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41-50 of 51 results in All results

Handbook of Liquids-Assisted Laser Processing

  • 1st Edition
  • January 21, 2007
  • Arvi Kruusing
  • English
  • Hardback
    9 7 8 - 0 - 0 8 - 0 4 4 4 9 8 - 7
  • eBook
    9 7 8 - 0 - 0 8 - 0 5 5 5 0 4 - 1
Laser processing of solid materials has been commonly performed in gas ambient. Having the workpiece immersed into liquid, having a liquid film on it, or soaking the material with liquid gives several advantages such as removal of the debris, lowering the heat load on the workpiece, and confining the vapour and plasma, resulting in higher shock pressure on the surface. Introduced in the 1980s, neutral liquids assisted laser processing (LALP) has proved to be advantageous in the cutting of heat-sensitive materials, shock peening of machine parts, cleaning of surfaces, fabrication of micro-optical components, and for generation of nanoparticles in liquids. The liquids used range from water through organic solvents to cryoliquids. The primary aim of Handbook of Liquids-Assisted Laser Processing is to present the essentials of previous research (tabulated data of experimental conditions and results), and help researchers develop new processing and diagnostics techniques (presenting data of liquids and a review of physical phenomena associated with LALP). Engineers can use the research results and technological innovation information to plan their materials processing tasks. Laser processing in liquids has been applied to a number of different tasks in various fields such as mechanical engineering, microengineering, chemistry, optics, and bioscience. A comprehensive glossary with definitions of the terms and explanations has been added. The book covers the use of chemically inert liquids under normal conditions. Laser chemical processing examples are presented for comparison only.

Advanced Welding Processes

  • 1st Edition
  • October 11, 2006
  • J Norrish
  • English
  • Hardback
    9 7 8 - 1 - 8 4 5 6 9 - 1 3 0 - 1
  • eBook
    9 7 8 - 1 - 8 4 5 6 9 - 1 7 0 - 7
Advanced welding processes provides an excellent introductory review of the range of welding technologies available to the structural and mechanical engineer. The book begins by discussing general topics such power sources, filler materials and gases used in advanced welding. A central group of chapters then assesses the main welding techniques: gas tungsten arc welding (GTAW), gas metal arc welding (GMAW), high energy density processes and narrow-gap welding techniques. Two final chapters review process control, automation and robotics.Advanced welding processes is an invaluable guide to selecting the best welding technology for mechanical and structural engineers.

Direct Strip Casting of Metals and Alloys

  • 1st Edition
  • March 24, 2006
  • M Ferry
  • English
  • eBook
    9 7 8 - 1 - 8 4 5 6 9 - 1 6 6 - 0
Direct strip casting is a continuous casting process for producing metallic sheet directly from the molten state that minimises the need for substantial secondary processing. This important book is the first to review the implications of strip casting technology for a range of alloys, including carbon and stainless steel, aluminium, magnesium, titanium, copper and other non-ferrous alloys.The book is divided into six chapters, with the first two describing the physical metallurgy of candidate alloys for direct strip casting and the development of microstructure during solidification. Chapter 3 describes the principles of continuous casting processes and the evolution of direct strip casting. It provides the foundation for the following two chapters which describe process variables and their impact on microstructure and strip quality. The final chapter describes possible techniques in secondary processing and fabrication of the as-cast strip. Two appendices discuss simulation and modelling issues, and the measurement and representation of textures in metal strip.Direct strip casting of metals and alloys is a standard reference on a technology destined to have a profound impact on the manufacturing landscape of the twenty-first century.

Materials Processing and Manufacturing Science

  • 1st Edition
  • January 9, 2006
  • Rajiv Asthana + 2 more
  • English
  • eBook
    9 7 8 - 0 - 0 8 - 0 4 6 4 8 8 - 6
“Materials Science in Manufacturing” focuses on materials science and materials processing primarily for engineering and technology students preparing for careers in manufacturing. The text also serves as a useful reference on materials science for the practitioner engaged in manufacturing as well as the beginning graduate student.Integrates theoretical understanding and current practices to provide a resource for students preparing for advanced study or career in industry. Also serves as a useful resource to the practitioner who works with diverse materials and processes, but is not a specialist in materials science. This book covers a wider range of materials and processes than is customary in the elementary materials science books.This book covers a wider range of materials and processes than is customary in the elementary materials science books.

