Handbook of Contamination Control in Microelectronics
Principles, Applications and Technology
- 1st Edition - February 29, 2012
- Latest edition
- Author: Donald L. Tolliver
- Language: English
This book introduces contamination control in a comprehensive manner. It covers the basics for the beginner, and delves in depth into the more critical issues of process… Read more
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This book introduces contamination control in a comprehensive manner. It covers the basics for the beginner, and delves in depth into the more critical issues of process engineering and circuit manufacturing for the more advanced reader. The reader will begin to see how the puzzle of contamination control comes together and to focus on the fundamentals required for excellence in modern semiconductor manufacturing.
What makes the area of contamination control unique is its ubiquitous nature, across all facets of semiconductor manufacturing. Clean room technology, well recognized as a fundamental requirement in modern day circuit manufacturing, barely scratches the surface in total contamination control. This handbook defines and describes most of the major categories in current contamination control technology.
What makes the area of contamination control unique is its ubiquitous nature, across all facets of semiconductor manufacturing. Clean room technology, well recognized as a fundamental requirement in modern day circuit manufacturing, barely scratches the surface in total contamination control. This handbook defines and describes most of the major categories in current contamination control technology.
Engineers, scientists and managers in the semiconductor and microelectronics industries concerned with preventing and controlling contamination.
1. Aerosol Filtration Technology
Introduction
Filtration Fundamentals
Filter Testing Fundamentals
Filter Applications
Summary
References
2. Instrumentation for Aerosol Measurement
Introduction
Size Distribution of Aerosols
Particle Deposition on Surfaces
Instrumentation for Aerosol Measurement
Aerosol Sampling Instruments
Monodisperse Aerosol Generators
Performance of HEPA and ULPA Filters
References
Bibliography
3. Clean Room Garments and Fabrics
Introduction
Clean Room Garment Design/Styles
Clean Room Garment Construction
Clean Room Fabrics
Clean Room Garment Life
Guidelines for Clean Room Garments
Clean Room Garment Sterilization
Conclusion
4. Guidelines for Clean Room Management and Discipline
Introduction
Clean Room Criteria
Personnel Disciplines
Clean Room Garments
Clean Room Supplies
Housekeeping Maintenance
Facility Start-Up Procedures
Equipment Installation and Repair-Existing Facility
Contamination Control Monitoring
The Future
References
Bibliography
5. Electrostatics in Clean Rooms
Introduction
Eliminating Static Charge
Air Ionization
Ion Generation
Total Room Ionization
Desiccator Cabinets
Blow Off Guns
Grounding
Surface Resistivity
Protective Packaging
Measuring and Testing Methods
Bibliography
6. Ultra High Purity Water-New Frontiers
Pure Water and the Semiconductor Industry
Pure Water Technology
Requirements for Improved Water
The Double Pass Reverse Osmosis System
The Demand for Continued Improvements
Using RO Up Front
The Upstream Requirements for Deionization
A Triple Membrane Five Step Concept
The New Concept in Pure Water System
Suppliers for High Purity water
A ""Me Too"" Industry
Summary
7. Deionized (DI) Water Filtration Technology
Introduction
Deonized Water Filtration Equipment
Systems Integration and Process Consideration
References
8. Monitoring System for Semiconductor Fluids
Historical Perspective
Survey of Measured Levels of Microcontamination in Semiconductor Process Liquids
Material Problems in Liquid Media
Sampling Methodologies
Overview of Measurement Methods
Detailed Description of Light Scattering Response for Liquid Suspended Particles
Defining the Lower Limit of Particle Size Using Laser Light Scattering
Description of Instruments
Application Problem Areas
References
9. Particles in Ultrapure Process Gases
Introduction
Particle Sources and Formation Mechanisms
Selection Criteria for On-Line Particle Analysis Equipment
Light-Scattering Particle Counters
Condensation Nuclei Counters
On-Line Measurement of Particle Sizes in Very Clean Gases-A Synopsis
Particle Sampling
Particle Sampling for Off-Line Analysis
Removal of Particles from Compressed Gases by Filtration
References
10. Contamination Control and Concerns in VLSI Lithography
Introduction
Photoresist: What Is It?
