Plasma Etching
An Introduction
- 1st Edition - July 28, 1989
- Imprint: Academic Press
- Editors: Dennis M. Manos, Daniel L. Flamm
- Language: English
- Paperback ISBN:9 7 8 - 0 - 1 2 - 3 9 5 9 6 6 - 9
- eBook ISBN:9 7 8 - 0 - 0 8 - 0 9 2 4 4 6 - 5
Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate students, this book introduces the basic… Read more
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Request a sales quotePlasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. Throughout the volume the authors offer practical examples of process chemistry, equipment design, and production methods.
Scientists and engineers who work with plasma in microelectronics, fusion, and space technology; graduate students in these areas.
D.L. Flamm and G.K. Herb, Plasma Etching Technology. An Overview. D.L. Flamm, Introduction to Plasma Chemistry. S.A. Cohen, An Introduction to Plasma Physics for Materials Processing. D.M. Manos and H.F. Dylla, Diagnostics of Plasmas for Materials Processing. A.R. Reinberg, Plasma Etch Equipment and Technology. J.M.E. Harper, Ion Beam Etching. G.K. Herb, Safety, Health, and Engineering Considerations for Plasma Processing.
- Edition: 1
- Published: July 28, 1989
- Imprint: Academic Press
- No. of pages: 476
- Language: English
- Paperback ISBN: 9780123959669
- eBook ISBN: 9780080924465
DM
Dennis M. Manos
Affiliations and expertise
Princeton University, New JerseyDF
Daniel L. Flamm
Affiliations and expertise
AT&T Bell Laboratories, Murray Hill, New JerseyRead Plasma Etching on ScienceDirect