Sintering

  • 1st Edition
  • November 27, 2004
  • Suk-Joong L. Kang
  • English
  • Hardback
    9 7 8 - 0 - 7 5 0 6 - 6 3 8 5 - 4
  • eBook
    9 7 8 - 0 - 0 8 - 0 4 9 3 0 7 - 7
Sintering is the process of forming materials and components from a powder under the action of thermal energy. It is a key materials science subject: most ceramic materials and many specialist metal powder products for use in key industries such as electronics, automotive and aerospace are formed this way. Written by one of the leading experts in the field, this book offers an unrivalled introduction to sintering and sintering processes for students of materials science and engineering, and practicing engineers in industry. The book is unique in providing a complete grounding in the principles of sintering and equal coverage of the three key sintering processes: densification, grain growth and microstructure. Students and professional engineers alike will be attracted by the emphasis on developing a detailed understanding of the theory and practical processes of sintering, the balanced coverage of ceramic and metal sintering, and the accompanying examination questions with selected solutions.

Sputtering Materials for VLSI and Thin Film Devices

  • 1st Edition
  • April 1, 2000
  • Jaydeep Sarkar
  • English
  • Hardback
    9 7 8 - 0 - 8 1 5 5 - 1 5 9 3 - 7
An important resource for students, engineers and researchers working in the area of thin film deposition using physical vapor deposition (e.g. sputtering) for semiconductor, liquid crystal displays, high density recording media and photovoltaic device (e.g. thin film solar cell) manufacturing. This book also reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall productivity of various processes. Two unique chapters of this book deal with productivity and troubleshooting issues. The content of the book has been divided into two sections: (a) the first section (Chapter 1 to Chapter 3) has been prepared for the readers from a range of disciplines (e.g. electrical, chemical, chemistry, physics) trying to get an insight into use of sputtered films in various devices (e.g. semiconductor, display, photovoltaic, data storage), basic of sputtering and performance of sputtering target in relation to productivity, and (b) the second section (Chapter 4 to Chapter 8) has been prepared for readers who already have background knowledge of sputter deposition of thin films, materials science principles and interested in the details of sputtering target manufacturing methods, sputtering behavior and thin film properties specific to semiconductor, liquid crystal display, photovoltaic and magnetic data storage applications. In Chapters 5 to 8, a general structure has been used, i.e. a description of the applications of sputtered thin films, sputtering target manufacturing methods (including flow charts), sputtering behavior of targets (e.g. current - voltage relationship, deposition rate) and thin film properties (e.g. microstructure, stresses, electrical properties, in-film particles). While discussing these topics, attempts have been made to include examples from the actual commercial processes to highlight the increased complexity of the commercial processes with the growth of advanced technologies. In addition to personnel working in industry setting, university researchers with advanced knowledge of sputtering would also find discussion of such topics (e.g. attributes of target design, chamber design, target microstructure, sputter surface characteristics, various troubleshooting issues) useful. .

Handbook of Physical Vapor Deposition (PVD) Processing

  • 2nd Edition
  • April 1, 2000
  • Donald M. Mattox
  • English
  • Hardback
    9 7 8 - 0 - 8 1 5 5 - 2 0 3 7 - 5
  • eBook
    9 7 8 - 0 - 8 1 5 5 - 2 0 3 8 - 2
This updated version of the popular handbook further explains all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the new edition remains on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications, with additional information to support the original material. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called "war stories", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.

Handbook of Physical Vapor Deposition (PVD) Processing

  • 1st Edition
  • December 31, 1998
  • Donald M. Mattox
  • English
  • eBook
    9 7 8 - 0 - 8 1 5 5 - 1 7 6 3 - 4
This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired.The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.

Magnetic Materials in Japan

  • 1st Edition
  • September 27, 1991
  • Japan Technical Information Japan Technical Information Se
  • English
  • eBook
    9 7 8 - 1 - 4 8 3 2 - 9 3 9 9 - 8
Please note this is a Short Discount publication.This, the third report in Elsevier's Materials Technology in Japan series, concentrates on magnetic materials as a topic gaining worldwide attention, and each chapter looks not only at current research, but also describes the technology as it is being applied and its future potential.Magnetic–related research is the second largest field of research in Japan after semiconductors, with the estimated number of researchers and engineers engaged in magnetics–related activities currently at 20,000. This research report serves as both a review of research undertaken and developments to date, and a forecast of where the industry is going.

Laser Processing of Materials in Japan

  • 1st Edition
  • September 21, 1990
  • Japan Technical Information Japan Technical Information Se
  • English
  • eBook
    9 7 8 - 1 - 4 8 3 2 - 9 3 9 8 - 1
Please note this is a short discount publication.Up until now, information on Japanese research efforts in the field of laser material processing has been difficult to collate - LASER PROCESSING OF MATERIALS IN JAPAN provides all this information in one exhaustive reference work.The report describes the various Japanese techniques for the creation of advanced materials by using laser-technology, and details the laser generation equipment being developed in Japan. Also provided are the names and addresses of principal Japanese workers in a variety of laser-processing fields, together with lists of the main Japanese research initiatives.