Condensed Matter

List of Contributors

Treatise Preface

Preface


1 Heavy Ion Charge States

I. Introduction

II. Basic Processes and Mathematical Description of Charge Exchange

III. Experimental Aspects

IV. Electron Capture

V. Electron Loss

VI. Equilibrium Charge-State Distributions

VII. Gas and Solid Effects

References


2 Ionization Phenomena and Sources of Ions

I. Introduction

II. Ion Source Selection Considerations

III. Vapor Transport Methods

IV. Positive Ionization Phenomena and Sources

V. Negative Ionization Phenomena and Sources

VI. Ion Extraction and Optics of the Extraction Region

References


3 Radiation Physics as a Basis of Radiation Chemistry and Biology

I. What are the Problems of Radiation Physics?

II. Problems of Class I: How Do Radiations Degrade in Matter?

III. Problems of Class II: How Does Matter Change after Receiving Energy from Radiation?

IV. Some Notions of Radiation Chemistry and Biology

V. Concluding Remarks

References


4 Low Energy Ion Scattering and Atomic Diffraction

I. Ion Scattering Spectrometry (ISS)

II. Scattering of Atomic Beams at Thermal Energies

References


5 High Energy Ion Scattering

I. Introduction

II. Physics of Ion Scattering in Amorphous Solids

III. Atomic Composition of Surface Layers

IV. MeV Ion Scattering in Single Crystals

V. Structure Analysis in Crystalline Solids

VI. Summary

References


6 Inelastic Surface Collisions

I. Introduction

II. Ion-Induced Auger Spectra

III. Ion Neutralization at Surfaces

IV. Excitation of Projectiles

V. Optical Emission for Target Species

VI. Conclusion

References


7 Secondary Ion Mass Spectrometry

I. Introduction

II. The Sputtering Process

III. Sputtered Ion Emission: Phenomena and Models

IV. Instrumentation

V. Applications of Secondary Ion Mass Spectrometry

VI. Conclusion

References


8 The Time-of-Flight Atom Probe and Field Ion Microscopy

I. Introduction

II. Basic Principles

III. Field Ion Microscope and Atom-Probe FIM

IV. Atomic Processes on Solid Surfaces

V. Atom-Probe Analyses

VI. Summary

References


9 Ion-Induced X-Ray Emission

I. Introduction

II. Coulomb Ionization

III. Proton-Induced X-Ray Emission (PIXE)

IV. Heavy-Ion-Induced X-Ray Emission

References


10 X-Ray Fluorescence Analysis

I. Introduction

II. Development of the Physics

III. Development of the Analytical Application

IV. Comparison to Other Analytical Techniques

V. X-Ray Fluorescence Analysis in Industry

VI. Conclusions

References


11 Photoelectron and Auger Spectroscopy

I. Introduction

II. Description of the Processes

III. Experimental Considerations

IV. Applications

References


12 Ion Implantation in Semiconductors

I. Introduction

II. Depth Distributions in Implanted and Annealed Samples

III. Implantation Damage

IV. Electrical Activity

V. Recoil Implantation

VI. Annealing of Disorder by Irradiation

VII. Summary

References


13 Microfabrication

I. Introduction

II. Microfabrication Processes

III. Pattern Replication (Lithography)

IV. Pattern Transfer

V. Discussion

References

Index