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Ion Implantation into Semiconductors, Oxides and Ceramics

  • 1st Edition, Volume 85 - March 1, 1999
  • Editors: B.G. Svensson, H.A. Atwater, J.K.N. Lindner, P.L.F. Hemment
  • Language: English
  • Hardback ISBN:
    9 7 8 - 0 - 0 8 - 0 4 3 6 1 3 - 5

These proceedings contain the reviewed papers presented at the Symposium J on "Ion Implantation into Semiconductors, Oxides and Ceramics", which was held at the Spring Meeting of… Read more

Ion Implantation into Semiconductors, Oxides and Ceramics

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These proceedings contain the reviewed papers presented at the Symposium J on "Ion Implantation into Semiconductors, Oxides and Ceramics", which was held at the Spring Meeting of the European Materials Research Society in Strasbourg, France, 16-19, June 1998. The symposium attracted 110 contributions, with authors from 31 nations in 5 continents. It was thereby the largest in a series of E-MRS ion beam symposia, documenting the importance of ion beam techniques and research in this area.

The aim of this symposium was to provide a forum for the discussion of new results in the implantation of materials from three different classes: semiconductors, oxides and ceramics.