1. Historical evolution of pulsed laser annealing for semiconductor processing
Guglielmo Fortunato, Luigi Mariucci, Alessandro Pecora, Vittorio Privitera, and Frank Simon
2. Laser-matter interactions
Spyros Stathopoulos and Dimitris Tsoukalas
3. Atomistic modeling of laser-related phenomena
Luis A.Marqués, María Aboy, Pedro López, Iván Santos, Lourdes Pelaz, Giuseppe Fisicaro
4. Laser annealing applications for semiconductor devices manufacturing
Karim Huet
5. Materials science issues related to the fabrication of highly doped junctions by laser annealing of Group IV semiconductors
Ray Duffy, Enrico Napolitani, and Fuccio Cristiano
6. Continuum modeling and TCAD simulations of laser-related phenomena in CMOS applications
Salvatore Francesco Lombardo, Ioannis Deretzis, Alberto Sciuto, and Antonino La Magna
7. Laser engineering of carbon materials for optoelectronic applications
Frédéric Antoni and François Stock
8. Optical hyperdoping
Wenjie Yang, Shao Qi Lim, and Jim S. Williams
9. Laser ultra-doped silicon: Superconductivity and applications
Francesca Chiodi, Richard Daubriac and Sébastien Kerdilès