Skip to main content

Advances in Research and Development

Modeling of Film Deposition for Microelectronic Applications

  • 1st Edition, Volume 22 - January 29, 1997
  • Latest edition
  • Editors: Ronald Powell, John L. Vossen, Maurice H. Francombe, Abraham Ulman
  • Language: English

Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 22 volumes since 1963. The series contains quality studies of the proper… Read more

Purchase options

Sorry, this title is not available for purchase in your country/region.

WINTER SALE

Discover your season of innovation

Up to 25% off books, eBooks and Journals

Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 22 volumes since 1963. The series contains quality studies of the properties of various thin filmsmaterials and systems.In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.