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Principles of Electron Optics: Applied Geometrical Optics, Second Edition gives detailed information about the many optical elements that use the theory presented in Volume 1:… Read more
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Immediately download your ebook while waiting for your print delivery. No promo code needed.
Principles of Electron Optics: Applied Geometrical Optics, Second Edition gives detailed information about the many optical elements that use the theory presented in Volume 1: electrostatic and magnetic lenses, quadrupoles, cathode-lens-based instruments including the new ultrafast microscopes, low-energy-electron microscopes and photoemission electron microscopes and the mirrors found in their systems, Wien filters and deflectors. The chapter on aberration correction is largely new. The long section on electron guns describes recent theories and covers multi-column systems and carbon nanotube emitters. Monochromators are included in the section on curved-axis systems.
The lists of references include many articles that will enable the reader to go deeper into the subjects discussed in the text.
The book is intended for postgraduate students and teachers in physics and electron optics, as well as researchers and scientists in academia and industry working in the field of electron optics, electron and ion microscopy and nanolithography.
Postgraduate students and teachers in physics and electron optics; researchers and scientists in academia and industry working in the field of electron optics, electron and ion microscopy, and nanolithography
PART VII – INSTRUMENTAL OPTICS
35. Electrostatic Lenses
35.1. Introduction
35.2. Immersion lenses
35.3. Einzel lenses
35.4. Grid or foil lenses
35.5. Cylindrical lenses
36. Magnetic Lenses
36.1. Introduction
36.2. Field models
36.3. Measurements and universal curves
36.4. Ultimate lens performance
36.5. Lenses of unusual geometry
36.6. Special purpose lenses
37. Electron Mirrors, Low-energy-electron Microscopes and Photoemission Electron Microscopes, Cathode Lenses and Field-emisssion Microscopy
37.1. The electron mirror microscope
37.2. Mirrors in energy analysis
37.3. Cathode lenses, low-energy-electron microscopes and photoemission electron microscopes
37.4. Field-emission microscopy
37.5. Ultrafast electron microscopy
38. The Wien Filter
39. Quadrupole Lenses
39.1. Introduction
39.2. The rectangular and bell-shaped models
39.3. Isolated quadrupoles and doublets
39.4. Triplets
39.5. Quadruplets
39.6. Other quadrupole geometries
40. Deflection Systems
40.1. Introduction
40.2. Field models for magnetic deflection systems
40.3. The variable-axis lens
40.4. Alternative concepts
40.5. Deflection modes and beam-shaping techniques
PART VIII – ABERRATION CORRECTION AND BEAM INTENSITY DISTRIBUTION (CAUSTICS)
41. Aberration Correction
41.1. Introduction
41.2. Multipole correctors
41.3. Foil lenses and space charge
41.4. Axial conductors
41.5. Mirrors
41.6. High-frequency lenses
41.7. Other aspects of aberration correction
41.8. Concluding remarks
42. Caustics and their Applications
42.1. Introduction
42.2. The concept of the caustic
42.3. The caustic of a round lens
42.4. The caustic of an astigmatic lens
42.5. Intensity considerations
42.6. Higher order focusing properties
42.7. Applications of annular systems
PART IX – ELECTRON GUNS
43. General Features of Electron Guns
43.1. Thermionic electron guns
43.2. Schottky emission guns
43.3. Cold field electron emission guns
43.4. Beam transport systems
44. Theory of Electron Emission
44.1. General relations
44.2. Transmission through a plane barrier
44.3. Thermionic electron emission
44.4. The tunnel effect
44.5. Field electron emission
44.6. Schottky emission
44.7. Concluding remarks
45. Pointed Cathodes without Space Charge
45.1. The spherical cathode
45.2. The diode approximation
45.3. Field calculation in electron sources with pointed cathodes
45.4. Simple models
46. Space Charge Effects
46.1. The spherical diode
46.2. Asymptotic properties and generalizations
46.3. Determination of the space charge
46.4. The Boersch effect
47. Brightness
47.1. Application of Liouville’s theorem
47.2. The maximum brightness
47.3. The influence of apertures
47.4. Lenz’s brightness theory
47.5. Measurement of the brightness
47.6. Coulomb interactions and brightness
47.7. Aberrations in the Theory of Brightness
48. Emittance
48.1. Trace space and hyperemittance
48.2. Two-dimensional emittances
48.3. Brightness and emittance
48.4. Emittance diagrams
49. Gun optics
49.1. The Fujita–Shimoyama theory
49.2. Rose's theory
49.3. Matching the paraxial approximation to a cathode surface
50. Complete Electron Guns
50.1. Justification of the point source model
50.2. The lens system in field emission devices
50.3. Hybrid emission
50.4. Conventional thermionic guns
50.5. Pierce guns
50.6. Multi-electron-beam systems
50.7. Carbon nanotube emitters
50.8. Further reading
PART X – SYSTEMS WITH A CURVED OPTIC AXIS
51. General Curvilinear Systems
51.1. Introduction of a curvilinear coordinate system
51.2. Series expansion of the potentials and fields
51.3. Variational principle and trajectory equations
51.4. Simplifying symmetries
51.5. Trajectory equations for symmetric configurations
51.6. Aberration theory
52. Magnetic Sector Fields
52.1. Introduction
52.2. Magnetic devices with a circular optic axis
52.3. Radial (horizontal) focusing for a particular model field
52.4. The linear dispersion
52.5. The axial (vertical) focusing
52.6. Fringing field effects
52.7. Aberration theory: the homogeneous field (n = 0)
52.8. Optimization procedures
52.9. Energy analysers and monochromators
53. Unified Theories of Ion Optical Systems
53.1. Introduction
53.2. Electrostatic prisms
53.3. A unified version of the theory
53.4. The literature of ion optics
Notes and References
Index
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