Skip to main content

Books in Surfaces and interfaces

Materials Science of Thin Films
Depositon and Structure
2nd Edition
October 15, 2001
Milton Ohring
English
This is the first book that can be considered a textbook on thin film science, complete with exercises at the end of each chapter. Ohring has contributed many highly regarded reference books to the AP list, including Reliability and Failure of Electronic Materials and the Engineering Science of Thin Films. The knowledge base is intended for science and engineering students in advanced undergraduate or first-year graduate level courses on thin films and scientists and engineers who are entering or require an overview of the field. Since 1992, when the book was first published, the field of thin films has expanded tremendously, especially with regard to technological applications. The second edition will bring the book up-to-date with regard to these advances. Most chapters have been greatly updated, and several new chapters have been added.
Oxide Surfaces
1st Edition
Volume 9
May 21, 2001
English
The book is a multi-author survey (in 15 chapters) of the current state of knowledge and recent developments in our understanding of oxide surfaces. The author list includes most of the acknowledged world experts in this field. The material covered includes fundamental theory and experimental studies of the geometrical, vibrational and electronic structure of such surfaces, but with a special emphasis on the chemical properties and associated reactivity. The main focus is on metal oxides but coverage extends from 'simple' rocksalt materials such as MgO through to complex transition metal oxides with different valencies.
Thinning Films and Tribological Interfaces
Proceedings of the 26th Leeds-Lyon Symposium
1st Edition
Volume 38
September 1, 2000
D. Dowson + 9 more
English
This collection of fully peer-reviewed papers were presented at the 26th Leeds-Lyon Tribology Symposium which was held in Leeds, UK, 14-17 September, 1999. The Leeds-Lyon Symposia on Tribology were launched in 1974, and the large number of references to original work published in the Proceedings over many years confirms the quality of the published papers. It also indicates that the volumes have served their purpose and become a recognised feature of the tribological literature. This year's title is 'Thinning Films and Tribological Interfaces', and the papers cover practical applications of tribological solutions in a wide range of situations. The evolution of a full peer review process has been evident for a number of years. An important feature of the Leeds-Lyon Symposia is the presentation of current research findings. This remains an essential feature of the meetings, but for the 26th Symposium authors were invited to submit their papers for review a few weeks in advance of the Symposium. This provided an opportunity to discuss recommendations for modifications with the authors.
Electronic Structure
1st Edition
Volume 2
July 19, 2000
English
This book is the second volume in the Handbook of Surface Science series and deals with aspects of the electronic structure of surfaces as investigated by means of the experimental and theoretical methods of physics. The importance of understanding surface phenomena stems from the fact that for many physical and chemical phenomena, the surface plays a key role: in electronic, magnetic, and optical devices, in heterogenous catalysis, in epitaxial growth, and the application of protective coatings, for example. Therefore a better understanding and, ultimately, a predictive description of surface and interface properties is vital for the progress of modern technology. An investigation of surface electronic structure is also central to our understanding of all aspects of surfaces from a fundamental point of view. The chapters presented here review the goals achieved in the field and map out the challenges ahead, both in experiment and theory.
Ionized Physical Vapor Deposition
1st Edition
Volume 27
October 14, 1999
English
This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and memory chips. For the first time, the most recent developments in thin film deposition using ionized physical vapor deposition (I-PVD) are presented in a single coherent source. Readers will find detailed descriptions of relevant plasma source technology, specific deposition systems, and process recipes. The tools and processes covered include DC hollow cathode magnetrons, RF inductively coupled plasmas, and microwave plasmas that are used for depositing technologically important materials such as copper, tantalum, titanium, TiN, and aluminum. In addition, this volume describes the important physical processes that occur in I-PVD in a simple and concise way. The physical descriptions are followed by experimentally-verif... numerical models that provide in-depth insight into the design and operation I-PVD tools. Practicing process engineers, research and development scientists, and students will find that this book's integration of tool design, process development, and fundamental physical models make it an indispensable reference.Key Features:The first comprehensive volume on ionized physical vapor depositionCombines tool design, process development, and fundamental physical understanding to form a complete picture of I-PVDEmphasizes practical applications in the area of IC fabrication and interconnect technologyServes as a guide to select the most appropriate technology for any deposition application
Paint and Surface Coatings
Theory and Practice
2nd Edition
August 23, 1999
R Lambourne + 1 more
English
This second edition of an established and well received book has been carefully revised, in many instances by the original authors, and enlarged by the addition of two completely new chapters. These deal with the use of computers in the paint industry and with the increasingly important subject of health and safety. The chapter on pigments has also been re-written by an author new to this edition.It was the editor’s intention in the first edition to provide science graduates entering the paint industry with a bridge between academia and the applied science and technology of paints. The great strength and appeal of this book remains that it deals with the technology of paints and surface coatings while also providing a basic understanding of the chemistry and physics of coatings.
Fundamental and Applied Aspects of Chemically Modified Surfaces
1st Edition
January 1, 1999
J P Blitz + 1 more
English
The field of chemically modified particle surfaces has seen many significant developments. This text covers analytical and synthetic techniques for the development and understanding of these surfaces. Encompassing subjects including self-assembled monolayers, scanning probe microscopies, combinatorial synthetic techniques, plasma polymerizations and molecular modelling of modified surfaces, the book provides a snap-shot of concepts and tools.
Materials Science and Engineering Serving Society
1st Edition
December 23, 1998
R.P.H. Chang + 3 more
English
This symposium was organised with the aim of encouraging collaboration in international science and engineering communities for the benefit of human kind. It consisted of invited talks by experts on materials and poster presentation papers. Approximately 140 scientists participated and the resulting proceedings present an up-to-date review of the research in this area.
PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing
1st Edition
Volume 26
October 23, 1998
English
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems.In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts.
Electrochemistry at Metal and Semiconductor Electrodes
1st Edition
October 9, 1998
Norio Sato
English
Electrochemisty at Metal and Semiconductor Electrodes covers the structure of the electrical double layer and charge transfer reactions across the electrode/electrolyt... interface. The purpose of the book is to integrate modern electrochemistry and semiconductor physics, thereby, providing a quantitative basis for understanding electrochemistry at metal and semiconductor electrodes.Electrons and ions are the principal particles which play the main role in electrochemistry. This text, therefore, emphasizes the energy level concepts of electrons and ions rather than the phenomenological thermodynamic and kinetic concepts on which most of the classical electrochemistry texts are based. This rationalization of the phenomenological concepts in terms of the physics of semiconductors should enable readers to develop more atomistic and quantitative insights into processes that occur at electrodes.The book incorporates many traditional disciplines of science and engineering such as interfacial chemistry, biochemistry, enzyme chemistry, membrane chemistry, metallurgy, modification of solid interfaces, and materials' corrosion. The text is intended to serve as an introduction for the study of advanced electrochemistry at electrodes and is aimed towards graduates and senior undergraduates studying materials and interfacial chemistry or those beginning research work in the field of electrochemistry.

Related subjects