Thin Films From Free Atoms and Particles

Contributors

Preface


1. Introduction to Free Atoms and Particles

I. Free Atoms

II. Free Particles

III. The Elements

IV. Molecular Solids

V. Experimental Methods

VI. Uses of Free Atoms and Particles in Chemical and Film-Formation Processes

References


2. Clustering of Free Atoms and Particles: Polymerization And The Beginning Of Film Growth

I. Historical Considerations

II. Microclusters—The Beginning of Film Growth by the Clustering of Free Atoms

III. Reactive Particles that Polymerize to Films

References


3. Analysis of Glow Discharges for Understanding the Process of Film Formation

I. Introduction

II. Glow Discharges

III. Diagnostics: Theory and Experiment

IV. Review of Results

V. Concluding Remarks

References


4. Preparation, Structure, and Properties of Hard Coatings on the Basis of i-C and i-BN

I. Introduction

II. Preparation—Mechanism and Techniques

III. Properties and Structure of i-C Films

IV. Properties and Structure of i-BN and Composite Films

V. Outlook on Applications

References


5. High-Vacuum Deposition Methods Involving Superthermal Free Particles

I. Introduction

II. Ion-Surface Interactions

III. Experimental—Principle and Description

IV. Ion-Beam Sputtering Deposition

V. Ion-Beam Deposition—Ionized Cluster Beam Deposition

VI. Conclusion

References


6. Formation of Thin Semiconducting Films by Magnetron Sputtering

I. Introduction

II. The Magnetron Cathode

III. Effects Governing Deposition Rate of Elemental and Compound Semiconductors

IV. Deposition of Compound Semiconductors

V. Compound Semiconductors Deposited by Magnetron Sputtering

VI. Conclusion

References


7. Silicon Carbide Films

I. Introduction

II. Physical Properties

III. Film Formation by Chemical Vapor Deposition

IV. Film Formation by Physicaland Reactive Vapor Deposition

V. Liquid-Phase Growth of Thin Films

VI. Thin Films of Amorphous Sic 318

VII. Applications for Sic Films

VIII. Summary

References


8 Characterization of Thin Films by X-Ray Diffraction Armin Segmuller and Masanori Murakami

I. Introduction

II. X-Ray Diffraction Instrumentation for Thin-Film Studies

III. Characterization of Thin Films by X-Ray Diffraction

IV. Summary

References

Index