Primers
Photoresist Functional Requirements
Photoresist Contamination Concerns
Contamination Control in Photoresist Processing
Summary and Conclusions
11. Contamination Control in Electronic Chemicals
Defining Contamination
Measuring the Contamination
Controlling the Contamination in Chemicals
Conclusion
12. Surface Particle Detection Technology
Introduction
Inspection Methods for Particles on Planar Surfaces
Inspection Methods for Particles on Patterned Surfaces
References
13. Particle Contamination by Process Equipment
Introduction
Particles per Wafer per Pass (PWP)
Use of Statistics
Experiment Structures for Measuring Equipment Contamination
Design of Experiments
Calibration
Measurement Planning
Specification Standard
The Future
References
14. Wafer Automation and Transfer System
Introduction
The Need for Automation
Individual Wafer Handling
Interequipment Wafer-Cassette Transport
Automated Facilities
Conclusion
References
Glossary
Index
Introduction
Filtration Fundamentals
Filter Testing Fundamentals
Filter Applications
Summary
References
2. Instrumentation for Aerosol Measurement
Introduction
Size Distribution of Aerosols
Particle Deposition on Surfaces
Instrumentation for Aerosol Measurement
Aerosol Sampling Instruments
Monodisperse Aerosol Generators
Performance of HEPA and ULPA Filters
References
Bibliography
3. Clean Room Garments and Fabrics
Introduction
Clean Room Garment Design/Styles
Clean Room Garment Construction
Clean Room Fabrics
Clean Room Garment Life
Guidelines for Clean Room Garments
Clean Room Garment Sterilization
Conclusion
4. Guidelines for Clean Room Management and Discipline
Introduction
Clean Room Criteria
Personnel Disciplines
Clean Room Garments
Clean Room Supplies
Housekeeping Maintenance
Facility Start-Up Procedures
Equipment Installation and Repair-Existing Facility
Contamination Control Monitoring
The Future
References
Bibliography
5. Electrostatics in Clean Rooms
Introduction
Eliminating Static Charge
Air Ionization
Ion Generation
Total Room Ionization
Desiccator Cabinets
Blow Off Guns
Grounding
Surface Resistivity
Protective Packaging
Measuring and Testing Methods
Bibliography
6. Ultra High Purity Water-New Frontiers
Pure Water and the Semiconductor Industry
Pure Water Technology
Requirements for Improved Water
The Double Pass Reverse Osmosis System
The Demand for Continued Improvements
Using RO Up Front
The Upstream Requirements for Deionization
A Triple Membrane Five Step Concept
The New Concept in Pure Water System
Suppliers for High Purity water
A ""Me Too"" Industry
Summary
7. Deionized (DI) Water Filtration Technology
Introduction
Deonized Water Filtration Equipment
Systems Integration and Process Consideration
References
8. Monitoring System for Semiconductor Fluids
Historical Perspective
Survey of Measured Levels of Microcontamination in Semiconductor Process Liquids
Material Problems in Liquid Media
Sampling Methodologies
Overview of Measurement Methods
Detailed Description of Light Scattering Response for Liquid Suspended Particles
Defining the Lower Limit of Particle Size Using Laser Light Scattering
Description of Instruments
Application Problem Areas
References
9. Particles in Ultrapure Process Gases
Introduction
Particle Sources and Formation Mechanisms
Selection Criteria for On-Line Particle Analysis Equipment
Light-Scattering Particle Counters
Condensation Nuclei Counters
On-Line Measurement of Particle Sizes in Very Clean Gases-A Synopsis
Particle Sampling
Particle Sampling for Off-Line Analysis
Removal of Particles from Compressed Gases by Filtration
References
10. Contamination Control and Concerns in VLSI Lithography
Introduction
Photoresist: What Is It?
Primers
Photoresist Functional Requirements
Photoresist Contamination Concerns
Contamination Control in Photoresist Processing
Summary and Conclusions
11. Contamination Control in Electronic Chemicals
Defining Contamination
Measuring the Contamination
Controlling the Contamination in Chemicals
Conclusion
12. Surface Particle Detection Technology
Introduction
Inspection Methods for Particles on Planar Surfaces
Inspection Methods for Particles on Patterned Surfaces
References
13. Particle Contamination by Process Equipment
Introduction
Particles per Wafer per Pass (PWP)
Use of Statistics
Experiment Structures for Measuring Equipment Contamination
Design of Experiments
Calibration
Measurement Planning
Specification Standard
The Future
References
14. Wafer Automation and Transfer System
Introduction
The Need for Automation
Individual Wafer Handling
Interequipment Wafer-Cassette Transport
Automated Facilities
Conclusion
References
Glossary
Index
"àshould be in the library of all microelectronics engineers and designers."—Microelectronics & Reliability
- Edition: 1
- Latest edition
- Published: February 29, 2012
- Language: English