Journals in Vacuum technology

Thin Solid Films

ISSN: 0040-6090
5 Year impact factor: 1.9
Impact factor: 2

International Journal on the Science and Technology of Condensed Matter Films Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin film synthesis, characterization, modelling, and applications. The topical scope of Thin Solid Films reflects a wide range of thin film related themes: Thin film synthesis, with particular emphasis on the control of growth for desired physical propertiesSurfaces and interfacesSolar energy conversionCatalysisB... and other electrochemical devicesMetallurgical... protective, and hard coatingsElectronics, optics, and opto-electronicsMagn... and magneto-opticsSuperc... to authors Contributions to Thin Solid Films should concern thin films and their potential applications. Details of film synthesis are required, together with the reproducibility of achieved results. Simulations should always be compared with corresponding original or published experimental data.Benefits to authors We also provide many author benefits, such as free PDFs, a liberal copyright policy, special discounts on Elsevier publications and much more. Please click here for more information on our author services.Please see our Guide for Authors for information on article submission. If you require any further information or help, please visit our Support Center

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Ultramicroscopy

ISSN: 0304-3991
5 Year impact factor: 2.3
Impact factor: 2.1

An international journal affiliated with MSA, ISEM, SCANDEM, NVEM, SGOEM, SIME-SM, DGE, MSC, ASEM and MSSA, committed to the advancement of new methods, tools and theories in microscopyUltramicro... is an established journal that provides a forum for the publication of original research papers, invited reviews and rapid communications. The scope of Ultramicroscopy is to describe advances in instrumentation, methods and theory related to all modes of microscopical imaging, diffraction and spectroscopy in the life and physical sciences.Electron MicroscopyInstrument... developmentImaging and scattering theoryComputational methodsImage processing and analysisAuthors are encouraged to contact the Editor in Chief directly at angus.kirkland@mater... to discuss Review proposals in the first instance possible, as these are by invitation only.Benefits to authors We also provide many author benefits, such as free PDFs, a liberal copyright policy, special discounts on Elsevier publications and much more. Please click here for more information on our author services.Please see our Guide for Authors for information on article submission. If you require any further information or help, please visit our Support Center

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Vacuum

ISSN: 0042-207X
5 Year impact factor: 3.5
Impact factor: 3.8

Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.The aim of the short communications is to enable researchers to rapidly share their most exciting work with their colleagues. The expected time from submission to final decision is approximately 6.4 weeks.Benefits to authors We also provide many author benefits, such as free PDFs, a liberal copyright policy, special discounts on Elsevier publications and much more. Please click here for more information on our author services.Please see our Guide for Authors for information on article submission. If you require any further information or help, please visit our Support Center

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Journals in Vacuum technology

Thin Solid Films

Ultramicroscopy

Vacuum