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Materials and Processes for Next Generation Lithography
1st Edition - November 8, 2016
Editors: Alex Robinson, Richard Lawson
Hardback ISBN:9780081003541
9 7 8 - 0 - 0 8 - 1 0 0 3 5 4 - 1
eBook ISBN:9780081003589
9 7 8 - 0 - 0 8 - 1 0 0 3 5 8 - 9
As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the… Read more
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As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography.
These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches.
This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication.
Assembles up-to-date information from the world’s premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation
Includes information on processing and metrology techniques
Brings together multiple approaches to litho pattern recording from academia and industry in one place
Lithographers, chemists and device fabricators from the Semiconductor industry, microelectromechanical systems industry, and from device and micro/nanotechnology research in academia
Frontiers of Nanoscience
Preface
Acknowledgments
List of abbreviations
Chapter 1. Overview of materials and processes for lithography
1.1. Introduction
1.2. Overview of Lithography Process
1.3. Lithographic Exposure Sources and Processes
1.4. Characterization and Figures of Merit for Resists
1.5. Resist Materials and Chemistry
1.6. Challenges in Modern Resist Design
1.7. Conclusions
Chapter 2. Molecular excitation and relaxation of extreme ultraviolet lithography photoresists
2.1. Introduction
2.2. Extreme Ultraviolet Molecular Excitation
2.3. Extreme Ultraviolet Molecular Relaxation
2.4. Extreme Ultraviolet Processes in Condensed Films
2.5. Outlook and Conclusions
Chapter 3. Theory: Electron-induced chemistry
3.1. Introduction
3.2. Mechanisms for Electron-Induced Reactions
3.3. Potential Role in Lithography
3.4. Conclusions
Chapter 4. EUV lithography process challenges
4.1. Introduction
4.2. EUV-IL as a Characterization and Nanopatterning Tool
4.3. Resist Material Challenges
4.4. Conclusions
Chapter 5. EUV lithography patterning challenges
5.1. Extreme Ultraviolet Lithography: Pushing Optical Lithography to the Extreme
5.2. Extreme Ultraviolet Resist Stochastics
5.3. Extreme Ultraviolet Resist Progress, a Historical Perspective
Chapter 6. The chemistry and application of nonchemically amplified (non-CA) chain-scission resists
6.1. Introduction
6.2. The Ceiling Temperature
6.3. The Chemistry of Specific Polymer Resist Systems
6.4. Summary
Chapter 7. Chemically amplified resists and acid amplifiers
Chapter 15. Tip-based nanolithography methods and materials
15.1. Scanning Probe Lithography
15.2. Scanning Probe Lithography Classification
15.3. Increasing the Efficiency and Throughput of Scanning Probe Lithography
15.4. Conclusion
Chapter 16. Thermal scanning probe lithography
16.1. History
16.2. Advantages of Thermal Scanning Probe Lithography
16.3. Patterning With Thermal Scanning Probe Lithography
16.4. Pattern Transfer Processes From PPA
16.5. Conclusions
Chapter 17. Scanning helium ion beam lithography
17.1. Introduction
17.2. Helium Ion Beam System and Ion Solid Interactions
17.3. Exposure of Resists in Helium Ion Beam Lithography
17.4. Conclusions and Outlook
Index
No. of pages: 634
Language: English
Published: November 8, 2016
Imprint: Elsevier
Hardback ISBN: 9780081003541
eBook ISBN: 9780081003589
AR
Alex Robinson
Dr Robinson obtained his PhD in 1999 for work on the development of materials for electron beam lithography performed at the Nanoscale Physics Research Laboratory of the University of Birmingham, and the Joint Research Center for Atom Technology in Japan. Following his PhD he investigated the modification of oxide surfaces using self-assembled monolayer, before returning to the Nanoscale Physics Research Laboratory to continue his research in lithography and microfabrication. He has recently taken up a Senior Research Fellowship in the Science City Research Alliance, based in the School of Chemical Engineering and the School of Chemistry at the Universities of Birmingham and Warwick respectively. He is currently investigating the application of advanced materials within the field of microfabrication, and the integration of functional materials with patterned substrates.
Affiliations and expertise
Senior Lecturer, School of Chemical Engineering, Edgbaston, Birmingham, Senior Research Fellow of the Science City Research Alliance, University of Warwick, University of Birmingham, UK
RL
Richard Lawson
Dr Lawson received his B.S. in Chemical Engineering at Tennessee Technological University in 2005. He received a Ph.D. in Chemical & Biomolecular Engineering in 2011 at the Georgia Institute of Technology where he also completed a Postdoctoral Fellowship. Since 2015, he has been at Milliken & Company where he is a Research Engineer working in the area of chemical technologies. He is an author of over 22 publications, 41 conference proceedings, and a U.S. Patent in the area of patterning materials including photoresist and block copolymer design, synthesis, and characterization along with simulation of resist processing and BCP self-assembly.
Affiliations and expertise
Research Engineer, Milliken & Company, Spartanburg, SC, USA