid Epitaxy Cellular Solidification of Laser Processed Ge-Si Heterojunctions Potential Applications of Transient Processes to Material FormationPart XI Device Applications Application of CW Beam Processing to Semiconductor Device Fabrication* Application of Laser Annealing to Silicon Device Fabrication* Laser-Annealed Silicon Impatt Diodes Electrical Characteristics of Laser-Annealed Polysilicon Resistors for Device Applications Properties of Mosfets Fabricated in Laser-Annealed Polysilicon Films Pulsed Laser and Electron Beam Annealing of Silicon Dioxide Layers on Silicon Structures Electron Beam Annealing of Arsenic-Implanted Silicon in Windows Defined by Oxide Laser Processing of Polycrystalline Silicon Solar Cells Electron Beam and Laser Process Applications for Silicon Solar Cells Characterization of Ion-Implanted and Pulse-Laser-Annealed Junctions; Application to Silicon Solar Cells Laser-Induced Photochemical Reactions for Electronic Device Fabrication The Effects of Laser Irradiation on Monolithic Resistors Influence of Laser Irradiation on Diode-Leakage CurrentPart XII Metals and Other Materials Metastable Surface Alloys Impurity Diffusion in Ion-Implanted A1 During Electron-Beam-Pulsed Annealing Precipitation in Ion-Implanted A1 During Electron-Beam-Pulsed Annealing Ion Implantation and Laser Annealing of High Tc Superconducting Materials Laser Alloying of Deposited Metal Films on Nickel Permanent Local Modification of the Magnetic Bubble Properties of Epitaxial Garnet Films by Laser Annealing Constitution and Microstructure of Ag-Cu Alloys Produced by Continuous Laser Melt Quenching Solidification Microstructure and Microsegregation of Laser-Glazed Ni-Al-Ta and Ni-Al-Cr Dendritic Monocrystals Laser and Electron Beam Melting of Iron Base Hard Materials Laser Surface Melting With Carbide Particle Injection Consolidation of Metal Coatings by Electron Beam MeltingAuthor Index
- No. of pages: 788
- Language: English
- Edition: 1
- Published: November 12, 2012
- Imprint: Academic Press
- Paperback ISBN: 9780124123380
- eBook ISBN: 9780323142533
CW
C.W. White
Affiliations and expertise
SOLID STATE DIVISION
OAK RIDGE NATIONAL LABORATORY
OAK RIDGE, TENNESSEERead Laser and Electron Beam Processing of Materials on ScienceDirect