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This thoroughly updated new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. It… Read more
LIMITED OFFER
Immediately download your ebook while waiting for your print delivery. No promo code needed.
This thoroughly updated new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. It forms a bridge between fundamental theory and practical application, giving an insight into innovative new materials, devices and systems.
Organized into three parts for ease of use, this Handbook introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS.
Wide varieties of functional thin film materials and processing are described, and experimental data is provided with detailed examples and theoretical descriptions.
Materials and Electrical Engineers in the automotive, medical, semiconductors, space, plastics, and military industries
Preface
Part I: Fundamentals of Sputtering
1. Thin Films and Nanomaterials
1.1 Thin Films and Nanomaterials
1.2 Thin Film Devices and MEMS
1.3 Thin Film Deposition
1.4 Characterization of Thin Films
1.5 Sputtering as a Nanomaterial Engineering
References
2. Sputtering Phenomena
2.1 Sputter Yield
2.2 Sputtered Atoms
2.3 Mechanism of Sputtering
References
3. Sputtering Systems
3.1 Gas Discharge
3.2 Sputtering Systems
3.3 Practical Aspects of Sputtering Systems
References
Part II: Theory and Practice: Sputtering Deposition of Functional Thin Films
4. Computer Simulation
4.1 Features of Sputter Deposition
4.2 Roles of Sputtering Gas in Sputter Deposition
4.3 Significance of Analysis of the Transport Process of Sputtered Particles Through Sputtering Gas
4.4 Analysis of the Transport Process of Sputtered Particles by MC Method
4.5 Applications
4.6 Summary
References
5. Basic Process of Sputtering Deposition
5.1 Control of Film Quality
5.2 Reactive Sputtering–
5.3 Typical Deposition Conditions of Functional Thin Films
References
6. Functional Thin Films
6.1 ZnO Thin Films
6.2 Compound Oxide Thin Films
6.3 Nitrides, Carbides, Silicates, Selenides
6.4 Amorphous Thin Films
6.5 Miscellaneous
References
Part III: Sputtering Technology for Nanomaterials and Thin Film MEMS
7. Ferroelectric Thin Films
7.1 Ferroelectric Thin Film Materials
7.2 Control of Thin Film Structure
7.3 Nanometer Structure
References
8. Thin Film MEMS
8.1 Thin Film Materials for MEMS
8.2 PZT-Based Thin Film MEMS
8.3 High-Performance PZT-Based Thin Films for MEMS
References
9. Micro-Fabrication by Sputtering
9.1 Classification of Sputter Etching
9.2 Ion Beam Sputter Etching
9.3 Diode Sputter Etching
9.4 Plasma Etching
9.5 Deposition into Deep Trench Structure
9.6 Compact Plasma System
References
Appendix 1: Fundamental Physical Constants
Appendix 2: Table of Conversion Factors
Appendix 3: Electric Units, Their Symbols and Conversion Factors
Postscript
Index
KW