Developments in Surface Contamination and Cleaning - Vol 5
Contaminant Removal and Monitoring
- 1st Edition - November 29, 2012
- Authors: Rajiv Kohli, Kashmiri L. Mittal
- Language: English
- Hardback ISBN:9 7 8 - 1 - 4 3 7 7 - 7 8 8 1 - 6
- eBook ISBN:9 7 8 - 1 - 4 3 7 7 - 7 8 8 2 - 3
In this series, Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and be… Read more
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Request a sales quoteIn this series, Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or dealing with the consequences of surface contamination.
This volume complements Volumes 3 and 4 of this series, which focused largely on particulate contaminants. The expert contributions in this volume cover methods for removal of non-particulate contaminants, such as metallic and non-metallic thin films, hydrocarbons, toxic and hazardous chemicals, and microbiological substances, as well as contamination monitoring in pharmaceutical manufacturing, and an innovative method for characterization at the nanoscale.
- Comprehensive coverage of innovations in surface contamination and cleaning
- Written by established experts in the contamination and cleaning field
- Each chapter is a comprehensive review of the state of the art
- Case studies included
As a whole, the series will create a unique and comprehensive knowledge base of crucial importance to those in research and development, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. Researchers in an academic setting will also find these volumes excellent source books
Preface
About the Editors
Contributors
Chapter 1. Surface Contamination Removal Using Dense-Phase Fluids: Liquid and Supercritical Carbon Dioxide
1 Introduction
2 Surface Cleanliness Levels
3 Dense-Phase Fluids
4 Principles of Dense-Phase CO2 Cleaning
5 Advantages and Disadvantages of Dense-Phase CO2 Cleaning
6 Applications
7 Summary and Conclusions
Acknowledgment
Disclaimer
References
Chapter 2. Plasma Cleaning for Electronic, Photonic, Biological, and Archeological Applications
1 Introduction
2 Plasma Reactor Configurations
3 Semiconductor Manufacturing
4 Photovoltaic Cell Processing
5 Plasma Sterilization
6 Plasma Cleaning in the Restoration Industry
7 Plasma Cleaning Applications in Electron Microscopy
8 Additional Plasma Applications
9 Summary and Future Needs
References
Chapter 3. Clean Room Wipers for Removal of Surface Contamination
1 Principles of Wiping for Removal of Contaminants
2 Types of Wipers
3 Wiper Testing
4 Methods to Assess Wiper Quality
5 The Importance of Automation
6 Applications
7 Current Trends in Wiper Technology
8 Future Developments in Clean Room Wipers
References
Chapter 4. Impact of Microbial Surface Contamination and Effective Environment Monitoring System in Pharmaceutical Manufacturing
1 Introduction
2 Impact of Microorganisms in the Environment
3 Sanitization
4 Environmental Monitoring
5 Environmental Contamination Control
6 Future Developmental Requirements
References
Chapter 5. Neutron Holography as a Technique for Probing Local Atomic Structures on the Nanoscale
1 Introduction
2 Basic Concepts
3 Experimental Requirements
4 Examples
5 Outlook
References
Index
- No. of pages: 240
- Language: English
- Edition: 1
- Published: November 29, 2012
- Imprint: William Andrew
- Hardback ISBN: 9781437778816
- eBook ISBN: 9781437778823
RK
Rajiv Kohli
KM