Advances in Imaging and Electron Physics
- 1st Edition, Volume 235 - August 18, 2025
- Latest edition
- Editor: Martin Hÿtch
- Language: English
Advances in Imaging and Electron Physics, Volume 235 merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscop… Read more
Advances in Imaging and Electron Physics, Volume 235 merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. Chapters in this release cover Unified formalism of light beam optics and light polarization, Relativistic Theory and Calculation of Electrostatic Focusing Systems, A Nonlinear Representation Theory of Equivariant Deep Learning Using Group Morphology.
- Provides the authority and expertise of leading contributors from an international board of authors
- Presents the latest release in the Advances in Imaging and Electron Physics series
Physicists, electrical engineers, applied mathematicians in all branches of image processing and microscopy as well as electron physics in general
1. Unified formalism of light beam optics and light polarization
2. Relativistic Theory and Calculation of Electrostatic Focusing Systems
3. A Nonlinear Representation Theory of Equivariant Deep Learning Using Group Morphology
2. Relativistic Theory and Calculation of Electrostatic Focusing Systems
3. A Nonlinear Representation Theory of Equivariant Deep Learning Using Group Morphology
- Edition: 1
- Latest edition
- Volume: 235
- Published: August 18, 2025
- Language: English
MH
Martin Hÿtch
Dr Martin Hÿtch, serial editor for the book series “Advances in Imaging and Electron Physics (AIEP)”, is a senior scientist at the French National Centre for Research (CNRS) in Toulouse. He moved to France after receiving his PhD from the University of Cambridge in 1991 on “Quantitative high-resolution transmission electron microscopy (HRTEM)”, joining the CNRS in Paris as permanent staff member in 1995. His research focuses on the development of quantitative electron microscopy techniques for materials science applications. He is notably the inventor of Geometric Phase Analysis (GPA) and Dark-Field Electron Holography (DFEH), two techniques for the measurement of strain at the nanoscale. Since moving to the CEMES-CNRS in Toulouse in 2004, he has been working on aberration-corrected HRTEM and electron holography for the study of electronic devices, nanocrystals and ferroelectrics. He was laureate of the prestigious European Microscopy Award for Physical Sciences of the European Microscopy Society in 2008. To date he has published 130 papers in international journals, filed 6 patents and has given over 70 invited talks at international conferences and workshops.
Affiliations and expertise
Senior Scientist, French National Centre for Research (CNRS), Toulouse, FranceRead Advances in Imaging and Electron Physics on ScienceDirect