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Elsevier

Atomic Layer Deposition: Chemistry, Processing, and Applications

  • 1st Edition - April 1, 2027
  • Latest edition
  • Editors: Xiangbo Meng, Jeffrey W. Elam
  • Language: English

Atomic Layer Deposition: Chemistry, Processing, and Applications offers a systematic overview of ALD, highlighting its scientific foundations, surface chemistry, and proces… Read more

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Description

Atomic Layer Deposition: Chemistry, Processing, and Applications offers a systematic overview of ALD, highlighting its scientific foundations, surface chemistry, and processing techniques. The book explores the origin and evolution of ALD, along with its key applications across various fields, making it an essential reference for understanding this versatile technology. The book is organized into four main parts: Fundamentals of ALD, ALD in Semiconductors, Heterogeneous Catalysis, and Emerging Applications. It covers topics such as precursors, characterization methods, and advanced processing strategies. Readers will find detailed insights into ALD’s role in memory devices, interconnects, catalysts, energy storage, photovoltaics, water treatment, and innovative fields like additive manufacturing and pharmaceuticals.

Atomic Layer Deposition: Chemistry, Processing, and Applications is an invaluable resource for researchers, engineers, and students in chemistry, physics, materials science, nanotechnology, and related disciplines.

Key features

  • Provides a comprehensive overview of Atomic Layer Deposition (ALD), including its origins, surface chemistry, and processing strategies
  • Covers a wide range of applications in semiconductors, catalysis, energy storage, photovoltaics, and water treatment
  • Emphasizes emerging areas such as rechargeable batteries, electrocatalysis, and novel applications like additive manufacturing and pharmaceuticals
  • Features insights from leading experts and includes detailed content on fundamental principles, characterization techniques, and advanced processing methods
  • Aims to serve as a systematic resource for researchers, engineers, and students, bridging fundamental knowledge and practical applications in ALD

Readership

Researchers, Postgraduate and advanced (undergraduate) students

Table of contents

Part I. Basics of Atomic Layer Deposition

1. Origin and Evolution

2. Precursors and Surface Chemistry

3. Ex situ and in situ Characterization

4. Processing Strategies

Part II. Atomic Layer Deposition in Semiconductors

5. Atomic Layer Deposition for memory and logic

6. Atomic Layer Deposition for interconnects

Part III. Atomic Layer Deposition in Heterogenous Catalysis

7. Atomic Layer Deposition noble metal catalysts

8. Atomic Layer Deposition metal oxides for catalyst support and protection

9. Atomic Layer Deposition in porous templates (e.g., MOFs, porous powders, extrudates)

Part IV. Atomic Layer Deposition in Rechargeable Batteries

10. Atomic Layer Deposition for liquid batteries

11. Atomic Layer Deposition for solid-state batteries

Part V. Atomic Layer Deposition in Emerging Applications

12. Atomic Layer Deposition for photovoltaics

13. Atomic Layer Deposition for displays

14. Atomic Layer Deposition for water treatment

15. Atomic Layer Deposition for novel applications

Product details

  • Edition: 1
  • Latest edition
  • Published: April 1, 2027
  • Language: English

About the editors

XM

Xiangbo Meng

Dr. Xiangbo Meng is an Associate Professor in the Department of Mechanical Engineering at the University of Arkansas, holding a 21st Century Professorship. He has over 15 years of experience in Atomic Layer Deposition (ALD) and specializes in designing nanophase materials for energy storage devices like batteries. Prior to joining Arkansas in 2016, he was a postdoctoral fellow at Argonne National Laboratory and Brookhaven National Laboratory. Dr. Meng holds two PhDs from the University of Western Ontario and has published over 100 peer-reviewed papers, 7 book chapters, and holds 20 US patents. He is a top-ranked scientist in ALD, serving on multiple journal editorial boards.
Affiliations and expertise
Associate Professor, Department of Mechanical Engineering, University of Arkansas, USA

JE

Jeffrey W. Elam

Dr. Jeffrey W. Elam is a Senior Chemist and Argonne Distinguished Fellow at Argonne National Laboratory where he directs a program in atomic layer deposition (ALD) technology with the goal of developing new applications for ALD in fields such as energy storage, water treatment, and large-area detectors. Jeff earned his B.A. in Chemistry from Cornell University and his Ph.D. in Physical Chemistry from the University of Chicago. As a Postdoctoral Researcher at the University of Colorado, Jeff developed ALD thin film growth methods. Dr. Elam has authored over 300 papers and is an inventor on over 100 patents and inventions related to ALD. Jeff won the ALD Innovation Award in 2017 and has received five R&D100 Awards including the Editor’s Choice Award for “Oleo Sponge”, the top invention in 2017. Dr. Elam is Fellow of the AVS and ECS.

Affiliations and expertise
Senior Chemist, Applied Materials Division, Argonne National Laboratory, Illinois, USA