Advances in Imaging and Electron Physics

1st Edition, Volume 223 - August 23, 2022
Editors: Martin Hÿtch, Peter W. Hawkes
Language: English
Hardback ISBN:
9 7 8 - 0 - 3 2 3 - 9 8 8 6 3 - 6
eBook ISBN:
9 7 8 - 0 - 3 2 3 - 9 8 8 6 4 - 3

Advances in Imaging and Electron Physics, Volume 224 highlights new advances in the field, with this new volume presenting interesting chapters on Measuring elastic deform… Read more

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Advances in Imaging and Electron Physics, Volume 224 highlights new advances in the field, with this new volume presenting interesting chapters on Measuring elastic deformation and orientation gradients by scanning electron microscopy - conventional, new and emerging methods, Development of an alternative global method with high angular resolution, Implementing the new global method, Numerical validation of the method and influence of optical distortions, and Applications of the method.

Cover image
Title page
Table of Contents
Copyright
Contributors
Preface
Chapter One: Measuring elastic strains and orientation gradients by scanning electron microscopy: Conventional and emerging methods
Abstract
1: General introduction
2: Crystal orientation mapping in the scanning electron microscope
3: High-angular resolution scanning electron microscopy
4: Emergence of global HR-EBSD/TKD approaches
5: Summary
References
Chapter Two: Development of a homography-based global DIC approach for high-angular resolution in the SEM
Abstract
1: Introduction
2: Area-based image registration
3: Parametric description of the deformations by a homography
4: Optimization strategy by means of an IC-GN algorithm
5: Discussion
6: Summary
References
Chapter Three: Implementing the homography-based global HR-EBSD/TKD approach
Abstract
1: Introduction
2: Standard implementation of the IC-GN algorithm
3: Modified IC-GN algorithm to integrate a correction of optical distortions
4: Global cross-correlation based initial guess strategy
5: Implementation in ATEX-software
6: Discussion
7: Summary
References
Chapter Four: Numerical validation and influence of optical distortions on accuracy
Abstract
1: Introduction
2: Generation of the test datasets
3: Numerical validation and convergence speed
4: Necessity of a correction of optical distortions
5: Discussion
6: Summary
References
Chapter Five: Applications of the method
Abstract
1: Introduction
2: SEM and data analysis
3: Deformation structures in plastically deformed metals
4: Elastic strain measurement in semiconductors
5: Discussion
6: Summary
7: General discussion, perspectives, and conclusion
References
Chapter Six: Spin wave physics: The nonlinear spin wave-electromagnetic interaction and implications for high frequency devices
Abstract
1: Introduction
2: Field theory of spin waves exchange effects
3: Equation of motion for magnetization deviation about its mean value
4: Complete Magnetodynamics equation using total H field
5: Magnetodynamics equation for twice the spin wave frequency
6: Conclusions
Acknowledgments
Appendix A: Derivation of the magnetization M equation of motion
Appendix B: Derivation of the magnetization final M equation of motion
Appendix C: Derivation of the magnetization deviation ΔM equation of motion
Appendix D: Nonlinear modification of the spin resonance equation
References
Index

Martin Hÿtch

Dr Martin Hÿtch, serial editor for the book series “Advances in Imaging and Electron Physics (AIEP)”, is a senior scientist at the French National Centre for Research (CNRS) in Toulouse. He moved to France after receiving his PhD from the University of Cambridge in 1991 on “Quantitative high-resolution transmission electron microscopy (HRTEM)”, joining the CNRS in Paris as permanent staff member in 1995. His research focuses on the development of quantitative electron microscopy techniques for materials science applications. He is notably the inventor of Geometric Phase Analysis (GPA) and Dark-Field Electron Holography (DFEH), two techniques for the measurement of strain at the nanoscale. Since moving to the CEMES-CNRS in Toulouse in 2004, he has been working on aberration-corrected HRTEM and electron holography for the study of electronic devices, nanocrystals and ferroelectrics. He was laureate of the prestigious European Microscopy Award for Physical Sciences of the European Microscopy Society in 2008. To date he has published 130 papers in international journals, filed 6 patents and has given over 70 invited talks at international conferences and workshops.

Affiliations and expertise

Senior Scientist, French National Centre for Research (CNRS), Toulouse, France

Peter W. Hawkes

Peter Hawkes obtained his M.A. and Ph.D (and later, Sc.D.) from the University of Cambridge, where he subsequently held Fellowships of Peterhouse and of Churchill College. From 1959 – 1975, he worked in the electron microscope section of the Cavendish Laboratory in Cambridge, after which he joined the CNRS Laboratory of Electron Optics in Toulouse, of which he was Director in 1987. He was Founder-President of the European Microscopy Society and is a Fellow of the Microscopy and Optical Societies of America. He is a member of the editorial boards of several microscopy journals and serial editor of Advances in Electron Optics.

Affiliations and expertise

Founder-President of the European Microscopy Society and Fellow, Microscopy and Optical Societies of America; member of the editorial boards of several microscopy journals and Serial Editor, Advances in Electron Optics, France

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Martin Hÿtch

Peter W. Hawkes